H05H7/08

COMPACT ELECTRON ACCELERATOR COMPRISING PERMANENT MAGNETS

An electron accelerator is provided. The electron accelerator comprises a resonant cavity comprising a hollow closed conductor, an electron source configured to inject a beam of electrons, and an RF system. The electron accelerator further comprises a magnet unit, comprising a deflecting magnet. The deflecting magnet is configured to generate a magnetic field in a deflecting chamber in fluid communication with the resonant cavity by a deflecting window. The magnetic field is configured to deflect an electron beam emerging out of the resonant cavity through the deflecting window along a first radial trajectory in the mid-plane (Pm) and to redirect the electron beam into the resonant cavity through the deflecting window towards the central axis along a second radial trajectory. The deflecting magnet is composed of first and second permanent magnets positioned on either side of the mid-plane (Pm).

COMPACT ELECTRON ACCELERATOR COMPRISING PERMANENT MAGNETS

An electron accelerator is provided. The electron accelerator comprises a resonant cavity comprising a hollow closed conductor, an electron source configured to inject a beam of electrons, and an RF system. The electron accelerator further comprises a magnet unit, comprising a deflecting magnet. The deflecting magnet is configured to generate a magnetic field in a deflecting chamber in fluid communication with the resonant cavity by a deflecting window. The magnetic field is configured to deflect an electron beam emerging out of the resonant cavity through the deflecting window along a first radial trajectory in the mid-plane (Pm) and to redirect the electron beam into the resonant cavity through the deflecting window towards the central axis along a second radial trajectory. The deflecting magnet is composed of first and second permanent magnets positioned on either side of the mid-plane (Pm).

INSERTION DEVICE
20180124911 · 2018-05-03 · ·

An insertion device includes first and second magnet arrays facing each other with a gap therebetween, magnet supporting members adapted to support the magnet arrays mounted thereto, a gap driving mechanism for driving the first and second magnet supporting members in the vertical direction for changing the gap size, a driving conjunction mechanism for coupling the gap driving mechanism and the magnet supporting members to each other, compensation spring mechanisms adapted to compensate for attractive forces acting on the first and second magnet arrays, a spring conjunction mechanism for coupling the compensation spring mechanisms and the magnet supporting members to each other, a first supporting frame for supporting the gap driving mechanism, a second supporting frame for supporting the compensation spring mechanisms, and a common base placed on a placement surface, wherein the first supporting frame and the second supporting frame are individually coupled to the common base.

CHARGE STRIPPING FILM FOR CHARGE STRIPPING DEVICE OF ION BEAM

A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 m to 150 m, an area of at least 4 cm.sup.2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25 C. of at least 300 W/mK, and has a film thickness of 10 m to 150 m, an area of at least 4 cm.sup.2, and an atomic concentration of carbon of at least 97%.

Systems, devices, and methods for ion beam modulation

Embodiments of systems, devices, and methods relate to an ion beam source system. An ion source is configured to provide a negative ion beam to a tandem accelerator system downstream of the ion source, and a modulator system connected to an extraction electrode of the ion source is configured to bias the extraction electrode for a duration sufficient to maintain acceleration voltage stability of the tandem accelerator system.

Particle beam treatment apparatus and accelerator
12145005 · 2024-11-19 · ·

Provided is a particle beam treatment apparatus irradiating an irradiation target with a particle beam. The apparatus includes: an accelerator that generates the particle beam in an acceleration space; and an irradiation unit that virtually divides the irradiation target into a plurality of layers and irradiates each layer while performing scanning with the particle beam with a scanning electromagnet. The accelerator includes a particle generation unit generating particles that are to accelerate in the acceleration space, and the accelerator sets a parameter of the particle generation unit based on at least one of the layers of the irradiation target and adjusts an intensity of the particle beam based on the set parameter.

Particle beam treatment apparatus and accelerator
12145005 · 2024-11-19 · ·

Provided is a particle beam treatment apparatus irradiating an irradiation target with a particle beam. The apparatus includes: an accelerator that generates the particle beam in an acceleration space; and an irradiation unit that virtually divides the irradiation target into a plurality of layers and irradiates each layer while performing scanning with the particle beam with a scanning electromagnet. The accelerator includes a particle generation unit generating particles that are to accelerate in the acceleration space, and the accelerator sets a parameter of the particle generation unit based on at least one of the layers of the irradiation target and adjusts an intensity of the particle beam based on the set parameter.

SYNCHROTRON INJECTOR SYSTEM AND OPERATING METHOD FOR DRIFT TUBE LINEAR ACCELERATOR

When accelerating first ions, radio frequency power is fed to a drift tube linear accelerator so that the phase difference between an accelerating half cycle for accelerating the first ions in one of the plurality of drift tube gaps and the accelerating half cycle for accelerating the accelerated first ions reaching the next drift tube gap is set to a first accelerating cycle phase difference; and when accelerating second ions having a charge-to-mass ratio lower than the first ions, the radio frequency power is fed to the drift tube linear accelerator so that the phase difference between an accelerating half cycle for accelerating the second ions in the one drift tube gap and the accelerating half cycle for the accelerated second ions reaching the next drift tube gap is set to a second accelerating cycle phase difference that is larger than the first accelerating cycle phase difference.

SYNCHROTRON INJECTOR SYSTEM AND OPERATING METHOD FOR DRIFT TUBE LINEAR ACCELERATOR

When accelerating first ions, radio frequency power is fed to a drift tube linear accelerator so that the phase difference between an accelerating half cycle for accelerating the first ions in one of the plurality of drift tube gaps and the accelerating half cycle for accelerating the accelerated first ions reaching the next drift tube gap is set to a first accelerating cycle phase difference; and when accelerating second ions having a charge-to-mass ratio lower than the first ions, the radio frequency power is fed to the drift tube linear accelerator so that the phase difference between an accelerating half cycle for accelerating the second ions in the one drift tube gap and the accelerating half cycle for the accelerated second ions reaching the next drift tube gap is set to a second accelerating cycle phase difference that is larger than the first accelerating cycle phase difference.

Method of producing brazeless accelerating structures

A resonant apparatus such as a resonant waveguide module in an RF particle accelerator includes an unbrazed joint that provides a reliable vacuum seal and RF contact between resonators with precisely controlled internal geometry. The joint can be disassembled and reassembled without degradation. Hard, stainless steel end faces include knife edges pressed into a copper central component, such as a gasket. The knife edges extend the waveguide interiors without gaps or interruptions. The central component serves as a coupling iris or other functional component of the resonant apparatus, thereby allowing the central component to have substantial dimensions that inhibit mechanical distortions thereof. The waveguides and knife edges can be copper plated. Embodiments include embedded passages and/or recesses used for cooling, radiation shielding, magnetic focusing coils, and/or electron optics element formed by permanent magnets.