H05H3/02

Micro-structured atomic source system

A micro-structured atomic source system is described herein. One system includes a silicon substrate, a dielectric diaphragm, wherein the dielectric diaphragm includes a heater configured to heat an atomic source substance, an intermediary material comprising a chamber configured to receive the atomic source substance, and a guide material configured to direct a flux of atoms from the atomic source substance.

MEDICAL DEVICE FOR BONE IMPLANT AND METHOD FOR PRODUCING SUCH A DEVICE

A bone implantable medical device made from a biocompatible material, preferably comprising titania or zirconia, has at least a portion of its surface modified to facilitate improved integration with bone. The implantable device may incorporate a surface infused with osteoinductive agent and/or may incorporate holes loaded with a therapeutic agent. The infused surface and/or the holes may be patterned to determine the distribution of and amount of osteoinductive agent and/or therapeutic agent incorporated. The rate of release or elation profile of the therapeutic agent may be controlled. Methods for producing such a bone implantable medical device are also disclosed and employ the use of accelerated Neutral Beam irradiation, wherein the Neutral Beam is derived from an accelerated gas cluster ion beam irradiation for improving bone integration.

MEDICAL DEVICE FOR BONE IMPLANT AND METHOD FOR PRODUCING SUCH A DEVICE

A bone implantable medical device made from a biocompatible material, preferably comprising titania or zirconia, has at least a portion of its surface modified to facilitate improved integration with bone. The implantable device may incorporate a surface infused with osteoinductive agent and/or may incorporate holes loaded with a therapeutic agent. The infused surface and/or the holes may be patterned to determine the distribution of and amount of osteoinductive agent and/or therapeutic agent incorporated. The rate of release or elation profile of the therapeutic agent may be controlled. Methods for producing such a bone implantable medical device are also disclosed and employ the use of accelerated Neutral Beam irradiation, wherein the Neutral Beam is derived from an accelerated gas cluster ion beam irradiation for improving bone integration.

ARCHITECTURE FOR COMPACT COLD ATOM CLOCKS

An atomic oscillator device includes an atomic oscillator, a controlled oscillator, a resonance controller, and a cold-atom clock output. The atomic oscillator comprises a two-dimensional optical cooling region (2D OCR) for providing a source of atoms and a three-dimensional optical cooling region (3D OCR) for cooling and/or trapping the atoms emitted by the 2D OCR. The atomic oscillator comprises a microwave cavity surrounding the 3D OCR for exciting an atomic resonance. The controlled oscillator produces an output frequency. The resonance controller is for steering the output frequency of the controlled oscillator based on the output frequency and the atomic resonance as measured using an atomic resonance measurement. The cold-atom clock output is configured as being the output frequency of the controlled oscillator.

ARCHITECTURE FOR COMPACT COLD ATOM CLOCKS

An atomic oscillator device includes an atomic oscillator, a controlled oscillator, a resonance controller, and a cold-atom clock output. The atomic oscillator comprises a two-dimensional optical cooling region (2D OCR) for providing a source of atoms and a three-dimensional optical cooling region (3D OCR) for cooling and/or trapping the atoms emitted by the 2D OCR. The atomic oscillator comprises a microwave cavity surrounding the 3D OCR for exciting an atomic resonance. The controlled oscillator produces an output frequency. The resonance controller is for steering the output frequency of the controlled oscillator based on the output frequency and the atomic resonance as measured using an atomic resonance measurement. The cold-atom clock output is configured as being the output frequency of the controlled oscillator.

METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY

A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.

ENHANCED HIGH ASPECT RATIO ETCH PERFORMANCE USING ACCELERATED NEUTRAL BEAMS DERIVED FROM GAS-CLUSTER ION BEAMS

A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.

ENHANCED HIGH ASPECT RATIO ETCH PERFORMANCE USING ACCELERATED NEUTRAL BEAMS DERIVED FROM GAS-CLUSTER ION BEAMS

A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.

Measurement by means of atomic interferometry with multiple species of atoms

Disclosed is a method for measuring an external parameter by atomic interferometry using two sets of atoms that belong to different species. Two measurements are taken simultaneously at the same location, but independently from one another, in order to obtain two measurement results. Constant phase shifts that appear in the atomic interferences for the two atom sets are quadrature-adjusted in order to ensure that one of the two measurements provides a value for the external parameter with satisfactory accuracy.

Atomic ovens based on electric discharge
12106926 · 2024-10-01 · ·

Aspects of the present disclosure describe an atomic oven including a cathode, an anode that comprises a source material, and a power supply that provides a voltage between the cathode and the anode, wherein applying the voltage causes multiple electrons from the cathode to ablate the source material from the anode or locally heat the anode to cause source material to evaporate from the anode and, in both case, to produce a stream of ablated or evaporated particles that passes through an opening in the cathode.