A linear accelerator system comprising a source arranged to produce a pulsed beam of charged particles, a linear accelerator string arranged to accelerate the pulsed beam up to a predetermined range of energies, and a pre-acceleration stage interposed between the source and the linear accelerator string and arranged to accelerate the pulsed beam up to an energy suitable for beam insertion into the linear accelerator string and perform bunching of the pulsed beam. An average current detector is arranged to measure an average current in the pulsed beam, the average current detector comprising at least one non-interceptive sensor placed at an input side of the linear accelerator string, downstream of the pre-acceleration stage, the sensor being responsive to the pulsed beam passing thereby.

A linear accelerator system comprising a source arranged to produce a pulsed beam of charged particles, a linear accelerator string arranged to accelerate the pulsed beam up to a predetermined range of energies, and a pre-acceleration stage interposed between the source and the linear accelerator string and arranged to accelerate the pulsed beam up to an energy suitable for beam insertion into the linear accelerator string and perform bunching of the pulsed beam. An average current detector is arranged to measure an average current in the pulsed beam, the average current detector comprising at least one non-interceptive sensor placed at an input side of the linear accelerator string, downstream of the pre-acceleration stage, the sensor being responsive to the pulsed beam passing thereby.

An accelerator comprising at least one accelerator cavity, an electron gun, at least one cavity cooler configured to at least partially encircle the accelerator cavity, a cooling connector, an intermediate conduction layer formed between the at least one cavity cooler and the at least one accelerator cavity configured to facilitate thermal conductivity between the cavity cooler and the accelerator cavity, a mechanical support connected to the accelerator cavity via at least one endplate and configured for stabilizing the accelerator cavity, and a refrigeration source for providing refrigerant via the cooling connector to the at least one cavity cooler.

An accelerator comprising at least one accelerator cavity, an electron gun, at least one cavity cooler configured to at least partially encircle the accelerator cavity, a cooling connector, an intermediate conduction layer formed between the at least one cavity cooler and the at least one accelerator cavity configured to facilitate thermal conductivity between the cavity cooler and the accelerator cavity, a mechanical support connected to the accelerator cavity via at least one endplate and configured for stabilizing the accelerator cavity, and a refrigeration source for providing refrigerant via the cooling connector to the at least one cavity cooler.

A radio frequency coupler includes a waveguide having an outer conductor and an inner conductor in a coaxial tube shape. The waveguide extends linearly from a power supply side, is bent in an L shape at a bend section, and extends linearly toward an acceleration cavity. A refrigerant passage part passes through the outer conductor and the inner conductor at the bend section from the outside of the waveguide toward the acceleration cavity and is connected to the interior of the inner conductor. The refrigerant passage part has a passage tube through which refrigerant passes between the inner part of the tip on the acceleration cavity side of the inner conductor, and the outer part of the waveguide, and the portion of the passage tube that is exposed to a radio frequency transmission space formed between the outer conductor and the inner conductor being formed of an insulator.

A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.

A linear accelerator comprises side-coupled cavity cells configured to accelerate electrons with a radio frequency field. The field amplitude in the initial cells is lower than in the later cells, and the initial cells are shorter than the later cells. This creates a capture section where electrons are captured and bunched while experiencing low acceleration, followed by an acceleration section where the bunched electrons experience stronger acceleration.

A linear accelerator comprises side-coupled cavity cells configured to accelerate electrons with a radio frequency field. The field amplitude in the initial cells is lower than in the later cells, and the initial cells are shorter than the later cells. This creates a capture section where electrons are captured and bunched while experiencing low acceleration, followed by an acceleration section where the bunched electrons experience stronger acceleration.

An accelerator (30, 40, 50) includes: a plurality of acceleration cavities (31, 41, 51) having one or two acceleration gaps; and a plurality of first control means (33, 43, 53) provided with respect to each of the plurality of acceleration cavities, each of the plurality of first control means independently generating an oscillating electric field and controlling a motion of an ion beam inside a corresponding acceleration cavity. In addition, M-number of multipole magnets (32, 42, 52) which generate a magnetic field and which control a motion of an ion beam may be provided downstream to N-number of acceleration cavities. The first control means independently controls acceleration voltage and a phase thereof and supplies radiofrequency power. Accordingly, particularly in a front stage of acceleration, a DC beam from an ion generation source can be adiabatically captured.

A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.