In a method of manufacturing a non-volatile memory device, insulating layers and conductive gates may be alternately formed on a semiconductor substrate to form a stack structure. A contact hole may be formed through the stack structure. A channel layer may be formed on a surface of the contact hole. The contact hole may be filled with a gap-fill insulating layer. The gap-fill insulating layer may be etched by a target depth to define a preliminary junction region. The channel layer may be etched until a surface of the channel layer may correspond to a surface of an uppermost gate among the gates. Diffusion-preventing ions may be implanted into the channel layer. A capping layer with impurities may be formed in the preliminary junction region.

A wordline driver may include the following: a first transistor having a first node at the input and a second node at an input voltage; a second transistor having a first node at the input node, a second node at a third node of the first transistor, and a third node at ground; a third transistor having a first node at the input voltage, a second node at the first internal node and a third node at a second internal node; a fourth transistor having a first node at an internal node, a second node at a boosted voltage, and a third node at a wordline; a fifth transistor having a first node at an internal node, a second node at the wordline, and a third node at ground; and a sixth transistor between the wordline, the boosted voltage, and the second internal node.

A semiconductor device includes: a substrate; a first dielectric layer over the substrate; a memory cell over the substrate in a first region of the semiconductor device, where the memory cell includes a first ferroelectric structure in the first dielectric layer, where the first ferroelectric structure includes a first bottom electrode, a first top electrode, and a first ferroelectric layer in between; and a tunable capacitor over the substrate in a second region of the semiconductor device, where the tunable capacitor includes a second ferroelectric structure, where the second ferroelectric structure includes a second bottom electrode, a second top electrode, and a second ferroelectric layer in between, where at least a portion of the second ferroelectric structure is in the first dielectric layer.

Some embodiments include an integrated assembly having bottom electrodes coupled with electrical nodes. Each of the bottom electrodes has a first leg electrically coupled with an associated one of the electrical nodes, and has a second leg joining to the first leg. First gaps are between some of the bottom electrodes, and second gaps are between others of the bottom electrodes. The first gaps alternate with the second gaps. Insulative material and conductive-plate-material are within the first gaps. Scaffold structures are within the second gaps and not within the first gaps. Capacitors include the bottom electrodes, regions of the insulative material and regions of the conductive-plate-material. The capacitors may be ferroelectric capacitors or non-ferroelectric capacitors. Some embodiments include methods of forming integrated assemblies.

Apparatuses and methods are disclosed that include ferroelectric memory and for accessing ferroelectric memory. An example method includes increasing a voltage of a first cell plate of a capacitor to change the voltage of a second cell plate of the capacitor, a second digit line, and a second sense node. The voltage of the second cell plate and the second digit line is decreased to change the voltage of the first cell plate, a first digit line, and a first sense node. The first node is driven to a first voltage and the second node is driven to a second voltage responsive to the voltage of the first node being greater than the second node. The first node is driven to the second voltage and the second node is driven to the first voltage responsive to the voltage of the first node being less than the second node.

Methods, systems, and devices for operating a ferroelectric memory cell or cells are described. An electronic memory device may include a plurality of plate portions separated by a plurality of segmentation lines, which may be oriented in a plane parallel to rows of a memory array or columns of the memory array, or both. The segmented plate may be employed instead of a single plate for the array. The one or more plate portions may be energized during access operations of a ferroelectric cell in order to create a voltage different across the cell or to facilitate changing the charge of the cell. Each of the plate portions may include one or more memory cells. The memory cells on a plate portion may be read from or written to after the plate portion is activated by a plate driver.

Methods, systems, and devices for power gating in a memory device are described for using one or more memory cells as drivers for load circuits of a memory device. A group of memory cells of the memory device may represent memory cells that include a switching component and that omit a memory storage element. These memory cells may be coupled with respective plate lines that may be coupled with a voltage source having a first supply voltage. Each memory cell of the group may also be coupled with a respective digit line that may be coupled with the load circuits. Respective switching components of the group of memory cells may therefore act as drivers to apply the first supply voltage to one or more load circuits by coupling a digit line with a plate line having the first supply voltage.

Methods, systems, and devices for power gating in a memory device are described for using one or more memory cells as drivers for load circuits of a memory device. A group of memory cells of the memory device may represent memory cells that include a switching component and that omit a memory storage element. These memory cells may be coupled with respective plate lines that may be coupled with a voltage source having a first supply voltage. Each memory cell of the group may also be coupled with a respective digit line that may be coupled with the load circuits. Respective switching components of the group of memory cells may therefore act as drivers to apply the first supply voltage to one or more load circuits by coupling a digit line with a plate line having the first supply voltage.

In the examples disclosed herein, a memory array can have a first group of memory cells coupled to a first digit line at a first level and a second group of memory cells coupled to a second digit line at the first level. A third digit line can be at a second level and can be coupled to a main sense amplifier. A first vertical thin film transistor (TFT) can be at a third level between the first and second levels can be coupled between the first digit line and the third digit line. A second vertical TFT can be at the third level and can be coupled between the second digit line and the third digit line. A local sense amplifier can be coupled to the first and second digit lines.

Some embodiments include an integrated assembly having first electrodes with top surfaces, and with sidewall surfaces extending downwardly from the top surfaces. The first electrodes are solid pillars. Insulative material is along the sidewall surfaces of the first electrodes. Second electrodes extend along the sidewall surfaces of the first electrodes and are spaced from the sidewall surfaces by the insulative material. Conductive-plate-material extends across the first and second electrodes, and couples the second electrodes to one another. Leaker-devices electrically couple the first electrodes to the conductive-plate-material and are configured to discharge at least a portion of excess charge from the first electrodes to the conductive-plate-material. Some embodiments include methods of forming integrated assemblies.