Patent classifications
H01F21/04
ROTARY VARIABLE DIFFERENTIAL TRANSFORMER
A rotary variable differential transformer for measuring angular displacement and method of manufacturing the same are provided herein. The rotary variable differential transformer includes a stator configured to house a primary coil configured to receive an alternating current, a first secondary coil electromagnetically coupled to the primary coil, and a second secondary coil electromagnetically coupled to the primary coil. The rotary variable differential transformer also includes a rotor positioned concentrically within the stator. The rotor is configured to receive a shaft and rotate with the shaft while the stator remains stationary. The primary coil is positioned at a first radial position within the stator spaced between about 90 to 150 degrees from each of the first secondary coil and the second secondary coil.
ROTARY VARIABLE DIFFERENTIAL TRANSFORMER
A rotary variable differential transformer for measuring angular displacement and method of manufacturing the same are provided herein. The rotary variable differential transformer includes a stator configured to house a primary coil configured to receive an alternating current, a first secondary coil electromagnetically coupled to the primary coil, and a second secondary coil electromagnetically coupled to the primary coil. The rotary variable differential transformer also includes a rotor positioned concentrically within the stator. The rotor is configured to receive a shaft and rotate with the shaft while the stator remains stationary. The primary coil is positioned at a first radial position within the stator spaced between about 90 to 150 degrees from each of the first secondary coil and the second secondary coil.
REDUNDANT VDT WITH DC INTERFACE
A position sensing system for sensing a position of an input shaft of a variable differential transformer (VDT), comprising said VDT, which comprises first and second AC signal output means that are configured to output a first AC output signal and a second AC output signal respectively. The sensing system further comprises AC/DC converting means configured to convert said first AC output signal to a first DC output signal and an AC/DC converting means configured to convert said second AC output signal to a second DC signal. The first and second DC output signals each indicate an individual position of said input shaft.
REDUNDANT VDT WITH DC INTERFACE
A position sensing system for sensing a position of an input shaft of a variable differential transformer (VDT), comprising said VDT, which comprises first and second AC signal output means that are configured to output a first AC output signal and a second AC output signal respectively. The sensing system further comprises AC/DC converting means configured to convert said first AC output signal to a first DC output signal and an AC/DC converting means configured to convert said second AC output signal to a second DC signal. The first and second DC output signals each indicate an individual position of said input shaft.
Plasma processing apparatus
A capacitively-coupled plasma processing apparatus includes: at least one chamber body providing chambers separated from each other; upper electrodes respectively installed in upper spaces within the chambers; lower electrodes respectively installed in lower spaces within the chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply, and secondary coils each of which coils having a first end and a second end; first condensers respectively connected between each of the first ends of the secondary coils and the upper electrodes; and second condensers respectively connected between each of the second ends of the secondary coils and the lower electrodes. The primary coil extends around a central axis. The secondary coils are configured to be coaxially disposed with respect to the primary coil. A self-inductance of each of the secondary coils is smaller than that of the primary coil.
Plasma processing apparatus
A capacitively-coupled plasma processing apparatus includes: at least one chamber body providing chambers separated from each other; upper electrodes respectively installed in upper spaces within the chambers; lower electrodes respectively installed in lower spaces within the chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply, and secondary coils each of which coils having a first end and a second end; first condensers respectively connected between each of the first ends of the secondary coils and the upper electrodes; and second condensers respectively connected between each of the second ends of the secondary coils and the lower electrodes. The primary coil extends around a central axis. The secondary coils are configured to be coaxially disposed with respect to the primary coil. A self-inductance of each of the secondary coils is smaller than that of the primary coil.
ADJUSTABLE INDUCTOR AND METHOD OF USING THE SAME
An adjustable inductor including a toroidal core defining a plurality of gaps, a compressible gap material positioned in the gaps, at least one winding wound on the core, a force-applying structure, and a film substantially covering the adjustable inductor. The force-applying structure is operable to apply a force to the core to adjust the gaps and thereby an inductance of the adjustable inductor. The film is configured to prevent movement of force-applying structure when above a predetermined temperature threshold, and allow movement of the force-applying structure when below the predetermined threshold.
ADJUSTABLE INDUCTOR AND METHOD OF USING THE SAME
An adjustable inductor including a toroidal core defining a plurality of gaps, a compressible gap material positioned in the gaps, at least one winding wound on the core, a force-applying structure, and a film substantially covering the adjustable inductor. The force-applying structure is operable to apply a force to the core to adjust the gaps and thereby an inductance of the adjustable inductor. The film is configured to prevent movement of force-applying structure when above a predetermined temperature threshold, and allow movement of the force-applying structure when below the predetermined threshold.
System and method of implementing an electronic brushless variable transformer for providing a variable AC output
An electronic brushless variable transformer. Variable autotransformers, use brushes, and as such, have moving parts requiring maintenance and periodic cleaning of the brushes. A variable transformer without brushes is advantageous in that it eliminates the cleaning and maintenance of brushes.
System and method of implementing an electronic brushless variable transformer for providing a variable AC output
An electronic brushless variable transformer. Variable autotransformers, use brushes, and as such, have moving parts requiring maintenance and periodic cleaning of the brushes. A variable transformer without brushes is advantageous in that it eliminates the cleaning and maintenance of brushes.