Patent classifications
H05B33/10
DISPLAY DEVICE AND DEPOSITION MASK
A display device includes an active matrix substrate; a light-emitting element layer including a plurality of first electrodes, a function layer, and a second electrode; and a sealing layer. The light-emitting element layer further includes an edge cover layer configured to cover an end portion of each one of the plurality of first electrodes. The edge cover layer includes a plurality of openings configured to expose the plurality of first electrodes included in a plurality of pixels. The plurality of openings include a first opening with a rectangular shape. A first individual vapor deposition film with a rectangular shape is formed on the first electrode covering the first opening. In the first individual vapor deposition film, projection portions projecting from sections corresponding to at least some opposing vertices of the first opening to an opposite side to the first opening are provided on the edge cover layer.
DISPLAY DEVICE AND MANUFACTURING METHOD
A display device includes a substrate; a semiconductor layer; a gate insulating film; a gate electrode; a first interlayer insulating film; a capacitance electrode; and a second interlayer insulating film. Each of a pixel circuits includes a drive transistor, a capacitor and a connection wiring line. The capacitance electrode is provided with a first opening and a second opening in portions of positions overlapping with the gate electrode in plan view. The first interlayer insulating film and the second interlayer insulating film include a contact hole provided at a position surrounded by the first opening and a hole provided at a position surrounded by the second opening. The connection wiring line is provided on the second interlayer insulating film and is connected to the gate electrode via the contact hole. The hole overlaps with a portion of a channel region in plan view.
DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
A display device includes a sealing layer including a lower insulating film, an organic insulating film including an ink material cured, and an upper insulating film. The lower insulating film includes a first lower insulating film and a second lower insulating film layered on the first lower insulating film and having a higher lyophilicity with respect to the ink material than a lyophilicity of the first lower insulating film. The first lower insulating film is exposed from the second lower insulating film between a first bank and a second bank in a plan view and an end portion of the exposed first lower insulating film is provided on a side opposite to a display region with respect to the second bank, and an end portion of the second lower insulating film is provided between the first bank and the second bank in a plan view.
METHOD FOR MANUFACTURING RESIN FILM HAVING FINE PATTERN, METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE, BASE MATERIAL FILM FOR USE IN FORMATION OF FINE PATTERN, AND RESIN FILM HAVING SUPPORT MEMBER ATTACHED THERETO
A metal layer is formed on a first surface of a flat-plate-like support member, and then a resin cured layer is formed on the metal layer. The resin cured layer is irradiated with laser light for fine processing to form a desired fine pattern, thereby manufacturing a resin film having a fine pattern. Subsequently, ultraviolet light having a wavelength different from that of the laser light for fine processing is irradiated toward a second surface of the support member, which is opposed to the first surface to detach the resin film from the support member.
METHOD FOR MANUFACTURING RESIN FILM HAVING FINE PATTERN, METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE, BASE MATERIAL FILM FOR USE IN FORMATION OF FINE PATTERN, AND RESIN FILM HAVING SUPPORT MEMBER ATTACHED THERETO
A metal layer is formed on a first surface of a flat-plate-like support member, and then a resin cured layer is formed on the metal layer. The resin cured layer is irradiated with laser light for fine processing to form a desired fine pattern, thereby manufacturing a resin film having a fine pattern. Subsequently, ultraviolet light having a wavelength different from that of the laser light for fine processing is irradiated toward a second surface of the support member, which is opposed to the first surface to detach the resin film from the support member.
FLEXIBLE DISPLAY DEVICE, METHOD FOR MANUFACTURING FLEXIBLE DISPLAY DEVICE, AND FOLDABLE DISPLAY DEVICE
In a flexible display device, a transistor layer, a light-emitting element layer, a sealing layer, a first flexible substrate, a λ/4 layer, a linear polarizer, an overcoat layer, and a water repellent layer are provided in this order on a second flexible substrate, and the water repellent layer is provided so as to overlap with at least an end portion of the overcoat layer.
Display device using semiconductor light emitting element
The present invention relates to a display device and, particularly, to a display device using a semiconductor light emitting element. The display device according to the present invention comprises a plurality of semiconductor light emitting elements mounted on a substrate, wherein at least one of the semiconductor light emitting elements comprises: a first conductive electrode and a second conductive electrode; a first conductive semiconductor layer in which the first conductive electrode is disposed; a second conductive semiconductor layer which overlaps the first conductive semiconductor layer and in which the second conductive electrode is disposed; a first passivation layer formed to cover outer surfaces of the first conductive semiconductor layer and the second conductive semiconductor layer; and a second passivation layer formed to cover the first passivation layer and formed such that at least a portion thereof varies in thickness.
Display device using semiconductor light emitting element
The present invention relates to a display device and, particularly, to a display device using a semiconductor light emitting element. The display device according to the present invention comprises a plurality of semiconductor light emitting elements mounted on a substrate, wherein at least one of the semiconductor light emitting elements comprises: a first conductive electrode and a second conductive electrode; a first conductive semiconductor layer in which the first conductive electrode is disposed; a second conductive semiconductor layer which overlaps the first conductive semiconductor layer and in which the second conductive electrode is disposed; a first passivation layer formed to cover outer surfaces of the first conductive semiconductor layer and the second conductive semiconductor layer; and a second passivation layer formed to cover the first passivation layer and formed such that at least a portion thereof varies in thickness.
DISPLAY DEVICE
Provided are a TFT layer, a light-emitting element layer provided with a plurality of light-emitting elements each including a first electrode, a function layer, and a second electrode, and a sealing layer configured to seal the light-emitting element layer. The second electrode is an electrode common to the plurality of light-emitting elements and including metal nanowires. The function layer includes a light-emitting layer and an electron transport layer provided between the light-emitting layer and the second electrode. The electron transport layer includes zinc oxide nanoparticles and a water soluble resin.
Manufacturing method of a display device
The purpose of the present invention is to realize the display device having thin film transistors of the oxide semiconductor of stable characteristics. An example of the concrete structure is that: A display device having a substrate including a display area, plural pixels formed in the display area, the pixel includes a first thin film transistor having an oxide semiconductor film, a first insulating film made of a first silicon oxide on a first side of the oxide semiconductor film, a second insulating film made of a second silicon oxide on a second side of the oxide semiconductor film, wherein oxygen desorption amount per unit area from the first insulating film is larger than that from the second insulating film, when measured by TDS (Thermal Desorption Spectrometry) provided M/z=32 and a measuring range in temperature is from 100 centigrade to 500 centigrade.