An electroluminescent device and a display device including the same are disclosed. The electroluminescent device includes a first electrode, an electron transport layer disposed on the first electrode and including inorganic oxide particles, a self-assembled monolayer disposed on the electron transport layer, an emission layer disposed on the self-assembled monolayer and including light emitting particles, a hole transport layer disposed on the emission layer, and a second electrode disposed on the hole transport layer.

Embodiments of the present invention provide systems and methods for constructing photo-electrodes. Hydrogenated crystalline silicon is disposed over an absorption layer, wherein the hydrogenated crystalline silicon is attached to self-assembled monolayers (SAMs). Metal electrodes are disposed over the SAMs. Surface passivation is achieved by the hydrogenated crystalline silicon and the SAMs. Resistance to surface corrosion is provided by the SAMs.

A crosslinked self-assembled monolayer (SAM), comprising surface groups containing a nitrogen-heterocycle, was formed on an oxygen plasma-treated silicon oxide or hafnium oxide top surface of a substrate. The SAM is covalently bound to the underlying oxide layer. The SAM was patterned by direct write methods using ultraviolet (UV) light of wavelength 193 nm or an electron beam, forming a line-space pattern comprising non-exposed SAM features. The non-exposed SAM features non-covalently bound DNA-wrapped carbon nanotubes (DNA-CNT) deposited from aqueous solution with a selective placement efficiency of about 90%. Good alignment of carbon nanotubes to the long axis of the SAM features was also observed. The resulting patterned biopolymer features were used to prepare a CNT based field effect transistor.

A method of manufacturing an optoelectronic device includes the steps of: providing a substrate; depositing a first electrode layer on the substrate; depositing a first charge-carrier selective layer with a thickness less than 5 nm situated directly on the first electrode layer; depositing insulating silicon oxide nanoparticles directly on the first charge-carrier selective layer, the particles having a diameter between 10 nm and 100 nm; depositing a perovskite-based semiconductor layer on the first charge-carrier selective layer and on the insulating silicon oxide nanoparticles, the perovskite-based semiconductor layer being in intimate contact with both the first charge-carrier selective layer and the insulating silicon oxide nanoparticles; depositing a second charge-carrier selective layer on the perovskite-based semiconductor layer; depositing a second electrode layer on the second charge-carrier selective layer.

This invention generally relates to a method for preparing and transferring a monolayer or thin film. In particular this present invention is an improved version of the Langmuir-Schaefer technique for preparing and transferring a monolayer or thin film, incorporating in situ thermal control of the substrate during the transfer process.

This invention generally relates to a device for preparing and transferring a monolayer or thin film. In particular this present invention is a device for preparing and transferring a monolayer or thin film to a substrate using an improved version of the Langmuir-Schaefer technique, which incorporates in situ thermal control, for instance to heat the supporting substrate before and/or during the transfer process.

According to the present invention, an ultra-fast method for preparing an organic/inorganic thin film by using self-diffusion effects comprises the steps of: forming a solution by dissolving one or more organic/inorganic materials in a solvent; forming an organic/inorganic thin film by supplying the formed solution onto a liquid substrate; and transferring the formed thin film to a substrate, wherein the step of forming an organic/inorganic thin film forms a thin film on the liquid substrate from the organic/inorganic materials through the occurrence of a self-diffusion phenomenon caused by a difference in surface tension between the liquid substrate and the solution, and through the occurrence of the evaporation of the solvent and the dissolution process of the solvent to the liquid substrate.

A method for depositing a film on a substrate, which includes the steps of forming a film using a liquid composition that includes a neutral surfactant and a charged lamellar compound, placing the film in contact with the substrate and depositing the film on substrate. Also, a process for analyzing a substrate onto which a film has been deposited by the method.