Patent classifications
H05H2242/10
High-temperature superconducting plasma thruster system having variable temperature ranges and being applied in space
A high-temperature superconducting plasma thruster system, having variable temperature ranges and being applied in space, is provided. The high-temperature superconducting plasma thruster system includes: a cathode-anode assembly, a high-temperature superconducting magnet system, a supporting and adjusting platform, a power-and-gas supply and cooling system, and an obtaining control system. The cathode-anode assembly is disposed at a center of a ring of the high-temperature superconducting magnet system; the cathode-anode assembly and the high-temperature superconducting magnet system are spatially engaged with each other by the supporting and adjusting platform to form a main body of the thruster system; the power-and-gas supply and cooling system and the obtaining control system are located outside of the main body of the thruster system and are connected to the cathode-anode assembly and the high-temperature superconducting magnet system.
CATHODE END COOLING SYSTEMS FOR PLASMA WINDOWS POSITIONED IN A BEAM ACCELERATOR SYSTEM
A beam accelerator system comprises an ion accelerator that generates a high-energy ion beam, a low-pressure chamber, an anode adjacent and fluidly connected to the low-pressure chamber, a plasma window adjacent and fluidly connected to the anode, and a cathode housing block adjacent and fluidly connected to the plasma window. The plasma window comprises a plurality of cooling plates, each cooling plate comprising an aperture that is aligned with an aperture in one or more adjacent cooling plate to form a plasma channel. The cathode housing block comprises a cathode target region and a cooling portion. The cooling portion comprises a fluid inlet, a fluid outlet, a cooling channel fluidly coupling the fluid inlet and the fluid outlet, and an opening adjacent to the plasma window and aligned with a longitudinal axis of the plasma channel.
DIELECTRIC BARRIER DISCHARGE PLASMA METHOD AND APPARATUS FOR SYNTHESIZING METAL PARTICLES
A dielectric barrier discharge (DBD) plasma apparatus for synthesizing metal particles is provided. The DBD plasma apparatus includes an electrolyte vessel for receiving an electrolyte solution comprising metal ions; an electrode spaced-apart from the electrolyte vessel; a dielectric barrier interposed between the electrolyte vessel and the electrode such that, when the electrolyte solution is present in the electrolyte vessel, the dielectric barrier and an upper surface of the electrolyte solution are spaced-apart from each other and define a discharge area therebetween; and gas inlet and outlet ports in fluid communication with the discharge area such that supplying gas in the discharge area while applying an electrical potential difference between the electrode and the electrolyte solution cause a plasma to be produced onto the electrolyte solution, the plasma interacting with the metal ions and synthesizing metal particles. A method for synthesizing metal particles using a DBD plasma apparatus is also provided.
PLATE-TYPE OZONE GENERATOR AND SYSTEM FOR GENERATING OZONE
A plate-type ozone generator includes a first ground electrode plate, second ground electrode plate, central plate and reactor middle frame arranged between first end and second end of plate-type ozone generator, wherein the central plate houses the reactor middle frame that is moveable from centre of central plate. The frame includes a high-voltage electrode plate, first dielectric barrier plate and second dielectric barrier plate, first gap being formed between first dielectric barrier plate and first ground electrode plate and second gap being formed between second dielectric barrier plate and second ground electrode plate. The first gap and second gap are filled with gas. A power source is used to charge the first ground electrode plate, second ground electrode plate, and high-voltage electrode plate. Dielectric barrier discharge occurs for generating ozone.
Matchless plasma source for semiconductor wafer fabrication
A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
CHARGED PARTICLE BEAM DEFLECTION DEVICE
A charged particle beam deflection device includes a layered structure including a plurality of layers and having a hollow shape through which a charged particle beam passes, a first coil configured to deflect the charged particle beam in a first direction different from a travel direction of the charged particle beam, a second coil configured to deflect the charged particle beam in a second direction, and a pressing portion located on an outer peripheral surface of the layered structure and configured to press the outer peripheral surface from the exterior toward the interior. The plurality of layers includes a first coil support layer configured to support the first coil and a second coil support layer configured to support the second coil. The layered structure includes a gap, through which a cooling solvent can flow, between two adjacent layers among the plurality of layers.
INVERTED PLASMA SOURCE
A plasma source, comprising a plasma source body, comprising: a plurality of magnetic cores, a plurality of primary windings capable of being energized, and a cooling structure, wherein one or more sections of the plasma source body comprising a dielectric material, and wherein, when the plurality of primary windings are energized, a plasma forms around an outer portion of the plasma source body.
Method and apparatus for plasma ignition in toroidal plasma sources
A plasma apparatus of a plasma processing system is provided. The plasma apparatus defines a toroidal plasma channel and includes multiple end blocks defining respective portions of the toroidal plasma channel. Each end block includes an end-block tube constructed from a first electrically conductive material and a dielectric coating disposed on an interior surface of the end-block tube. The plasma apparatus also includes multiple mid-blocks defining respective portions of the toroidal plasma channel. Each mid-block includes at least one heat sink located adjacent to a substantially linear tube with a thermal interface disposed therebetween. The thermal interface is in physical communication with the tube and the at least one heat sink. The mid-block tube has a substantially uniform wall thickness and is constructed from a dielectric material. The at least one heat sink is constructed from a second electrically conductive material.
Pulsed Ion current transmitter with cyclical current aggregation
A pulsed ion current antenna includes an enclosed racetrack having an interior configured to be placed under vacuum. The enclosed racetrack has an ion injection zone, a beam merging zone, a first beam bending zone, a beam return zone, and a second beam bending zone. An ion source is provided at an end of the ion injection zone. Two parallel magnet plates are provided in each of the first and second beam bending zones, configured to produce a respective magnetic field that bends a path of travel of an ion beam within the enclosed racetrack. A plurality of loop coils are configured to generate magnetic fields to shape travel of ions within the enclosed racetrack such that ions from the ion source that are injected through the ion injection zone are merged in the beam merging zone into an ion beam within the enclosed racetrack.
APPARATUS AND METHOD FOR PREVENTING CONTAMINATION OF ACCELERATOR SYSTEMS BY AN ION PUMP
An apparatus and method for preventing the contamination of sensitive accelerator surfaces and preventing deterioration of the accelerator field emission in a linear accelerator. The method includes providing a nanofilter at the inlet of the getter ion pumps connected to the beam line of the linear accelerator. The method includes providing a break in the inlet line, inserting a conflat flange at the break, and sandwiching the nanofilter between the two halves of the conflat flange. The nanofilter includes a maximum pore size of 3 nanometers, thereby preventing contaminants greater than 3 nanometers from flowing from the getter ion pump back to the accelerator system.