H10K19/20

PHOTOELECTRIC CONVERSION ELEMENT, IMAGE PICKUP ELEMENT, LAMINATED IMAGE PICKUP ELEMENT, AND SOLID-STATE IMAGE PICKUP DEVICE

An image pickup element is constituted by laminating at least a first electrode, an organic photoelectric conversion layer, and a second electrode in order, and the organic photoelectric conversion layer includes a first organic semiconductor material having the following structural formula (1).

##STR00001##

SOLID-STATE IMAGING DEVICE AND ELECTRONIC CAMERA
20230171517 · 2023-06-01 · ·

A solid-state imaging device includes a second image sensor having an organic photoelectric conversion film transmitting a specific light, and a first image sensor which is stacked in layers on a same semiconductor substrate as that of the second image sensor and which receives the specific light having transmitted the second image sensor, in which a pixel for focus detection is provided in the second image sensor or the first image sensor. Therefore, an AF method can be realized independently of a pixel for imaging.

SOLID-STATE IMAGING DEVICE AND ELECTRONIC CAMERA
20230171517 · 2023-06-01 · ·

A solid-state imaging device includes a second image sensor having an organic photoelectric conversion film transmitting a specific light, and a first image sensor which is stacked in layers on a same semiconductor substrate as that of the second image sensor and which receives the specific light having transmitted the second image sensor, in which a pixel for focus detection is provided in the second image sensor or the first image sensor. Therefore, an AF method can be realized independently of a pixel for imaging.

Imaging element, stacked-type imaging element, imaging apparatus, and manufacturing method of imaging element

An imaging element which is formed by sequentially stacking at least an anode, an anode-side buffer layer, a photoelectric conversion layer, and a cathode, in which the anode-side buffer layer includes a material having structural formula ##STR00001##
in which thiophene and carbazole are combined.

SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS
20220059620 · 2022-02-24 · ·

The present disclosure relates to a solid-state imaging device that can achieve a high S/N ratio at a high sensitivity level without any decrease in resolution, and to an electronic apparatus. In the upper layer, the respective pixels of a photoelectric conversion unit that absorbs light of a first wavelength are tilted at approximately 45 degrees with respect to a square pixel array, and are two-dimensionally arranged in horizontal directions and vertical directions in an oblique array.

The respective pixels of a photoelectric conversion unit that is sensitive to light of a second or third wavelength are arranged under the first photoelectric conversion unit. That is, pixels that are √{square root over (2)} times as large in size (twice as large in area) and are rotated 45 degrees are arranged in an oblique array. The present disclosure can be applied to solid-state imaging devices that are used in imaging apparatuses, for example.

IMAGE SENSOR AND METHOD OF FABRICATING THEREOF

A color filter is disposed on a substrate. An organic photodiode is disposed on the color filter. The organic photodiode includes an electrode insulating layer having a recess region on the substrate, a first electrode on the color filter, the first electrode filling the recess region of the electrode insulating layer, a second electrode on the first electrode, and an organic photoelectric conversion layer interposed between the first electrode and the second electrode. The first electrode includes a seam extending at a first angle from a side surface of the recess region of the electrode insulating layer.

INTEGRATED ENERGY-COLLECTING DISPLAY MODULE
20220059624 · 2022-02-24 ·

Energy-collecting display modules are disclosed. The modules include a base substrate with a plurality of sub-pixels, which are laid out in a substantially regular sub-pixel pattern. The sub-pixels are dispersed along the base substrate with sub-pixel spacing regions between individual sub-pixels. The modules also include a top substrate disposed opposite to and above the base substrate and a photovoltaic region disposed between the base substrate and the top substrate within the sub-pixel spacing regions.

PHOTOVOLTAIC STRUCTURE AND METHOD OF FABRICATION
20220059294 · 2022-02-24 ·

A photovoltaic device includes one or more features that taken alone or in combination enhance its efficiency. Some embodiments may comprise a tandem solar device in which a top PV cell is fabricated upon a front transparent substrate, that also serves as the top encapsulating substance. The top PV cell including the front encapsulating substance is then bonded (e.g., using adhesive) to a bottom PV cell in order to complete the tandem device. Using the same transparent, insulating element as both front encapsulating substance and a substrate for fabricating the top PV cell, obviates to the need to provide a separate structure (with resulting interfaces) to perform the latter role. For tandem and non-tandem PV devices, a Through-Substrate-Via (TSV) structure may extend through an insulating substrate in order to provide contact with an opposite side (e.g., back electrode). Embodiments may find particular use in fabricating shingled perovskite photovoltaic solar cells.

COMPLEMENTARY METAL OXIDE SEMICONDUCTOR ELEMENT AND MANUFACTURE METHOD THEREOF

Disclosed is a CMOS element. The CMOS element comprises a substrate, a first metal layer, an insulation layer and a first type metal oxide semiconductor layer; and the element further comprises a first, a second and a third metal parts which are located on the insulation layer, and the first and the second metal parts are located at two sides of the first type metal oxide semiconductor layer and both contacts therewith; a second type organic semiconductor layer, located in a gap between the second, and the third metal parts and on the second, the third metal parts where are adjacent to the gap; a passivation layer, located on the first, the second and the third metal parts, the first type metal oxide semiconductor layer and the second type organic semiconductor layer; a third metal layer located on the passivation layer corresponding to the second type organic semiconductor layer.

SOLID-STATE IMAGE PICKUP UNIT AND ELECTRONIC APPARATUS
20170294486 · 2017-10-12 ·

A solid-state image pickup unit includes: a substrate made of a first semiconductor; a substrate made of a first semiconductor; a photoelectric conversion device provided on the substrate and including a first electrode, a photoelectric conversion layer, and a second electrode in order from the substrate; and a plurality of field-effect transistors configured to perform signal reading from the photoelectric conversion device. The plurality of transistors include a transfer transistor and an amplification transistor, the transfer transistor includes an active layer containing a second semiconductor with a larger band gap than that of the first semiconductor, and one terminal of a source and a drain of the transfer transistor also serves the first electrode or the second electrode of the photoelectric conversion device, and the other terminal of the transfer transistor is connected to a gate of the amplification transistor.