Structures and methods for implementing high performance symmetric multi-port inductors are provided. The multiport inductor structure includes a plurality of conductors which are structured and arranged in turns to obtain symmetry between a plurality of selected input terminals connecting to respective ones of the plurality of conductors.

A three-dimensional multipath inductor includes turns disposed about a center region on two layers, the turns on the two layers having corresponding geometry therebetween. Each of the turns is comprised of two or more segments that extend length-wise along the turns, and the segments have positions that vary from an innermost position relative to the center region and an outermost position relative to the center region. A lateral cross-over is configured to couple the segments of at least one turn on one layer with the segments on a turn on a same layer to form segment paths that have a substantially same length for all segment paths in a grouping of segment paths on that same layer. A vertical cross-over is configured to couple the segments on different vertically stacked metal layers to have the segment groups with a substantially same length for all segment paths based on vertical lengths.

A system and method for providing and programming a programmable inductor is provided. The structure of the programmable inductor includes multiple turns, with programmable interconnects incorporated at various points around the turns to provide a desired isolation of the turns during programming. In an embodiment the programming may be controlled using the size of the vias, the number of vias, or the shapes of the interconnects.

A three-dimensional multipath inductor includes turns disposed about a center region on two layers, the turns on the two layers having corresponding geometry therebetween. Each of the turns is comprised of two or more segments that extend length-wise along the turns, and the segments have positions that vary from an innermost position relative to the center region and an outermost position relative to the center region. A lateral cross-over is configured to couple the segments of at least one turn on one layer with the segments on a turn on a same layer to form segment paths that have a substantially same length for all segment paths in a grouping of segment paths on that same layer. A vertical cross-over is configured to couple the segments on different vertically stacked metal layers to have the segment groups with a substantially same length for all segment paths based on vertical lengths.

A system and method for providing and programming a programmable inductor is provided. The structure of the programmable inductor includes multiple turns, with programmable interconnects incorporated at various points around the turns to provide a desired isolation of the turns during programming. In an embodiment the programming may be controlled using the size of the vias, the number of vias, or the shapes of the interconnects.

Multilayer structures and methods for forming multilayer structures and assemblies are provided. For example, a multilayer structure includes a plurality of dielectric layers stacked along a Z-direction; a first surface; a second surface opposite the first surface along the Z-direction; a via extending from the first surface to the second surface; a first conductive path defined on the first surface; and a second conductive path defined on the second surface. The via contacts both the first conductive path and the second conductive path to electrically connect the first conductive path to the second conductive path. The first conductive path, the second conductive path, and the via form an inductor.

Embodiments of this application disclose an inductor device wiring architecture, including an inductor device and a plurality of dummy metals located under the inductor device. The plurality of dummy metals are arranged in a plurality of metal layers. Each of the plurality of metal layers corresponds to some of the plurality of dummy metals. Arrangement areas of dummy metals corresponding to at least two of the plurality of metal layers progressively increase in a direction away from the inductor device. In the inductor device wiring architecture, adverse effects on performance of the inductor device can be reduced, and a product yield can be increased. The embodiments of this application further disclose an integrated circuit and a communications device.

A low-resistance thick-wire integrated inductor may be formed in an integrated circuit (IC) device. The integrated inductor may include an elongated inductor wire defined by a metal layer stack including an upper metal layer, middle metal layer, and lower metal layer. The lower metal layer may be formed in a top copper interconnect layer, the upper metal layer may be formed in an aluminum bond pad layer, and the middle metal layer may comprise a copper tub region formed between the aluminum upper layer and copper lower layer. The wide copper region defining the middle layer of the metal layer stack may be formed concurrently with copper vias of interconnect structures in the IC device, e.g., by filling respective openings using copper electrochemical plating or other bottom-up fill process. The elongated inductor wire may be shaped in a spiral or other symmetrical or non-symmetrical shape.

The present application provides a voltage regulating circuit. The voltage regulating circuit includes an input positive terminal, an output positive terminal, a ground terminal, N-phase parallel-connected buck circuits, and an additional branch, where N is a natural number greater than 1, and the N output inductors are coupled or uncoupled. The additional branch includes N1 additional windings coupled to the N1 inductors and connected in series sequentially and connected in series with one series inductor.