A semiconductor device includes a substrate having cell and connection regions, and a stack structure having dielectric layers and electrodes that are vertically and alternately stacked on the substrate. The stack structure includes a first pad part, a first fence part, a second pad part, and a second fence part that are sequentially arranged along a first direction. Each of the first and second pad parts has a first stepwise structure formed along the first direction and a second stepwise structure formed along a second direction that intersects the first direction, and each of the first and second fence parts includes dummy electrodes at the same levels as the electrodes and spaced apart from the electrodes. Sidewalls of the electrodes that define second stepwise structure of the second part are offset from sidewalls of the dummy electrodes that define second dummy stepwise structure of the first pad part.

A method for producing a 3D memory device, the method including: providing a first level including a first single crystal layer and control circuits; forming at least one second level above the first level; performing a first etch step including etching holes within the second level; forming at least one third level above the at least one second level; performing a second etch step including etching holes within the third level; and performing additional processing steps to form a plurality of first memory cells within the second level and a plurality of second memory cells within the third level, where each of the first memory cells include one first transistor, where each of the second memory cells include one second transistor, where at least one of the first or second transistors has a channel, a source, and a drain having a same doping type.

A method for producing a 3D memory device including: providing a first level including a single crystal layer and control circuits, where the control circuits include a plurality of first transistors; forming at least one second level above the first level; performing a first etch step including etching holes within the second level; performing processing steps to form a plurality of first memory cells within the second level, where each of the first memory cells include one of a plurality of second transistors, where the control circuits include memory peripheral circuits, where at least one first memory cell is at least partially atop a portion of the memory peripheral circuits, and where fabrication processing of the first transistors accounts for a temperature and time associated with processing the second level and the plurality of second transistors by adjusting a process thermal budget of the first level accordingly.

A three dimension memory device including a plurality of word lines, a plurality of first switches, a plurality of second switches and N conductive wire layers is provided, where N is a positive integer larger than 1. The word lines are divided into a plurality of word line groups. The first switches receive a common word line voltage. The second switches receive a reference ground voltage. A first word line group is connected to a first conductive wire layer through a second conductive wire layer. An i.sup.th word line group is connected to the first conductive wire layer through an (i+1).sup.th to the second conductive wire layer in sequence.

An embedded flash memory and an operation method thereof is provided. The embedded flash memory includes a memory cell array comprising a plurality of memory cells, an automatic verification controller comprising: a TRIM calibration configured to provide a write voltage, and a time controller configured to control a write time, and a high voltage generator configured to provide the write voltage to the memory cell array, an input buffer configured to store input data, a sense amplifier configured to generate read data from the memory cell array, and a data comparator configured to compare the read data with the input data.

A semiconductor memory device includes a substrate including a first region and a second region arranged in a first direction, conductive layers arranged in a second direction and extending in the first direction, a semiconductor layer disposed in the first region and opposed to the conductive layers, contact electrodes disposed in the second region and electrically connected to the conductive layers, and a first structure connected to a first contact electrode in the contact electrodes and a terrace portion of a first conductive layer in the conductive layers. The first structure includes a first conductive portion, a second conductive portion, and a third conductive portion. The first conductive portion extends in the first direction. The second conductive portion and the third conductive portion are connected to one end portion or the other end portion of the first conductive portion in the first direction and the first conductive layer.

A memory device includes: a substrate having a memory region and an external region; a first conductor, in the memory region, being arranged apart from the substrate in a first direction; second and third conductors, in the external region, being arranged apart from the first conductor in a second direction; a first member between the first and second conductors; a second member between the second and third conductors; and an insulating member between the first and second members. The first and second members each includes a lower portion extending in the first direction and reaching below the second conductor and an upper portion having a side surface outside an extension of a side surface of the lower portion. The insulating member includes lower and upper ends located below and above each of the upper portions, respectively.

A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where the first transistors each include a single crystal channel; first metal layers interconnecting at least the first transistors; a second metal layer overlaying the first metal layers; and a second level including a second single crystal layer, the second level including second transistors, where the second level overlays the first level, where the second transistors each include at least two side-gates, where the second level is bonded to the first level, and where the bonded includes oxide to oxide bonds.

A method for producing a 3D semiconductor device including: providing a first level including a first single crystal layer; forming peripheral circuitry in and/or on the first level, and includes first single crystal transistors; forming a first metal layer on top of the first level; forming a second metal layer on top of the first metal layer; forming second level disposed on top of the second metal layer; performing a first lithography step; forming a third level on top of the second level; performing a second lithography step; processing steps to form first memory cells within the second level and second memory cells within the third level, where the plurality of first memory cells include at least one second transistor, and the plurality of second memory cells include at least one third transistor; and deposit a gate electrode for second and third transistors simultaneously.

A memory die includes source-select-level electrically conductive strips laterally spaced apart by source-select-level dielectric isolation structures, an alternating stack of word-line-level electrically conductive layers and insulating layers; and source strips located on an opposite side of the source-select-level electrically conductive strips. Each of the source strips has an areal overlap with only a respective one of the source-select-level electrically conductive strips. Memory stack structures vertically extend through the alternating stack and a respective subset of the source-select-level electrically conductive strips. A logic die may be bonded to the memory die on an opposite side of the source strips. Each source strip is electrically connected to a respective group of memory stack structures laterally surrounded by a respective source-select-level electrically conductive strip.