The present technology includes a semiconductor memory device. The semiconductor memory device includes a first channel pattern and a second channel pattern each extending in a vertical direction and facing each other, a channel separation pattern formed between the first channel pattern and the second channel pattern and extending in the vertical direction, a stack including conductive patterns each surrounding the first channel pattern, the second channel pattern, and the channel separation pattern and stacked apart from each other in the vertical direction, a first memory pattern disposed between each of the conductive patterns and the first channel pattern, and a second memory pattern disposed between each of the conductive patterns and the second channel pattern.

A method includes: forming a patterned dielectric layer, including a predetermined word line region and a predetermined pick-up neck region being separated by a first distance, and the patterned dielectric layer within the predetermined pick-up neck region has a second distance, wherein the first distance is smaller than or equal to the second distance; forming a spacer on sidewalls of the patterned dielectric layer; cutting off the spacer of a connecting portion of the predetermined word line region from the spacer of a remaining portion of the predetermined word line region; forming a mask pattern, including a first portion across the connecting portion and the predetermined pick-up neck region, wherein the spacer at the remaining portion is spaced apart from the first portion; and forming a dummy structure, word lines, and pick-up necks, wherein the dummy structure is located between the word lines and the pick-up necks.

In some embodiments, the present disclosure relates to an integrated chip (IC), including a substrate, a floating gate electrode disposed over the substrate, a contact etch stop layer (CESL) structure disposed over the floating gate electrode, an insulating stack separating the floating gate electrode from the CESL structure, the insulating stack including a first resist protective layer disposed over the floating gate electrode, a second resist protective layer disposed over the first resist protective layer, and an insulating layer separating the first resist protective layer from the second resist protective layer.

The non-volatile memory includes a control circuitry that is communicatively coupled to an array of memory cells that are arranged in a plurality of word lines. The control circuitry is configured to program the memory cells of the plurality of word lines to a plurality of data states in a multi-pass programming operation. A later programming pass of the multi-pass programming operation includes a plurality of programming loops with incrementally increasing programming pulses. For at least one data state, the later programming pass includes maintaining a count of the programming loops of the later programming pass. The later programming pass also includes inhibiting or slowing programming of the memory cells being programmed to one of the data states during a predetermined program count verify (PCV) programming loop and a PCV−1 programming loop and skipping a verify operation for all programming loops prior to a PCV+1 programming loop.

Semiconductor device includes a substrate, gate electrodes stacked and spaced apart from each other in a first direction perpendicular to an upper surface of the substrate, separation regions penetrating the gate electrodes, extending in a second direction perpendicular to the first direction, and spaced apart from each other in a third direction perpendicular to the first direction and the second direction, channel structures arranged in columns in the third direction and rows in the second direction and penetrating the gate electrodes between the separation regions, and bit lines extending in the third direction on the channel structures. The channel structures include a first group of channel structures repeatedly arranged and including three columns arranged with a first pitch and a second pitch smaller than the first pitch in order, and the bit lines are arranged with at least one pitch smaller than the second pitch in the second direction.

The storage device includes a non-volatile memory with control circuitry and an array of memory cells that are arranged in a plurality of word lines. The control circuitry is configured to program the memory cells in a plurality of programming loops which include applying a programming pulse to a selected word line to program at least one memory cell of the selected word line to a programmed data state. The programming loops also include simultaneously applying a verify pulse to the selected word line to verify a data state being programmed, applying a first voltage to at least one unselected word line that has not been programmed, and applying a second voltage to at least one unselected word line that has already been programmed. The first voltage is determined as a function of the programmed data state to reduce a voltage threshold distribution across the memory cells.

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory stack structures vertically extending through the alternating stack, a retro-stepped dielectric material portion overlying stepped surfaces of the alternating stack, a laterally perforated support pillar structure vertically extending through the alternating stack and the retro-stepped dielectric material portion, and a layer contact via structure laterally surrounded by the laterally perforated support pillar structure and contacting a top surface of a topmost electrically conductive layer within an area of the laterally perforated support pillar structure. Each electrically conductive layer within the area of the laterally perforated support pillar structure extends through the lateral openings.

The invention discloses a dynamic random access memory (DRAM) device and a method of fabricating such DRAM device. The DRAM device according to the invention includes a plurality of bit lines formed on a semiconductor substrate, a plurality of first isolation stripes, a plurality of second isolation stripes, a plurality of transistors formed between the first isolation stripes and the second isolation stripes, a plurality of word lines, and a plurality of capacitors formed above the first isolation stripes and the second isolation stripes. The semiconductor substrate defines a longitudinal direction, a transverse direction, a normal direction, a plurality of columns in the longitudinal direction, and a plurality of rows in the transverse direction. The first isolation stripes and the second isolation stripes extend in the longitudinal direction. Each transistor corresponds to one of the columns and one of the rows. The transistors on one side of each first isolation stripe and the transistors on the other side of said one first isolation stripe are staggeredly arranged. Each word line corresponds to one of the columns and connects the gate conductors of the transistors along the corresponding column. Each capacitor corresponds to one of the transistors and connects the source region of the corresponding transistor.

Some embodiments include methods of forming integrated assemblies. A conductive structure is formed to include a semiconductor-containing material over a metal-containing material. An opening is formed to extend into the conductive structure. A conductive material is formed along a bottom of the opening. A stack of alternating first and second materials is formed over the conductive structure either before or after forming the conductive material. Insulative material and/or channel material is formed to extend through the stack to contact the conductive material. Some embodiments include integrated assemblies.

A semiconductor memory device includes an electrode structure including a plurality of electrode layers and a plurality of interlayer dielectric layers which are alternately stacked on a source plate defined with a cell area and a connection area in a first direction; a vertical channel passing through the electrode structure in the cell area; a hard mask pattern disposed on the electrode structure in the connection area, and having a plurality of opening holes; a plurality of contact holes defined in the electrode structure under the opening holes, and exposing pad areas of the electrode layers; and a slit dividing the hard mask pattern into units smaller than the electrode structure in the connection area.