A semiconductor device having a large storage capacity is provided. The semiconductor device includes an oxide provided over a substrate, a plurality of first conductors over the oxide, a first insulator that is provided over the plurality of first conductors and includes a plurality of openings overlapping with regions between the plurality of first conductors, a plurality of second insulators provided in the respective plurality of openings, a plurality of charge retention layers provided over the respective plurality of second insulators, a plurality of third insulators provided over the respective plurality of charge retention layers, and a plurality of second conductors provided over the respective plurality of third insulators.

A memory apparatus includes an interconnect in a first dielectric above a substrate and a structure above the interconnect, where the structure includes a diffusion barrier material and covers the interconnect. The memory apparatus further includes a resistive random-access memory (RRAM) device coupled to the interconnect. The RRAM device includes a first electrode on a portion of the structure, a stoichiometric layer having a metal and oxygen on the first electrode, a non-stoichiometric layer including the metal and oxygen on the stoichiometric layer. A second electrode including a barrier material is on the non-stoichiometric layer. In some embodiments, the RRAM device further includes a third electrode on the second electrode. To prevent uncontrolled oxidation during a fabrication process a spacer may be directly adjacent to the RRAM device, where the spacer includes a second dielectric.

Two-terminal resistive switching devices can have a switching layer in which a filament forms and deforms to varying degrees to represent distinct logical states. This switching layer can be formed having a varying ratio, X, of nitrogen to silicon at various strata of the switching layer. Such can result in a two-terminal memory device with improved stability and other characteristics. The switching layer can be formed in a vacuum chamber in which the gas mixture has a ratio, Y, of nitrogen gas to argon gas that is varied during fabrication

A memory device includes a bit line, a word line, a memory cell, select bit lines, and a controller. The memory cell includes a first transistor, data storage elements, and second transistors corresponding to the data storage elements. The first transistor includes a gate electrically coupled to the word line, a first source/drain, and a second source/drain. Each of the select bit lines is electrically coupled to a gate of a corresponding second transistor. Each data storage element and the corresponding second transistor are electrically coupled in series between the first source/drain of the first transistor and the bit line. The controller turns ON the first transistor and a selected second transistor, and, while the first transistor and the selected second transistor are turned ON, applies different voltages to the bit line to perform corresponding different operations on the data storage element coupled to the selected second transistor.

Provided are a semiconductor device and a semiconductor apparatus including the semiconductor device. The semiconductor device includes a substrate having a channel layer comprising a dopant, a ferroelectric layer on the channel layer; and a gate on the ferroelectric layer. The channel layer has a doping concentration of 1×10.sup.15 cm.sup.−3 to 1×10.sup.21 cm.sup.−3.

A resistive memory device includes a bottom electrode, a switching layer including a first horizontal portion, a second horizontal portion over an upper surface of the bottom electrode, and a first vertical portion over a side surface of the bottom electrode, a top electrode including a first horizontal portion over the first horizontal portion of the switching layer, a second horizontal portion over the second horizontal portion of the switching layer, and a first vertical portion over the first vertical portion of the switching layer, and a conductive via contacting the first horizontal portion, the second horizontal portion and the first vertical portion of the top electrode. By providing a switching layer and a top electrode which conform to a non-planar profile of the bottom electrode, charge crowding and a localized increase in electric field may facilitate resistance-state switching and provide a reduced operating voltage.

A memory device is provided with a support and several superimposed levels of resistive memory cells formed on the support, each level having one or more rows of one or more resistive memory cell(s), each resistive memory cell having a variable resistance memory element formed by an area of variable resistivity material arranged between a first electrode and a second electrode. The memory element is connected to a source region or drain region of a control transistor, the control transistor being formed in a given semiconductor layer of a stack of semiconductor layers formed on the support and wherein respective channel regions of respective control transistors of resist memory cells are arranged.

An electronic chip includes memory cells made of a phase-change material and a transistor. First and second vias extend from the transistor through an intermediate insulating layer to a same height. A first metal level including a first interconnection track in contact with the first via is located over the intermediate insulating layer. A heating element for heating the phase-change material is located on the second via, and the phase-change material is located on the heating element. A second metal level including a second interconnection track is located above the phase-change material. A third via extends from the phase-change material to the second interconnection track.

A method for manufacturing an interconnection structure for an integrated circuit is provided. The integrated circuit includes a first insulating layer, a second insulating layer, and a third insulating layer. Electrical contacts pass through the first insulating layer, and a component having an electrical contact region is located in the second insulating layer. The method includes etching a first opening in the third layer, vertically aligned with the contact region. A fourth insulating layer is deposited to fill in the opening, and a second opening is etched to the contact region by passing through the opening in the third insulating layer. A metal level is formed by filling in the second opening with a metal.

A 3D device, the device including: a first level including logic circuits; a second level including a plurality of memory circuits, where the first level is bonded to the second level, where the bonded includes oxide to oxide bonds, and where the first level includes at least one voltage regulator circuit.