A ballast water treatment apparatus including a ballast water transport line configured to transport a ballast water main stream, a plasma generation device configured to generate an activated gas from a feed gas; and a mixing device. The plasma generation device includes a feed gas inlet for a feed gas, a first electrode and a second electrode, for activating the feed gas by an electric discharge between the first electrode and the second electrode thereby generating the activated gas, a cooling fluid passage for cooling the plasma generation device, the cooling fluid passage having a cooling fluid inlet and a cooling fluid outlet, the cooling fluid passage being fed with a cooling fluid, and a combining section being configured to combine the activated gas with the cooling fluid from the cooling fluid outlet to generate an activated fluid product. The mixing device is configured to mix the activated fluid product and the ballast water main stream.

An energy-efficient disinfection or sterilisation of contaminated liquid, such as water contaminated with viruses or microbes includes an asymmetric configuration of a cavitation nozzle made from dielectric material that enables the formation of a single, stable cavitation bubble of a large volume. A low-pressure gaseous plasma is continuously formed inside the cavitation bubble by electrodes to prevent contact of the metallic electrode with liquid water and Ohmic heating of the contaminated water. The electrodes are connected to a high voltage power supply. The power supply enables formation of a continuous stable gaseous discharge inside the cavitation bubble and radicals and radiation useful for destruction of viruses to the levels below the current US EPA standard in few minutes, while the temperature of liquid water remains practically unchanged. Use is not only for hospitals and pharmaceutical companies but the food industry and agriculture as well.

A device for the electrical discharge processing of a non-conducting liquid including at least one alternating succession of essentially rectangular, parallel, and spaced-apart n electrode plates and n+1 dielectric plates, with n2, the electrode plates being numbered from 1 to n; the device includes a series of first electrical connectors electrically connected to all even numbered electrode plates in proximity to a first pair of diametrically opposite corners; and the device includes a series of second electrical connectors electrically connected to all odd numbered electrode plates in proximity to a second pair of diametrically opposite corners. Further, a method for electrical discharge processing of a non-conducting liquid using the device is disclosed.

A plasma generator generates atmospheric pressure, low temperature plasma (cold plasma), and includes a thin plate-like first electrode defining a planar bottom surface. A thin plate-like second electrode defines a planar top surface. The second electrode opposes the first electrode, such that the bottom surface of the first electrode faces the top surface of the second electrode. A first dielectric layer is disposed on the bottom surface of the first electrode, and a second dielectric layer is disposed on the top surface of the second electrode. A spacer supports the first and second electrodes to define a predetermined gap between the first and second dielectric layers. A power supply supplies electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on the predetermined gap between the first and second dielectric layers, cold plasma is generated.

The present invention provides a microplasma device and system thereof. The microplasma device comprises a reaction tank carrying with a reaction solution. A nanomaterial and its precursors are contained in the reaction solution. A first electrode is at least partially immersed in the reaction solution. A second electrode comprises a microplasma array component to eject microplasma array to the surface of the reaction solution. A power source is electrically connected between the first electrode and the second electrode. The present invention provides a novel microplasma array device to produce nanomaterial with increased yield rate. The microplasma array device can be multiplied by adding the outlet of the microplasma as desired to produce nanomaterial including but not limited to nano-metal particles, carbon quantum dots, silicon quantum dots and plasma-activated water with higher yield rate.

Apparatus for treating water is provided where the apparatus includes a reaction chamber having an air-water interface and a plasma applicator disposed in air in proximity to the air-water interface. The plasma applicator includes a solid dielectric plate sandwiched between a first electrode and a second electrode, where the first electrode is closer to the water than the second electrode. The plasma applicator further includes a first insulating layer disposed on the first electrode. The apparatus is configured to generate a plasma between the first insulating layer and the air-water interface during operation.

Embodiments relate to a plasma generator including a dielectric layer elongated in a longitudinal direction that extends 0.01 mm-2 mm in a thickness direction perpendicular to the longitudinal direction. The dielectric layer defines first and second planar surfaces that are separated in the thickness direction. A first electrode is disposed along a first portion of the first planar surface. A second electrode is disposed along a second portion of the second planar surface, such that at least a part of the first and second portions are separated in the longitudinal direction of the dielectric layer. A power supply is configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, wherein plasma is generated adjacent each of the first and second electrodes and along the first and second surfaces of the dielectric layer other than the first and second portions.

Solutions having a solvent and a cold atmospheric plasma dissolved in the solvent are described. Methods and systems of forming cold atmospheric plasma (CAP)-containing solutions are also described. A system for producing (CAP)-containing solutions includes a gas source; a plasma generating device having a hollow body fluidically coupled with the gas source, a closed proximal end and an open distal end, the hollow body receiving gas from the gas source, and at least one electrode in or about the hollow body and ionizing the gas to discharge a cold atmospheric plasma (CAP) from the open distal end; and a container for housing a fluid, the open distal end of the plasma generating device in fluid communication with an inner portion of the container. CAP-containing solutions can be used in treatment of cancer cells, infected tissue sterilization, microorganism inactivation, promotion of wound healing, skin regeneration, and blood coagulation, and teeth bleaching/whitening.

A free radical generator includes a discharge electrode assembly with discharge electrode pins in a radial pattern and electrically configured to receive one or more voltage pulses. A liquid or solid counter electrode has a surface separated from the pins by a discharge gap. A motive element rotates the electrode assembly such that the array of pins rotates about an axis and the pins move relative to the counter electrode. A liquid treatment system may include a free radical generator and introduce free radicals into the liquid. A gas treatment system may include the free radical generator, a gas flow generating element to. a column for the flow of gas. and a liquid introduction element operable to introduce a liquid from a liquid bath into the interior space of the column such that the flow of gas is exposed to the liquid. Methods and further systems are also provided.

An apparatus is provided for treating a liquid with a plasma. The apparatus includes one or two dielectric barriers, and the dielectric barrier(s) and high voltage electrode define a discharge zone therebetween. A high voltage electrode may be electrically insulated from the discharge zone by the inner dielectric barrier. In this apparatus, the outer dielectric barrier is gas and the discharge zone is configured to accept a gas flow therethrough.