A nonvolatile memory device is provided. The nonvolatile memory device comprises an n-doped source, an n-doped drain, and a doped region in a first p-well in a substrate. A floating gate may be arranged over the first p-well, whereby the doped region may be arranged at least partially under the floating gate.

Various embodiments of the present application are directed to an IC, and associated forming methods. In some embodiments, the IC comprises a memory region and a logic region integrated in a substrate. A memory cell structure is disposed on the memory region. A logic device is disposed on the logic region having a logic gate electrode separated from the substrate by a logic gate dielectric. A sidewall spacer is disposed along a sidewall surface of the logic gate electrode. A contact etch stop layer (CESL) is disposed along an upper surface of the substrate, extending upwardly along and in direct contact with sidewall surfaces of the pair of select gate electrodes within the memory region, and extending upwardly along the sidewall spacer within the logic region.

In an embodiment a non-volatile memory device includes a memory array having a plurality of memory cells, a control unit operatively coupled to the memory array, a biasing stage controllable by the control unit and configured to apply a biasing configuration to the memory cells to perform a memory operation and a reading stage coupled to the memory array and controllable by the control unit, the reading stage configured to verify whether the memory operation has been successful based on a verify level, wherein the control unit is configured to adaptively modify a value of the verify level based on an ageing of the memory cells.

According to the present embodiment, a semiconductor device includes a semiconductor substrate, a memory transistor, and a MOS transistor. The memory transistor includes at least a first silicon dioxide film and a first gate electrode positioned on the semiconductor substrate in order. The MOS transistor includes a second silicon dioxide film and a second gate electrode positioned on the semiconductor substrate in order. Any bird's beak is not generated in at least either the first silicon dioxide film or the first gate electrode of the memory transistor.

There is provided a nonvolatile storage element having excellent charge holding characteristics capable of reducing variations in electric characteristics and an analog circuit provided with the same. A nonvolatile storage element is provided with a charge holding region and an insulator surrounding the entire surface of the charge holding region and having halogen distributed in at least one part of a region surrounding the entire surface.

A memory device includes a substrate, a first transistor, a second transistor, and a capacitor. The first transistor is over the substrate and includes a select gate. The second transistor is over the substrate and connected to the first transistor in series, in which the second transistor includes a floating gate. The capacitor is over the substrate and connected to the second transistor, wherein the capacitor includes a top electrode, a bottom electrode in the substrate, and an insulating layer between the top electrode and the bottom electrode. The insulating layer includes nitrogen. A nitrogen concentration of the insulating layer increases in a direction from the top electrode to the bottom electrode.

A method for fabricating a memory is provided. The method includes providing a bit-line layer, on a semiconductor substrate and having bit lines arranged in the bit-line layer; providing a shielding layer, on the bit-line layer and having a conductive shielding structure arranged in the shielding layer. The conductive shielding structure is within a top-view projection area of the bit lines and is grounded. The method further includes providing a word-line layer, on the shielding layer and having word lines arranged in the word-line layer.

3D NOR flash memory devices having vertically stacked memory cells are provided. In one aspect, a memory device includes: a word line/bit line stack with alternating word lines and bit lines separated by dielectric layers disposed on a substrate; a channel that extends vertically through the word line/bit line stack; and a floating gate stack surrounding the channel, wherein the floating gate stack is present between the word lines and the channel, and wherein the bit lines are in direct contact with both the channel and the floating gate stack. Techniques for configuring the memory device for neuromorphic computing are provided, as are methods of fabricating the memory device.

A semiconductor device includes a substrate, a stacked body, a plurality of columnar semiconductors, a semiconductor layer, and a conductive portion. The stacked body is placed above the substrate. The stacked body includes a plurality of conductive layers stacked with an insulating layer placed therebetween. The plurality of columnar semiconductors pass through the stacked body. The semiconductor layer is placed above the substrate. The semiconductor layer is connected to bottoms of the columnar semiconductors. The semiconductor layer has a groove pattern in a region adjacent to the stacked body. The conductive portion fills the groove pattern and is in contact with a side surface of the semiconductor layer in the region. The conductive portion electrically connects the semiconductor layer to the substrate.

An embedded flash memory and an operation method thereof is provided. The embedded flash memory includes a memory cell array comprising a plurality of memory cells, an automatic verification controller comprising: a TRIM calibration configured to provide a write voltage, and a time controller configured to control a write time, and a high voltage generator configured to provide the write voltage to the memory cell array, an input buffer configured to store input data, a sense amplifier configured to generate read data from the memory cell array, and a data comparator configured to compare the read data with the input data.