A free electron laser FEL comprises an undulator 24 generating coherent EUV radiation receiving an upstream electron beam EB2 and emitting a downstream electron beam EB4 and at least an electron source 21a, 21b operable to produce an upstream electron beam EB1, EB2 comprising bunches of electrons. A beam path is configured to direct the upstream electron beam through: a linear accelerator system (LINAC) comprising at least a first and a second linear accelerators 22a, 22b, a bunch compressor 28b, and said undulator 24. The downstream electron beam EB3, EB4 that leaves the undulator 24 recirculates through the second linear accelerator 22b in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the second linear accelerator 22b and then recirculates through the first linear accelerator 22a in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the first linear accelerator 22a; and to direct the downstream beam to a beam dump 100. At least a first energy spreader 50a, 50b, 50c imparts a reversible change to the energy distribution of bunches of electrons and is located at a position in the beam path before the bunch compressor 28b and so that it is only passed through by the upstream electron beam EB1. A second energy spreader 50d reverses the change to the energy distribution of bunches of electrons imparted by the at least one first energy spreader 50a, 50b, 50c, the second energy spreader 50d being located at a position in the beam path before the undulator 24 and so that it is only passed through by the upstream electron beam EB2.

A free electron laser FEL comprises an undulator 24 generating coherent EUV radiation receiving an upstream electron beam EB2 and emitting a downstream electron beam EB4 and at least an electron source 21a, 21b operable to produce an upstream electron beam EB1, EB2 comprising bunches of electrons. A beam path is configured to direct the upstream electron beam through: a linear accelerator system (LINAC) comprising at least a first and a second linear accelerators 22a, 22b, a bunch compressor 28b, and said undulator 24. The downstream electron beam EB3, EB4 that leaves the undulator 24 recirculates through the second linear accelerator 22b in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the second linear accelerator 22b and then recirculates through the first linear accelerator 22a in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the first linear accelerator 22a; and to direct the downstream beam to a beam dump 100. At least a first energy spreader 50a, 50b, 50c imparts a reversible change to the energy distribution of bunches of electrons and is located at a position in the beam path before the bunch compressor 28b and so that it is only passed through by the upstream electron beam EB1. A second energy spreader 50d reverses the change to the energy distribution of bunches of electrons imparted by the at least one first energy spreader 50a, 50b, 50c, the second energy spreader 50d being located at a position in the beam path before the undulator 24 and so that it is only passed through by the upstream electron beam EB2.

A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.

A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.

A superconducting accelerator includes an acceleration cavity, and a refrigerant tank at an outer circumference of the acceleration cavity. The gap between the refrigerant tank and the acceleration cavity is filled with a refrigerant for cooling the acceleration cavity. A pair of pressing members is provided to an outer circumference of the refrigerant tank to be positioned at both side ends of the acceleration cavity in a direction of a beam axis of the charged particle beam or at both ends of the acceleration cavity in a direction perpendicular to the beam axis. A wire is continuously wound around the outer circumference of the refrigerant tank and configured to generate a tensile force in a direction in which the pressing members are brought come into close each other. A tension adjustor is configured to adjust the tensile force generated by the wire.

Methods for generating a multiple-energy X-ray pulse. A beam of electrons is generated with an electron gun and modulated prior to injection into an accelerating structure to achieve at least a first and specified beam current amplitude over the course of respective beam current temporal profiles. A radio frequency field is applied to the accelerating structure with a specified RF field amplitude and a specified RF temporal profile. The first and second specified beam current amplitudes are injected serially, each after a specified delay, in such a manner as to achieve at least two distinct endpoint energies of electrons accelerated within the accelerating structure during a course of a single RF-pulse. The beam of electrons is accelerated by the radio frequency field within the accelerating structure to produce accelerated electrons which impinge upon a target for generating Bremsstrahlung X-rays.

Methods for generating a multiple-energy X-ray pulse. A beam of electrons is generated with an electron gun and modulated prior to injection into an accelerating structure to achieve at least a first and specified beam current amplitude over the course of respective beam current temporal profiles. A radio frequency field is applied to the accelerating structure with a specified RF field amplitude and a specified RF temporal profile. The first and second specified beam current amplitudes are injected serially, each after a specified delay, in such a manner as to achieve at least two distinct endpoint energies of electrons accelerated within the accelerating structure during a course of a single RF-pulse. The beam of electrons is accelerated by the radio frequency field within the accelerating structure to produce accelerated electrons which impinge upon a target for generating Bremsstrahlung X-rays.

A system (12) is proposed for the acceleration of ions to treat Atrial Fibrillation (AF), arteriovenous malformations (AVMS) and focal epileptic lesions; this system (12) includes a pulsed ion source (1), a pre-accelerator (3) and one or more linear accelerators or linacs (5, 6, 7) operating at frequencies above 1 GHz with a repetition rate between 1 Hz and 500 Hz. The particle beam coming out of the complex (12) can vary (i) in intensity, (ii) in deposition depth and (iii) transversally with respect to the central beam direction. The possibility of adjusting in a few milliseconds and in three orthogonal directions, the location of each energy deposition in the body of the patient makes that system of accelerators (12) perfectly suited to irradiation of a beating heart.

Some embodiments include a system comprising: a first control logic configured to receive a first trigger and generate a second trigger in response to the first trigger the second trigger having a delay relative to the first trigger of a configurable number of cycles of a counter of the first control logic; a second control logic configured to receive the second trigger and generate a third trigger in response to the second trigger the third trigger having a delay relative to the second trigger of a configurable number of cycles of a counter of the second control logic; and a third control logic configured to receive the second trigger and generate a fourth trigger in response to the second trigger the fourth trigger having a delay relative to the second trigger of a configurable number of cycles of a counter of the third control logic. A particle beam may be accelerated in response to the triggers.

Some embodiments include a system comprising: a first control logic configured to receive a first trigger and generate a second trigger in response to the first trigger the second trigger having a delay relative to the first trigger of a configurable number of cycles of a counter of the first control logic; a second control logic configured to receive the second trigger and generate a third trigger in response to the second trigger the third trigger having a delay relative to the second trigger of a configurable number of cycles of a counter of the second control logic; and a third control logic configured to receive the second trigger and generate a fourth trigger in response to the second trigger the fourth trigger having a delay relative to the second trigger of a configurable number of cycles of a counter of the third control logic. A particle beam may be accelerated in response to the triggers.