Provided is a memory device including an array of memory cells. A first bit-line coupled to memory cells of a first column of the array of memory cells. The first bit-line is disposed on a first metal layer. A second bit-line is coupled to the first bit-line. The second bit-line is disposed on a second metal layer and coupled to the first bit-line by at least one via. A word line is coupled to a row of the array of memory cells.

A multiply accumulate circuit receives m one-bit neuron values from a first layer of a neural network system. The multiply accumulate circuit includes m non-volatile memory cells and m current sources. In addition, m current paths are defined by the m non-volatile memory cells and the m current sources collaboratively. A first current path is defined by a first non-volatile memory cell and a first current source. A first terminal of the first current source receives a first supply voltage. A second terminal of the first current source is connected with a first terminal of the first non-volatile memory cell. A second terminal of the first non-volatile memory cell is connected with an output terminal of the multiply accumulate circuit. A control terminal of the first current source receives a first one-bit neuron value.

A one time programmable non-volatile memory cell includes a storage element. The storage element includes a glass substrate, a buffer layer, a polysilicon layer and a metal layer. The buffer layer is disposed on the glass substrate. The polysilicon layer is disposed on the buffer layer. A P-type doped region and an N-type doped region are formed in the polysilicon layer. The metal layer is contacted with the N-type doped region and the P-type doped region. The metal layer, the N-type doped region and the P-type doped region are collaboratively formed as a diode. When a program action is performed, the first diode is reverse-biased, and the diode is switched from a first storage state to a second storage state. When a read action is performed, the diode is reverse-biased and the diode generates a read current.

A resistive random-access memory cell includes a well region, a first doped region, a second doped region, a third doped region, a first gate structure, a second gate structure and a third gate structure. The first gate structure is formed over the surface of the well region between the first doped region and the second doped region. The second gate structure is formed over the second doped region. The third gate structure is formed over the surface of the well region between the second doped region and the third doped region. A first metal layer is connected with the first doped region and the third doped region. A second metal layer is connected with the conductive layer of the first gate structure and the conductive layer of the third gate structure.

Single gate and dual gate FinFET devices suitable for use in an SRAM memory array have respective fins, source regions, and drain regions that are formed from portions of a single, contiguous layer on the semiconductor substrate, so that STI is unnecessary. Pairs of FinFETs can be configured as dependent-gate devices wherein adjacent channels are controlled by a common gate, or as independent-gate devices wherein one channel is controlled by two gates. Metal interconnects coupling a plurality of the FinFET devices are made of a same material as the gate electrodes. Such structural and material commonalities help to reduce costs of manufacturing high-density memory arrays.

A 3D microelectronic device is provided with several superimposed layers of components, with an upper layer including one or several memory cells having a SRAM structure and provided with a rear biasing electrode. The biasing of the rear biasing electrode is modified to switch the memory cells from a ROM operating mode to a SRAM operating mode.

A bi-sided pattern processor comprises a plurality of storage-processing units (SPU's). Each of the SPU's comprises at least a memory array and a pattern-processing circuit. The preferred pattern processor further comprises a semiconductor substrate with opposing first and second surfaces. The memory array is disposed on the first surface, whereas the pattern-processing circuit is disposed on the second surface. The memory array stores patterns; the pattern-processing circuit processes these patterns; and, they are communicatively coupled by a plurality of inter-surface connections.

A device includes a number of irreversibly programmable memory points. Each irreversibly programmable memory point includes a first semiconductor zone and a gate located on the first zone. A conductive area defines the gates of the memory points. First and second semiconductor areas are respectively located on either side of a vertical alignment with the conductive area. The first zones are alternately in contact with the first and second areas.

An apparatus comprises a plurality of memory cells in rows and columns, a first word line electrically coupled to a first group of memory cells through a first word line strap structure comprising a first gate contact, a first-level via, a first metal line and a second-level via and a second word line electrically coupled to a second group of memory cells through a second word line strap structure, wherein the second word line strap structure and the first word line strap structure are separated by at least two memory cells.

Provided is a memory device including an array of memory cells. A first bit-line coupled to memory cells of a first column of the array of memory cells. The first bit-line is disposed on a first metal layer. A second bit-line is coupled to the first bit-line. The second bit-line is disposed on a second metal layer and coupled to the first bit-line by at least one via. A word line is coupled to a row of the array of memory cells.