Laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor using a composition having the following (a) to (c): (a) a first organic compound represented by Formula (1) below (R represents a hydrogen atom or a glycidyl group. A plurality of Rs may be identical to or different from each other, but each of at least two Rs is a glycidyl group), (b) a second organic compound represented by Formula (2) below, and (c) a photocationic polymerization initiator

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An OLED curved-surface display panel is provided. The display panel includes a second transparent electrode, an organic luminescent layer, a first transparent electrode, and a reflective electrode, wherein the second transparent electrode is closer to a display side than the first transparent electrode, and wherein a thickness of the first transparent electrode increases from a middle portion of the first transparent electrode to an edge portion of the first transparent electrode.

A display unit includes a first electrode, an organic layer, and a second electrode. The first electrode, the organic layer, and the second electrode are provided in this order on a substrate. The organic layer includes a light-emitting layer. The second electrode includes, in order from the organic layer, a first electrically conductive film, a high-resistivity layer, and a second electrically conductive film. The first electrically conductive film is transparent and includes an insulated or ablated local part. The high-resistivity layer has higher electric resistance than the first electrically conductive film. The second electrically conductive film is provided on the high-resistivity layer.

A method of manufacturing an organic light-emitting display apparatus includes: forming a lift-off layer on a substrate including a first electrode, the lift-off layer including a fluoropolymer; forming a pattern layer on the lift-off layer; etching the lift-off layer between patterns of the pattern layer by utilizing a first solvent to expose the first electrode; forming an organic functional layer on the first electrode and the pattern layer, the organic functional layer including an emission layer; removing remaining portions of the lift-off layer by utilizing a second solvent; and forming a second electrode on the organic functional layer.

A method of manufacturing an OLED back plate and an OLED back plate are provided. The method includes: providing a TFT substrate and forming an electrode layer on the TFT substrate; forming a pixel defining layer on the electrode layer by using a first mask, and forming a plurality of pixel units, each of the pixel units includes a light emitting area, and an inter-pixel area is formed between adjacent two of the pixel units; etching the electrode layer corresponding to the inter-pixel area; removing the pixel defining layer corresponding to the light emitting area to form a pixel opening; and forming a barrier block on adjacent two of the pixel defining layers of adjacent two of the pixel units by a second mask, and the barrier block does not completely cover the pixel defining layer.

Methods of micro- and nano-patterning substrates to form transparent conductive electrode structures or polarizers by continuous near-field optical nanolithography methods using a roll-type photomask or phase-shift mask are provided. In such methods, a near-field optical nanolithography technique uses a phase-shift or photo-mask roller that comprises a rigid patterned externally exposed surface that transfers a pattern to an underlying substrate. The roller device may have an internally disposed radiation source that generates radiation that passes through the rigid patterned surface to the substrate during the patterning process. Sub-wavelength resolution is achieved using near-field exposure of photoresist material through the cylindrical rigid phase-mask, allowing dynamic and high throughput continuous patterning.

Provided are a laminate including an organic material mask and a method for preparing an organic light emitting device using the same. The laminate includes a substrate; and a mask provided on the substrate and including an organic material.

An organic electroluminescent device includes a substrate, a number of first electrodes disposed on the substrate, each of the first electrodes used to form a light-emitting unit; an insulative layer disposed on the substrate and used to define a pixel region of the light-emitting unit; a number of second electrodes disposed on the substrate, each of the second electrodes used to form a light-emitting unit, wherein the second electrodes are spaced apart from one another to form a number of isolation grooves each between two adjacent second electrodes.

An organic electroluminescence device according to the present invention includes: a base material having a top surface on which a recess is provided; a reflective layer provided along at least a surface of the recess; a filling layer filled in the recess via the reflective layer, the filling layer having light transmissivity; a first electrode provided at least on an upper layer side of the filling layer, the first electrode having light transmissivity; an organic layer provided on an upper layer side of the first electrode, the organic layer including at least a light emitting layer; and a second electrode provided on an upper layer side of the organic layer, the second electrode having light transmissivity. The second electrode has a reflectance of 70% or less.

The present disclosure provides a display substrate, a method for preparing the same, and a display device. The display substrate includes: a base substrate; a metal pattern located on the base substrate, and an anti-reflection pattern located on a surface of the metal pattern proximate to the base substrate, in which a difference between a first slope angle of the anti-reflection pattern and a second slope angle of the metal pattern is less than a first threshold, and a distance between a first edge of a side surface of the anti-reflection pattern proximate to the metal pattern and a second edge of a side surface of the metal pattern proximate to the anti-reflection pattern is less than a second threshold.