A compact, small foot print, light source based on electron beam acceleration for insertion devices in EUV range metrology and actinic mask inspection using coherent scattering methods includes spiral storage rings providing plane straight sections. A magnet structure generates emittance for brilliance and coherent light content. A booster feeds the storage ring by top-up injection and keeps electron beam intensity stable. A booster level below the storage ring receives the electron beam from a linear accelerator in a central booster area. The source fits into laboratories or maintenance areas. Injection, RF-acceleration, beam manipulating devices and large diagnostics systems are required once. Higher average currents stored in the spiral enhance central cone power. Bunches are limited by ion trapping and a gap clears ions. The current is increased in the spiral. Gain in central cone power increases 5 fold, assuming a gap size of half single storage ring circumference.

A compact, small foot print, light source based on electron beam acceleration for insertion devices in EUV range metrology and actinic mask inspection using coherent scattering methods includes spiral storage rings providing plane straight sections. A magnet structure generates emittance for brilliance and coherent light content. A booster feeds the storage ring by top-up injection and keeps electron beam intensity stable. A booster level below the storage ring receives the electron beam from a linear accelerator in a central booster area. The source fits into laboratories or maintenance areas. Injection, RF-acceleration, beam manipulating devices and large diagnostics systems are required once. Higher average currents stored in the spiral enhance central cone power. Bunches are limited by ion trapping and a gap clears ions. The current is increased in the spiral. Gain in central cone power increases 5 fold, assuming a gap size of half single storage ring circumference.

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

A radio-frequency (RF) cavity apparatus for accelerating charged particles includes first and second cavity arms. The first and second cavity arms have respective first and second axes of rotational symmetry and each cavity arm includes at least one cell. The first and second cavity arms are connected by a resonance coupler. The cell(s) of the first cavity arm have an axial dimensional parameter that is equal to a corresponding axial dimensional parameter of the cell(s) of the second cavity arm, and the cell(s) of the first cavity arm have at least one non-axial dimensional parameter that differs from corresponding non-axial dimensional parameter(s) of the cell(s) of the second cavity arm.

A radio-frequency (RF) cavity apparatus for accelerating charged particles includes first and second cavity arms. The first and second cavity arms have respective first and second axes of rotational symmetry and each cavity arm includes at least one cell. The first and second cavity arms are connected by a resonance coupler. The cell(s) of the first cavity arm have an axial dimensional parameter that is equal to a corresponding axial dimensional parameter of the cell(s) of the second cavity arm, and the cell(s) of the first cavity arm have at least one non-axial dimensional parameter that differs from corresponding non-axial dimensional parameter(s) of the cell(s) of the second cavity arm.

A beam equipment controlling method is provided. The method includes: proton beam regulatory steps, including: generating a first proton beam after confirming that the generating conditions are met, and marking the proton beam regulatory steps as completed after confirming that the first proton beam meets the specifications; neutron beam regulatory steps, including: generating a first neutron beam after confirming that the proton beam regulatory steps are completed and the generating conditions are met, confirming that the first neutron beam meets specifications, and marking the neutron beam regulatory steps as completed after turning off the cyclotron system; and treatment regulatory steps, including: generating a second neutron beam after confirming that the neutron beam regulatory steps are completed and the treatment-beam generating conditions are met, confirming that the second neutron beam meets treatment needs; and marking the treatment regulatory steps as completed after turning off the cyclotron system.

A beam equipment controlling method is provided. The method includes: proton beam regulatory steps, including: generating a first proton beam after confirming that the generating conditions are met, and marking the proton beam regulatory steps as completed after confirming that the first proton beam meets the specifications; neutron beam regulatory steps, including: generating a first neutron beam after confirming that the proton beam regulatory steps are completed and the generating conditions are met, confirming that the first neutron beam meets specifications, and marking the neutron beam regulatory steps as completed after turning off the cyclotron system; and treatment regulatory steps, including: generating a second neutron beam after confirming that the neutron beam regulatory steps are completed and the treatment-beam generating conditions are met, confirming that the second neutron beam meets treatment needs; and marking the treatment regulatory steps as completed after turning off the cyclotron system.

A particle beam irradiation system according to an aspect of the present invention includes two or more charged particle beam generation apparatuses capable of operating independently of each other, a beam transport line that transports charged particle beams generated by the charged particle beam generation apparatuses, and two or more beam irradiation apparatuses to which the charged particle beams are transported through the beam transport line. Any one of the beam irradiation apparatuses is configured such that the charged particle beams from a plurality of the charged particle beam generation apparatuses can be transported thereto, and the charged particle beams are simultaneously transported from the plurality of charged particle beam generation apparatuses to corresponding ones of the different beam irradiation apparatuses.

A particle beam irradiation system according to an aspect of the present invention includes two or more charged particle beam generation apparatuses capable of operating independently of each other, a beam transport line that transports charged particle beams generated by the charged particle beam generation apparatuses, and two or more beam irradiation apparatuses to which the charged particle beams are transported through the beam transport line. Any one of the beam irradiation apparatuses is configured such that the charged particle beams from a plurality of the charged particle beam generation apparatuses can be transported thereto, and the charged particle beams are simultaneously transported from the plurality of charged particle beam generation apparatuses to corresponding ones of the different beam irradiation apparatuses.