A gas mixture including at least a fluorinated nitrile, carbon dioxide and oxygen for use in electrical equipment is provided. The percentage of oxygen may be at least twice the percentage of the fluorinated nitrile. An additive gas may be present in the gas mixture. A switchgear unit having a gas-insulated compartment including a gas mixture including at least a fluorinated nitrile, carbon dioxide and oxygen is also provided. The percentage of oxygen may be at least twice the percentage of the fluorinated nitrile. An additive gas may be present in the gas mixture housed in the gas-insulated compartment.

An electric component for an electric system that includes a working component, a housing that encloses the working component, and an electrical insulator that is disposed between the housing and the working component.

A method can include extruding an electrically insulating elastomeric compound about a conductor where the electrically insulating elastomeric compound includes ethylene propylene diene monomer (M-class) rubber (EPDM) and an alkane-based peroxide that generates radicals that form decomposition products; cross-linking the EPDM via radical polymerization to form an electrically insulating layer about the conductor; heating the cross-linked EPDM to at least 55 degrees C. to reduce the concentration of the decomposition products in the electrically insulating layer; and disposing a gas barrier layer about the electrically insulating layer.

A method can include extruding an electrically insulating elastomeric compound about a conductor where the electrically insulating elastomeric compound includes ethylene propylene diene monomer (M-class) rubber (EPDM) and an alkane-based peroxide that generates radicals that form decomposition products; cross-linking the EPDM via radical polymerization to form an electrically insulating layer about the conductor; heating the cross-linked EPDM to at least 55 degrees C. to reduce the concentration of the decomposition products in the electrically insulating layer; and disposing a gas barrier layer about the electrically insulating layer.

A dielectric structure including solid dielectric regions incorporating a plurality of regions of vacuum or gas is provided. The dielectric constant of the regions of solid dielectrics can have a dielectric constant greater than 4. Each of the plurality of regions of vacuum or gas or the regions of solid dielectrics may be anisotropic with an aspect ratio of at least four. The smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics can have a length of less than 1 micron. The dielectric structure may have a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. One or more electrodes of the capacitive structure can be coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.

A dielectric structure including solid dielectric regions incorporating a plurality of regions of vacuum or gas is provided. The dielectric constant of the regions of solid dielectrics can have a dielectric constant greater than 4. Each of the plurality of regions of vacuum or gas or the regions of solid dielectrics may be anisotropic with an aspect ratio of at least four. The smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics can have a length of less than 1 micron. The dielectric structure may have a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. One or more electrodes of the capacitive structure can be coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.

In an embodiment, a dielectric structure comprising solid dielectric regions incorporating a plurality of regions of vacuum or gas. In certain embodiments, the dielectric constant of the regions of solid dielectrics have a dielectric constant greater than 4. In certain embodiments, each of the plurality of regions of vacuum or gas or the regions of solid dielectrics is anisotropic with an aspect ratio of at least four. In certain embodiments, the smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics have a length of less than 1 micron. In certain embodiments, the dielectric structure has a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. In certain embodiments, one or more electrodes of the capacitive structure are coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.

In an embodiment, a dielectric structure comprising solid dielectric regions incorporating a plurality of regions of vacuum or gas. In certain embodiments, the dielectric constant of the regions of solid dielectrics have a dielectric constant greater than 4. In certain embodiments, each of the plurality of regions of vacuum or gas or the regions of solid dielectrics is anisotropic with an aspect ratio of at least four. In certain embodiments, the smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics have a length of less than 1 micron. In certain embodiments, the dielectric structure has a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. In certain embodiments, one or more electrodes of the capacitive structure are coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.

An electrical device containing a dielectric fluid, the dielectric fluid comprising heptafluoroisobutyronitrile or 2,3,3,3-tetrafluoro-2-(trifluoromethoxy) propanenitrile.

An electrical device containing a dielectric fluid, the dielectric fluid comprising heptafluoroisobutyronitrile or 2,3,3,3-tetrafluoro-2-(trifluoromethoxy) propanenitrile.