A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.

The present disclosure relates to a magnet pole for an isochronous sector-focused cyclotron having hill and valley sectors alternatively distributed around a central axis, Z, each hill sector having an upper surface bounded by four edges: an upper peripheral edge, an upper central edge, a first and a second upper lateral edges. The upper peripheral edge of a hill sector may be an arc of circle whose center is offset with respect to the central axis, and whose radius, Rh, is not more than 85% of a distance, Lh, from the central axis to a midpoint of the upper peripheral edge. Furthermore, the midpoint may be equidistant to the first and second upper distal ends.

The present disclosure relates to a magnet pole for an isochronous sector-focused cyclotron having hill and valley sectors alternatively distributed around a central axis, Z, each hill sector having an upper surface bounded by four edges: an upper peripheral edge, an upper central edge, a first and a second upper lateral edges. The upper peripheral edge of a hill sector may be an arc of circle whose center is offset with respect to the central axis, and whose radius, Rh, is not more than 85% of a distance, Lh, from the central axis to a midpoint of the upper peripheral edge. Furthermore, the midpoint may be equidistant to the first and second upper distal ends.

An accelerator 4 includes a circular vacuum container including circular return yokes 5A, 5B. An injection electrode 18 is disposed closer to an inlet of a beam extraction path 20 in the return yoke 5B than a central axis C of the vacuum container. Magnetic poles 7A to 7F are radially disposed from the injection electrode 18 at the periphery of the injection electrode 18 in the return yoke 5B. Recessions 29A to 29F are disposed alternately with the magnetic poles 7A to 7F in the circumferential direction of the return yoke 5B. In the vacuum container, a concentric trajectory region, in which multiple beam turning trajectories centered around the injection electrode 18 are present, is formed, and an eccentric trajectory region, in which multiple beam turning trajectories eccentric from the injection electrode 18 are present, is formed around the region.

An accelerator 4 includes a circular vacuum container including circular return yokes 5A, 5B. An injection electrode 18 is disposed closer to an inlet of a beam extraction path 20 in the return yoke 5B than a central axis C of the vacuum container. Magnetic poles 7A to 7F are radially disposed from the injection electrode 18 at the periphery of the injection electrode 18 in the return yoke 5B. Recessions 29A to 29F are disposed alternately with the magnetic poles 7A to 7F in the circumferential direction of the return yoke 5B. In the vacuum container, a concentric trajectory region, in which multiple beam turning trajectories centered around the injection electrode 18 are present, is formed, and an eccentric trajectory region, in which multiple beam turning trajectories eccentric from the injection electrode 18 are present, is formed around the region.

A method and a device for changing direction of movement of a beam of accelerated charged particles are based on the use of a curved channel which is made from a material that is able to be electrically charged, and formation of the same kind of charge on an inside surface of the channel wall as that of the particles. Maintenance of a condition that relates an energy and a charge of the particles to geometrical parameters of the channel is required, in particular, a radius R of curvature of a longitudinal axis thereof, and to electrical strength of the wall material. The beam can possibly be rotated through large angles without loss of intensity, significantly simplifying a design, and also reducing the mass and dimensions of all devices, particularly by obviating a need for magnets and supply voltage and control voltage sources for such devices.

A method and a device for changing direction of movement of a beam of accelerated charged particles are based on the use of a curved channel which is made from a material that is able to be electrically charged, and formation of the same kind of charge on an inside surface of the channel wall as that of the particles. Maintenance of a condition that relates an energy and a charge of the particles to geometrical parameters of the channel is required, in particular, a radius R of curvature of a longitudinal axis thereof, and to electrical strength of the wall material. The beam can possibly be rotated through large angles without loss of intensity, significantly simplifying a design, and also reducing the mass and dimensions of all devices, particularly by obviating a need for magnets and supply voltage and control voltage sources for such devices.

A device of electric connection between two successive sections of the ring-shaped pipe of a synchrotron, including: first and second end parts capable of being fastened to the sections, each including a tubular portion with facets; electrically-conductive resilient fingers, each of which bears on each of the two tubular portions while being able to slide on one of said facets; and at least one arm bearing on each finger, each arm being fixed with respect to one of the end parts.