A device for producing an amorphous carbon layer by electron cyclotron resonance plasma, the device including a plasma chamber; a gas supply; a magnetic mirror; a waveguide extending along a reference axis; a system for injecting microwave power; a magnetic field generator for generating a magnetic field in the plasma chamber, the magnetic field generator being configured to create a beam of magnetic field lines along which plasma is diffused; a target made from carbon; a substrate holder, wherein the target is arranged at a distance from the reference axis of between R.sub.target/2 and R.sub.target, and wherein the device further includes a screen arranged between the waveguide and the substrate holder.

A production apparatus for fine particles includes a vacuum chamber, a material supply device, a plurality of electrodes arranged and a collection device connecting to the other end of the vacuum chamber and collecting fine particles, which generates plasma and produces fine particles from the material particles, in which a first electrode arrangement region on the material supply port's side and a second electrode arrangement region apart from the first electrode arrangement region to the collection device's side which respectively cross a direction in which the material flows between the vicinity of the material supply port and the collection device are provided in the intermediate part of the vacuum chamber, and both the first electrode arrangement region and the second electrode arrangement region are provided with a plurality of electrodes respectively to form the electrodes in multi-stages.

Disclosed herein are systems, methods, and devices for rapid synthesis of materials. In some embodiments, a system may comprise a material processing apparatus for processing a material, the material processing apparatus comprising a material passage structure in communication with a material feeding inlet, the material passage structure located within a reaction chamber, and the material feeding inlet configured to receive a material and transfer the material to the material passage structure; and a heat source in communication with the reaction chamber, the heat source comprising one or more of: plasma, flame, combustion sources, resistive heaters, heated liquid baths, electromagnetic radiation, and/or induction heaters, wherein the material passage structure is located within, surrounding, or adjacent to the heat source, such that the material passage structure is heated by the heat source and the material is converted to a product within the material passage structure.

A dielectric barrier discharge (DBD) plasma apparatus for synthesizing metal particles is provided. The DBD plasma apparatus includes an electrolyte vessel for receiving an electrolyte solution comprising metal ions; an electrode spaced-apart from the electrolyte vessel; a dielectric barrier interposed between the electrolyte vessel and the electrode such that, when the electrolyte solution is present in the electrolyte vessel, the dielectric barrier and an upper surface of the electrolyte solution are spaced-apart from each other and define a discharge area therebetween; and gas inlet and outlet ports in fluid communication with the discharge area such that supplying gas in the discharge area while applying an electrical potential difference between the electrode and the electrolyte solution cause a plasma to be produced onto the electrolyte solution, the plasma interacting with the metal ions and synthesizing metal particles. A method for synthesizing metal particles using a DBD plasma apparatus is also provided.

A method of forming metal nanoparticles includes applying a substance to an area of interest, applying cold plasma to the area of interest, and synthesizing nanoparticles from the substance using the cold plasma in the area of interest, wherein the substance is a solution that contains metal ions, and the nanoparticles synthesized are metallic in nature.

Provided are a fine particle manufacturing apparatus and a fine particle manufacturing method, which manufacture smaller fine particles. The fine particle manufacturing apparatus has: a raw material supply unit that supplies raw materials for producing fine particles into a thermal plasma flame; a plasma torch in which the thermal plasma flame is generated and the raw materials supplied by the raw material supply unit is evaporated by the thermal plasma flame to form a mixture in a gaseous state; a plasma generation unit that generates the thermal plasma flame inside the plasma torch; and a gas supply unit that supplies quenched gas to the thermal plasma flame, wherein the gas supply unit supplies the quenched gas with time modulation of the supply amount of the quenched gas.

A reactor and method for production of nanostructures, including metal oxide nanowires or nanoparticles, are provided. The reactor includes a regulated metal powder delivery system in communication with a dielectric tube; a plasma-forming gas inlet, whereby a plasma-forming gas is delivered substantially longitudinally into the dielectric tube; a sheath gas inlet, whereby a sheath gas is delivered into the dielectric tube; and a microwave energy generator coupled to the dielectric tube, whereby microwave energy is delivered into a plasma-forming gas. The method for producing nanostructures includes providing a reactor to form nanostructures and collecting the formed nanostructures, optionally from a filter located downstream of the dielectric tube.

A microwave plasma torch equipment includes a reaction chamber, a ventilation tube and a microwave source. The reaction chamber has a reaction area, a microwave inlet, a first divert channel, a second divert channel and a microwave diverter. Each of the first and second divert channels has first and second end parts. The first end parts are coupled to the microwave inlet. The second end parts are coupled to each other at the reaction area. The cross-sectional areas of the first end parts are greater than those of the second end parts. The microwave diverter is located at the junction of the microwave inlet and the first and second divert channels. The ventilation tube penetrates through the reaction area along a direction substantially perpendicular to the extending direction of the first and second divert channels. The microwave source is located at the microwave inlet and facing the microwave diverter.