Patent classifications
H05H3/02
Grating magneto optical trap
A two-dimensional magneto-optical trap (2D GMOT) that is configured to produce a cold-atom beam exiting the 2D GMOT is disclosed. In embodiments, the 2D GMOT is configured to feed a three-dimensional GMOT with the cold atom beam. In embodiments, the 2D GMOT includes an input light beam having its direction along a first axis, its width along a second axis, normal to the first axis, and a substantially flat input light beam intensity profile. 2D GMOT may further includes a quadrupole magnetic field with its magnitude being zero along a third axis that is centered at the center of the input light beam's width. The 2D GMOT may also include a diffraction-grating surface positioned normal to the first axis, composed of closely adjacent parallel grooves spread across the width and run parallel to the third axis.
Magneto-optical trap method and apparatus using positive and negative g-factors
A magneto-optical trap method including applying a magnetic field to an atom encapsulated in a vacuum vessel and having a nuclear spin of not less than 3/2 by using an anti-Helmholtz coil. Then generating a laser beam including a first laser beam detuned from a first resonance frequency when the atom transits from a total angular momentum quantum number F in a ground state to a total angular momentum quantum number F=F+1 in an excited state, and a second laser beam detuned from a second resonance frequency when the atom transits from the total angular momentum quantum number F in the ground state to a total angular momentum quantum number F=F?1 in the excited state.
Magneto-optical trap method and apparatus using positive and negative g-factors
A magneto-optical trap method including applying a magnetic field to an atom encapsulated in a vacuum vessel and having a nuclear spin of not less than 3/2 by using an anti-Helmholtz coil. Then generating a laser beam including a first laser beam detuned from a first resonance frequency when the atom transits from a total angular momentum quantum number F in a ground state to a total angular momentum quantum number F=F+1 in an excited state, and a second laser beam detuned from a second resonance frequency when the atom transits from the total angular momentum quantum number F in the ground state to a total angular momentum quantum number F=F?1 in the excited state.
Treatment method for defect reduction in a substrate and substrates treated thereby
A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.
Treatment method for defect reduction in a substrate and substrates treated thereby
A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.
Substrate bonding apparatus and substrate bonding method
A substrate bonding apparatus includes a vacuum chamber, a surface activation part for activating respective bonding surfaces of a first substrate and a second substrate, and stage moving mechanisms for bringing the two bonding surfaces into contact with each other, to thereby bond the substrates. In order to activate the bonding surfaces in the vacuum chamber, the bonding surfaces are irradiated with a particle beam for activating the bonding surfaces, and concurrently the bonding surfaces are also irradiated with silicon particles. It is thereby possible to increase the bonding strength of the substrates.
Substrate bonding apparatus and substrate bonding method
A substrate bonding apparatus includes a vacuum chamber, a surface activation part for activating respective bonding surfaces of a first substrate and a second substrate, and stage moving mechanisms for bringing the two bonding surfaces into contact with each other, to thereby bond the substrates. In order to activate the bonding surfaces in the vacuum chamber, the bonding surfaces are irradiated with a particle beam for activating the bonding surfaces, and concurrently the bonding surfaces are also irradiated with silicon particles. It is thereby possible to increase the bonding strength of the substrates.
Measurement by atomic interferometry with multiple species of atoms
Disclosed is a method for measuring an external parameter by atomic interferometry, using two sets of atoms that belong to different species. Two measurements are taken simultaneously at the same location, but independently from one another, in order to obtain two measurement results. One of these measurement results removes an indeterminacy among several possible values of the external parameter, by taking into account only the other measurement result. A method of this kind can be used to measure a coordinate of a gravitational field or a coordinate of an acceleration of the atoms.
Measurement by atomic interferometry with multiple species of atoms
Disclosed is a method for measuring an external parameter by atomic interferometry, using two sets of atoms that belong to different species. Two measurements are taken simultaneously at the same location, but independently from one another, in order to obtain two measurement results. One of these measurement results removes an indeterminacy among several possible values of the external parameter, by taking into account only the other measurement result. A method of this kind can be used to measure a coordinate of a gravitational field or a coordinate of an acceleration of the atoms.
Micro-structured atomic source system
A micro-structured atomic source system is described herein. One system includes a silicon substrate, a dielectric diaphragm, wherein the dielectric diaphragm includes a heater configured to heat an atomic source substance, an intermediary material comprising a chamber configured to receive the atomic source substance, and a guide material configured to direct a flux of atoms from the atomic source substance.