A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.

An electron accelerator is provided. The electron accelerator comprises a resonant cavity comprising a hollow closed conductor, an electron source configured to inject a beam of electrons, and an RF system. The electron accelerator further comprises a magnet unit, comprising a deflecting magnet. The deflecting magnet is configured to generate a magnetic field in a deflecting chamber in fluid communication with the resonant cavity by a deflecting window. The magnetic field is configured to deflect an electron beam emerging out of the resonant cavity through the deflecting window along a first radial trajectory in the mid-plane (Pm) and to redirect the electron beam into the resonant cavity through the deflecting window towards the central axis along a second radial trajectory. The deflecting magnet is composed of first and second permanent magnets positioned on either side of the mid-plane (Pm).

An electron accelerator is provided. The electron accelerator comprises a resonant cavity comprising a hollow closed conductor, an electron source configured to inject a beam of electrons, and an RF system. The electron accelerator further comprises a magnet unit, comprising a deflecting magnet. The deflecting magnet is configured to generate a magnetic field in a deflecting chamber in fluid communication with the resonant cavity by a deflecting window. The magnetic field is configured to deflect an electron beam emerging out of the resonant cavity through the deflecting window along a first radial trajectory in the mid-plane (Pm) and to redirect the electron beam into the resonant cavity through the deflecting window towards the central axis along a second radial trajectory. The deflecting magnet is composed of first and second permanent magnets positioned on either side of the mid-plane (Pm).

A dynamic magnetic field feed device feeds a magnetic field at predetermined timing to a predetermined region through which an ion beam having desired energy circulating in an acceleration space passes, and displaces a circular orbit of the ion beam having the desired energy. An extraction channel is arranged on an outer periphery of a magnetic pole. A position O1 where an ion introduction device introduces ions into the acceleration space is a position closer to the extraction channel relative to a center O2 of the magnetic pole. A region to which the dynamic magnetic field feed device feeds a magnetic field is a region closer to an opening of the extraction channel relative to the position O1 where ions are introduced, and the magnetic field to be fed is a magnetic field in a direction where the main magnetic field is strengthened.

A device for modulating the intensity of a charged particle beam emitted along an axis, comprises 4N consecutive deflection systems, with N=1 or 2, with the deflection systems being positioned along the axis of said particle beam, and being capable of deflecting the beam relative to the axis in the same direction, with alternating directions of deflection, for two consecutive systems, means for applying a force for deflecting the beam for each deflection system and for varying the applied force; two collimators each having a slot with an opening that increases in width from the center towards the periphery, located respectively between the first and second deflection systems and between the third and fourth deflection systems, with the opening of the slot of the first collimator facing towards one side of the emission axis of the beam, with the opening of the slot of the second collimator facing towards the opposite side of the emission axis of the beam.

A device for modulating the intensity of a charged particle beam emitted along an axis, comprises 4N consecutive deflection systems, with N=1 or 2, with the deflection systems being positioned along the axis of said particle beam, and being capable of deflecting the beam relative to the axis in the same direction, with alternating directions of deflection, for two consecutive systems, means for applying a force for deflecting the beam for each deflection system and for varying the applied force; two collimators each having a slot with an opening that increases in width from the center towards the periphery, located respectively between the first and second deflection systems and between the third and fourth deflection systems, with the opening of the slot of the first collimator facing towards one side of the emission axis of the beam, with the opening of the slot of the second collimator facing towards the opposite side of the emission axis of the beam.

A method and apparatus for use as a compact medical ion accelerator includes a charged particle linear accelerator module and a pair of fixed field magnet assemblies. The linear accelerator module accelerates a pulse of charged particles as a beam aligned along a first ray. The pair of assemblies controls the orbits of the pulse by turning the pulse 360 degrees within a first plane. The magnet assemblies are disposed on opposite sides of the linear accelerator with mirrored symmetry relative to a line that is perpendicular to the first ray and passes through a reference point in the first plane. Each assembly includes a pair of magnets for which a strength of a magnetic field varies non-linearly along a radial direction; and a superconducting magnet for which a strength of a magnetic field varies along a radial direction. The superconducting magnet is disposed between the pair of magnets.

Apparatuses and methods for accelerating charged particles including a charged particle source configured to provide charged particles, an accelerator including: a cavity having one or more inlets and one or more outlets, an electro-magnet substantially surrounding at least a portion of the cavity, a conductor disposed longitudinally within the cavity configured to accelerate the charged particles entering the cavity through the one or more inlets via a radio frequency wave applied to the cavity, wherein the radio frequency wave operates in transverse electromagnetic mode, and a target configured to receive the accelerated charged particles via the one or more outlets.