H05H13/04

Optical Etendue Matching Methods for Extreme Ultraviolet Metrology
20200383200 · 2020-12-03 ·

An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.

Optical Etendue Matching Methods for Extreme Ultraviolet Metrology
20200383200 · 2020-12-03 ·

An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.

Particle therapy system
10850132 · 2020-12-01 · ·

A particle therapy system in which the efficiency of extracting a beam from a synchrotron can be improved and time required for therapy can be shortened is provided. The synchrotron 10 of the particle therapy system 100 extracts a charged particle beam, which circulates in the synchrotron 10, out of the synchrotron 10 by means of a slow extraction method using the resonance of a betatron oscillation, and magnetic poles 73 included in a bending magnet 12 of the synchrotron 10 have a SIM structure that generates a magnetic field distribution that makes the horizontal tune of the charged particle more closely approach a resonant line used in the slow extraction method as the amplitude of the horizontal betatron oscillation of a charged particle included in the charged particle beam becomes larger.

Particle therapy system
10850132 · 2020-12-01 · ·

A particle therapy system in which the efficiency of extracting a beam from a synchrotron can be improved and time required for therapy can be shortened is provided. The synchrotron 10 of the particle therapy system 100 extracts a charged particle beam, which circulates in the synchrotron 10, out of the synchrotron 10 by means of a slow extraction method using the resonance of a betatron oscillation, and magnetic poles 73 included in a bending magnet 12 of the synchrotron 10 have a SIM structure that generates a magnetic field distribution that makes the horizontal tune of the charged particle more closely approach a resonant line used in the slow extraction method as the amplitude of the horizontal betatron oscillation of a charged particle included in the charged particle beam becomes larger.

HELICAL SUPERCONDUCTING UNDULATOR FOR 3RD AND 4TH GENERATION OF SYNCHROTRON LIGHT SOURCE AND FELS

A helical superconducting undulator includes a cylindrical magnetic core through which a bore hole allows the passage of charged particles. A single superconducting wire wraps the magnetic core guided by helical flights and cylindrical protrusions, to create interleaved helical windings on the magnetic core. An electrical current may be supplied to the superconducting wire to generate a periodic helical magnetic field in the bore. The helical superconducting undulator also includes a strong-back enclosure that acts as an epoxy mold during epoxy impregnation, a structural support to ensure straightness of the undulator after epoxy impregnation, and assists in cooling and thermal control of the magnetic core and superconducting wire during device operation.

HELICAL SUPERCONDUCTING UNDULATOR FOR 3RD AND 4TH GENERATION OF SYNCHROTRON LIGHT SOURCE AND FELS

A helical superconducting undulator includes a cylindrical magnetic core through which a bore hole allows the passage of charged particles. A single superconducting wire wraps the magnetic core guided by helical flights and cylindrical protrusions, to create interleaved helical windings on the magnetic core. An electrical current may be supplied to the superconducting wire to generate a periodic helical magnetic field in the bore. The helical superconducting undulator also includes a strong-back enclosure that acts as an epoxy mold during epoxy impregnation, a structural support to ensure straightness of the undulator after epoxy impregnation, and assists in cooling and thermal control of the magnetic core and superconducting wire during device operation.

FAST-SWITCH UNDULATOR AND METHOD FOR POLARIZING ELECTRON BEAM

An undulator is adapted to a synchrotron storage ring or free electron lasers (FEL), especially to an undulator capable of switching polarization mode rapidly. In comparison with the EPU (elliptically polarized undulator) of APPLE II (Advanced Planar Polarized Light Emitter II) which conceived by Dr. S. Sasaki, the provided undulator does not use mechanical transmission mechanisms to drive the four magnetic pole arrays composed of permanent magnets. Hence, the polarization mode can be switched rapidly. Moreover, a polarization method of electron beam is also provided.

Charge stripping film for ion beam

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

Charge stripping film for ion beam

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

ACCELERATOR AND PARTICLE THERAPY SYSTEM
20200330793 · 2020-10-22 · ·

An accelerator includes: a plurality of ion sources 221, 222, and 233 that generate a plurality of different types of ions; an electromagnet 11 that generates a magnetic field; and a high frequency cavity 21 that generates a high frequency electric field. The center of an orbit of the ion is eccentric with acceleration, the magnetic field generated by the electromagnet 11 is a magnetic field distribution that decreases outward in a radial direction of the orbit, the high frequency cavity 21 accelerates the ion up to a predetermined energy by the high frequency electric field adjusted to an orbital frequency in response to a nuclide of the incident ion, and a frequency of the high frequency electric field changes following an energy of the ion. Accordingly, it is possible to provide an accelerator and a particle therapy system capable shortening an irradiation time with a small size.