A resin composition for display substrates includes the following: the resin (a): a resin containing, as a main component, a repeating unit represented by the chemical formula (1), wherein the resin contains the total of 95 mass % or more of a tetracarboxylic acid residue A, having 2 or more carbon atoms and an SP value of 15 or more and 17 or less and a diamine residue having an SP value of 11 or more and 13 or less with respect to the total of 100 mass % of A and B contained in the resin; the solvent (b): a solvent having an SP value of 7.5 or more and less than 9.5; and the solvent (c): a solvent having an SP value of 9.5 or more and 14.0 or less;

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wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom, hydrocarbon group having 1 to 10 carbon atoms, alkylsilyl group having 1 to 10 carbon atoms, alkali metal ion, ammonium ion, imidazolium ion, or pyridinium ion.

An inorganic electroluminescence device having heat resistance, moisture resistance and physical durability improved by applying a transparent electrode layer including a metal mesh substrate or a metal patterned substrate, and a method for manufacturing the same.

An inorganic electroluminescence device having heat resistance, moisture resistance and physical durability improved by applying a transparent electrode layer including a metal mesh substrate or a metal patterned substrate, and a method for manufacturing the same.

This organic EL display device (100) has multiple pixels, and comprises: an element substrate (1) which has a substrate and multiple organic EL elements supported on the substrate and arranged in each of the multiple pixels; and a thin-film sealing structure (10) covering the multiple pixels. The thin-film sealing structure has a first inorganic barrier layer (12) and an organic barrier layer (14) contacting the upper surface or the lower surface of the first inorganic barrier layer. The element substrate further has a bank layer (33) defining each of the multiple pixels and multiple spacers (31) arranged in the gaps between the pixels, and the multiple spacers (31) are covered by the bank layer (33).

The display device includes a substrate including a first resin layer, a second resin layer overlapping the first resin layer, and a first inorganic insulating layer between the first resin layer and the second resin layer, and having flexibility, a display region provided on the substrate, a terminal region arranged outside the display region on the substrate, and a bending region arranged between the display region and the terminal region. A thickness of the second resin layer is larger than a thickness of the first resin layer. The substrate includes a first region and a second region. The first resin layer, the first inorganic insulating layer, and the second resin layer are laminated in the first region. The first resin layer and the second resin layer are laminated in the second region and the first inorganic insulating layer is not laminated in the second region.

According to a method for producing a flexible OLED device of the present disclosure, a multilayer stack (100) is provided, the multilayer stack including a base (10), a functional layer region (20) which includes a TFT layer and an OLED layer, a flexible film (30) provided between the base and the functional layer region and supporting the functional layer region, and a release layer (12) provided between the flexible film and the base and bound to the base. The release layer is irradiated with lift-off light (216) transmitted through the base, whereby the flexible film is delaminated from the release layer. The release layer is made of a polycrystalline of tantalum nitride.

According to a method for producing a flexible OLED device of the present disclosure, a multilayer stack (100) is provided, the multilayer stack including a base (10), a functional layer region (20) which includes a TFT layer and an OLED layer, a flexible film (30) provided between the base and the functional layer region and supporting the functional layer region, and a release layer (12) provided between the flexible film and the base and bound to the base. The release layer is irradiated with lift-off light (216) transmitted through the base, whereby the flexible film is delaminated from the release layer. The release layer is made of a polycrystalline of tantalum nitride.

A composition which is useful for producing a light emitting device having excellent luminance life is provided. The composition contains a primary fluorinated alcohol represented by the formula (1), a secondary fluorinated alcohol represented by the formula (1) and an electron injectable compound or an electron transportable compound, wherein the content of the secondary fluorinated alcohol is 0.01% by mass to 0.75% by mass with respect to the total content of the primary fluorinated alcohol and the secondary fluorinated alcohol:
C.sub.nH.sub.2nm+1F.sub.mOH(1)
C.sub.nH.sub.2nm+1F.sub.mOH(1)
In the formula (1), n represents an integer of 1 to 10, and m is an integer satisfying 1m2n+1. In the formula (1), n represents an integer of 3 to 10, and m is an integer satisfying 1m2n+1.

Provided is a manufacturing method of a display device in which, after a layered body including a resin layer, a TFT layer, and a light emitting element layer is formed on a substrate configured to form a plurality of display devices, the resin layer is irradiated with laser from a back face of the substrate and the substrate is peeled from the layered body using a laser peeling device. The manufacturing method of a display device includes acquiring optical information of the substrate that is peeled off, detecting each acquisition result of the plurality of display devices from each assigned position of the plurality of display devices relative to the substrate, and performing predetermined processing on the display device in a case that the acquisition result of the display device exceeds a threshold value.

A manufacturing method of a display device includes a layering process including steps of forming a PI layer on a carrier glass substrate, forming a base coat layer to cover the PI layer, and forming a TFT layer and a light-emitting element layer on the base coat layer, an exposing process including a step of exposing an end surface of the PI layer, and a peeling process including a step of peeling the carrier glass substrate from the PI layer by irradiating the lower face of the PI layer with a laser light beam.