Efficiency of prediction of a physical quantity increases in repeated simulation of an etching process with a change of parameters. An information processing device includes a base shape storage unit and a physical quantity prediction unit. The base shape storage unit of the information processing device stores a shape of a sample etched within a chamber as a base shape. On the other hand, the physical quantity prediction unit of the information processing device predicts a physical quantity within the chamber on the basis of a processing condition determined for the sample and associated with the physical quantity and the base shape.

An apparatus for treating a substrate is disclosed. The apparatus includes a water supply tank with a level line and a reservoir filled with water to the level line. The water supply tank may automatically replenish water upon detection of depletion of water beneath the level line. A reaction chamber is communicatively connected to the water supply tank. The reaction chamber contains a pair of electrodes which define a reaction region between each electrode, where the reaction region may surround the substrate. A control module is communicatively connected to at least the reaction chamber and may a control signal. An injector connects the water supply tank to the reaction chamber may generate a dispersion of microfine water droplets from water extracted from the reservoir in response to receipt of the control signal. A platform may support at least the reaction chamber and lay on a flat surface.

The present disclosure is generally directed to a plasma sheet source and methods of using same. The plasma sheet source includes a cylindrical electrode having a conductive cylindrical core surrounded by a dielectric material, a plurality of channels configured to direct gas from a gas inlet to the electrode, and a plasma outlet positioned below the electrode. Gas is introduced to the plasma sheet source and directed toward the electrode, which when powered by pulsed direct current, produces plasma as the gas ionizes. The produced plasma is then directed out of the plasma outlet to a specimen for treatment of the specimen. Notably, the plasma exiting the plasma outlet is in the form of a plasma sheet that is at approximately room temperature.

Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.

An apparatus for treating a substrate is disclosed. The apparatus includes a water supply tank with a level line and a reservoir filled with water to the level line. The water supply tank may automatically replenish water upon detection of depletion of water beneath the level line. A reaction chamber is communicatively connected to the water supply tank. The reaction chamber contains a pair of electrodes which define a reaction region between each electrode, where the reaction region may surround the substrate. A control module is communicatively connected to at least the reaction chamber and may a control signal. An injector connects the water supply tank to the reaction chamber may generate a dispersion of microfine water droplets from water extracted from the reservoir in response to receipt of the control signal. A platform may support at least the reaction chamber and lay on a flat surface.

Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.

A plasma source assembly for use with a processing chamber includes an inner RF feed connected to the inner edge of the electrode and an outer RF feed connected to the outer edge of the electrode. A capacitor is connected between the inner edge of the electrode and electrical ground to modulate the voltage of across the length of the electrode.

A reactive-species supply device is configured to supply a treatment gas to an electric discharge space, for thereby supplying at least a reactive species formed in a plasma, to an object. The reactive-species supply device includes (a) at least one pair of electrodes configured to form the electric discharge space and (b) an electrode protection device configured to protect the electrodes from the treatment gas. Also disclosed is a surface treatment apparatus that includes the reactive-species supply device.

Apparatus for plasma processing of a continuous fiber, comprising a first and a second plasma torch. Each plasma torch comprises oppositely arranged electrodes to define a plasma discharge chamber between the electrodes. The plasma discharge chamber comprises an inlet and an outlet for passing a plasma forming gas between the electrodes. The apparatus further comprises an afterglow chamber in fluid communication with the outlets of the plasma discharge chambers, which comprises a substrate inlet and a substrate outlet arranged at opposite sides of the outlets of the plasma discharge chambers. A transport system is configured to continuously transport the fiber from the substrate inlet to the substrate outlet through the afterglow chamber. The substrate inlet comprises an aperture having a cross-sectional size substantially smaller than a cross-sectional size of the afterglow chamber. The outlets of the plasma torches face each other and exhaust plasma activated species into the afterglow chamber.

The present invention provides a plasma CVD apparatus capable of suppressing abnormal electrical discharge even when a high voltage is used. A plasma CVD apparatus 100 includes: a chamber 61 forming a plasma space; and a power introduction terminal 10 arranged in a terminal insertion hole 62 that extends through a wall 61a of the chamber 61, wherein: the power introduction terminal 10 includes an insulator 21 having a through hole 22 and a rod-like electrical conductor 11 inserted in the through hole 22; one end of the rod-like electrical conductor 11 is arranged in the chamber 61 and the other end of the rod-like electrical conductor 11 is electrically connected to a power source E that supplies power into the chamber 61; a gap between an inner wall 211 of the insulator 21 and the rod-like electrical conductor 11 is less than 2 mm; and a distance from said one end of the insulator 21, said one end being arranged in the plasma space inside the chamber 61, to a contact point 221 between the insulator 21 and the rod-like electrical conductor 11 is greater than 10 mm