H05H7/08

ECR ION SOURCE AND METHOD FOR OPERATING AN ECR ION SOURCE
20200357614 · 2020-11-12 · ·

An ECR (Electron Cyclotron Resonance) ion source includes a plasma chamber having a circular cylindrical cross-section, magnets for generating a magnetic field for confinement of the plasma in the plasma chamber, and a microwave generator disposed outside the plasma chamber and generating at least two microwave signals. Several antennas protrude radially into the plasma chamber with a predetermined angular offset . The antennas receive phase-shifted microwave signals from the microwave generator and radiate linearly polarized microwaves, which in turn produce a circularly polarized microwave inside the plasma chamber. A method for operating an ECR ion source is also described.

Charge stripping film for ion beam

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

Charge stripping film for ion beam

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

BROAD BAND TUNABLE ENERGY ELECTRON BEAM PULSER

An electromagnetic mechanical pulser implements a transverse wave metallic comb stripline TWMCS kicker having inwardly opposing teeth that retards a phase velocity of an RF traveling wave to match the kinetic velocity of a continuous electron beam, causing the beam to oscillate before being chopped into pulses by an aperture. The RF phase velocity is substantially independent of RF frequency and amplitude, thereby enabling independent tuning of the electron pulse widths and repetition rate. The TWMCS further comprises an electron pulse picker (EPP) that applies a pulsed transverse electric field across the TWMCS to deflect electrons out of the beam, allowing only selected electrons and/or groups of electrons to pass through. The EPP pulses can be synchronized with the RF traveling wave and/or with a pumping trigger of a transverse electron microscope (TEM), for example to obtain dynamic TEM images in real time.

Broad band tunable energy electron beam pulser

An electromagnetic mechanical pulser implements a transverse wave metallic comb stripline TWMCS kicker having inwardly opposing teeth that retards a phase velocity of an RF traveling wave to match the kinetic velocity of a continuous electron beam, causing the beam to oscillate before being chopped into pulses by an aperture. The RF phase velocity is substantially independent of RF frequency and amplitude, thereby enabling independent tuning of the electron pulse widths and repetition rate. The TWMCS further comprises an electron pulse picker (EPP) that applies a pulsed transverse electric field across the TWMCS to deflect electrons out of the beam, allowing only selected electrons and/or groups of electrons to pass through. The EPP pulses can be synchronized with the RF traveling wave and/or with a pumping trigger of a transverse electron microscope (TEM), for example to obtain dynamic TEM images in real time.

Apparatus for generating accelerated electrons

An apparatus is provided for generating accelerated electrons, including a housing; an inlet for supplying a working gas; at least one first cathode; and at least one first anode, between which a corona discharge plasma can be generated. Ions from the corona discharge plasma can be accelerated onto the surface of a second cathode. Electrons emitted by the second cathode can be accelerated in the direction of the electron exit window by means of a second electric voltage applied between the second cathode and a second anode. The housing, the second cathode, and the electron exit window are ring-shaped. The ring-shaped space is divided into ring segments. Each ring segment has at least one wire-shaped electrode, which extends through the ring segment. At least one separate power supply device is associated with each ring segment, by means of which the strength of the electrical current is adjustable.

Insertion device
10798811 · 2020-10-06 · ·

A device includes: a first magnet array; a first magnet support body; a second magnet array; a second magnet support body; a gap drive mechanism for performing vertical drive of the magnet support bodies to change a gap; first, second connection beams connected to the magnet support bodies; a mechanism for connecting the connection beams to the gap drive mechanism; a cancellation spring mechanism for cancelling a suction force that acts between magnet arrays; and a spring interlocking mechanism for connecting the cancellation spring mechanism to the magnet support bodies. In the spring interlocking mechanism, first and second spring support frames that are connected to the first and second connection beams via a connecting portion, and a guide mechanism for guiding vertical movements of the first and second spring support frames are mounted, and the cancellation spring mechanism are mounted to both the first and second spring support frames.

Insertion device
10798811 · 2020-10-06 · ·

A device includes: a first magnet array; a first magnet support body; a second magnet array; a second magnet support body; a gap drive mechanism for performing vertical drive of the magnet support bodies to change a gap; first, second connection beams connected to the magnet support bodies; a mechanism for connecting the connection beams to the gap drive mechanism; a cancellation spring mechanism for cancelling a suction force that acts between magnet arrays; and a spring interlocking mechanism for connecting the cancellation spring mechanism to the magnet support bodies. In the spring interlocking mechanism, first and second spring support frames that are connected to the first and second connection beams via a connecting portion, and a guide mechanism for guiding vertical movements of the first and second spring support frames are mounted, and the cancellation spring mechanism are mounted to both the first and second spring support frames.

Modular beam amplifier
10772185 · 2020-09-08 · ·

A modular beam amplifier for use in generating high power beams of particles in systems such as a spacecraft propulsion engine, comprising a distributed DC power generator including a plurality of DC generator cells connected in series to each other and a plurality of power taps at different points between the DC generator cells, an ion injector producing a particle beam and a plurality of amplifier modules in series with each other and coaxial with the particle beam. Each amplifier module in the plurality of amplifier modules includes a focus lens and a plurality of annular amplifier plates. Each amplifier plate pairs with and connects to a power tap. The plurality of DC generator cells is physically arranged in a serpentine arrangement of connected rows to minimize the physical length of the distributed DC power generator.

Modular beam amplifier
10772185 · 2020-09-08 · ·

A modular beam amplifier for use in generating high power beams of particles in systems such as a spacecraft propulsion engine, comprising a distributed DC power generator including a plurality of DC generator cells connected in series to each other and a plurality of power taps at different points between the DC generator cells, an ion injector producing a particle beam and a plurality of amplifier modules in series with each other and coaxial with the particle beam. Each amplifier module in the plurality of amplifier modules includes a focus lens and a plurality of annular amplifier plates. Each amplifier plate pairs with and connects to a power tap. The plurality of DC generator cells is physically arranged in a serpentine arrangement of connected rows to minimize the physical length of the distributed DC power generator.