Disclosed herein are monitoring systems and sensors for physiological measurements. The sensors can be multi-element piezo sensors capable of generating multiple electrical signals, whereby the monitoring systems can receive the multiple electrical signals to analyze the user's vital signs along multiple regions of the user's body. In some examples, the piezo sensor can include one or more corrugations, such as peaks and valleys, to create localized regions with increased mechanical response to force. The sensitivity and resolution of the piezo sensor can be enhanced by further locating electrode sections at the corrugations, where the electrode sections can be electrically isolated and independently operable from other electrode sections. Traces electrically connecting an electrode section to, e.g., an off-panel controller can be routed over and/or around other electrode sections by including an insulator to electrically insulate from the other electrode sections, or by using vias to route through one or more layers.

A piezoelectric device includes a first substrate having an empty chamber, a diaphragm defining a surface of the empty chamber, a piezoelectric element formed by stacking a first electrode layer, a piezoelectric layer, and a second electrode layer in sequence from the diaphragm side, the piezoelectric element provided on the side of the diaphragm opposite to the empty chamber, and a second substrate provided on the side of the first substrate opposite to the diaphragm. The thickness of at least a part of the first substrate in an opening peripheral area of the empty chamber is thicker than the thickness in an area outside the opening peripheral area.

An ultrasonic transducer device includes a base, a first electrode film, a piezoelectric film, a second electrode film and a first conductive film. The base has a plurality of vibrating film portions arranged in an array pattern. The first electrode film is disposed on each of the vibrating film portions. The piezoelectric film is disposed on the first electrode film. The second electrode film is disposed on the piezoelectric film. The first conductive film is connected to the first electrode film. The first conductive film has a film thickness larger than a film thickness of the first electrode film.

An electromechanical transducer element includes a first electrode, a second electrode, and a piezoelectric material. The piezoelectric material is disposed between the first electrode and the second electrode and deformable with a voltage applied in accordance with a drive signal. The piezoelectric material is made of a composite oxide having a perovskite structure preferentially oriented in at least one of a (100) plane and a (001) plane. A drop in diffraction intensity is included in a rocking curve corresponding to at least one of a (200) plane and a (002) plane measured at a position of 2 where the diffraction intensity is largest at a peak of diffraction intensity corresponding to the (200) plane out of peaks of diffraction intensity measured by an X-ray diffraction 0-20 method.

The piezoelectric body is configured to have a layered structure such that a plurality of unit layers are stacked in a film thickness direction, and each of the unit layers is formed of a first layer on which the displacement is relatively easy to occur, and a second layer which has a high concentration of Zr as compared with the first layer. In addition, when composition ratio Ti/(Zr+Ti) of Zr to Ti in each of the first layer and the second layer is set as Cr1 and Cr2, the composition ratio of each layer is adjusted so as to satisfy the following conditions (1) to (3):

0.41Cr10.81(1)

0.1Cr1Cr20.3(2)

Cr1>Cr2(3).

An electromechanical transducer element includes a first electrode; an electromechanical transducer film stacked on one surface of the first electrode; a second electrode stacked on the electromechanical transducer film; and wiring formed on the second electrode. In an at least one cross section, each of a boundary, on a second electrode side, of the electromechanical transducer film and a boundary, on a side opposite to the electromechanical transducer film, of the second electrode is a curved shape protruding away from the first electrode. In the at least one cross section, each of a film thickness of the electromechanical transducer film and a film thickness of the second electrode becomes thinner toward end portions from a maximum height portion.

A process for manufacturing a MIM structure with a thick film of PZT material. The PZT material is deposited on a substrate by alternative deposition between a PZT slurry and a PZT solution. Additionally, a haptic device comprising a MIM actuator manufactured with such a process.

In order to obtain a ferroelectric thin film that is formed to have a predetermined thickness on a substrate, that have satisfactory crystallization and that achieves a high piezoelectric property, a method of manufacturing such a ferroelectric thin film and a method of manufacturing a piezoelectric element having such a ferroelectric thin film, when a dielectric material of a perovskite structure is formed into a film on the substrate, a predetermined amount of additive is mixed with PZT, and the concentration of the additive mixed is varied in the thickness direction of the thin film.

A production method for a composite substrate according to the present invention comprises (a) a step of mirror-polishing a piezoelectric-substrate side of a laminated substrate formed by bonding a piezoelectric substrate and a support substrate; (b) a step of performing machining using an ion beam or a neutral atom beam so that a thickness of an outer peripheral portion of the piezoelectric substrate is larger than a thickness of an inner peripheral portion and a difference between a largest thickness and a smallest thickness of the inner peripheral portion of the piezoelectric substrate is 100 nm or less over an entire surface; and (c) a step of flattening the entire surface of the piezoelectric substrate to remove at least a part of an altered layer formed by the machining using the ion beam or the neutral atom beam in the step (b).

A method of manufacturing a piezoelectric element includes a first electrode, a piezoelectric layer, and a second electrode, in which unevenness on one surface of the piezoelectric layer is formed by forming an oxidizable metal layer on the one surface of the piezoelectric layer; aggregating the metal layer by thermal oxidation; and performing isotropic etching on the metal layer aggregated on the one surface of the piezoelectric layer.