There is provided method for controlling radiation emitting from one or more tubular lamps in an exposure apparatus for exposing a photosensitive element to the radiation. The method involves adjusting an adjustable ballast connected to the one or more lamps thereby adjusting the power received by the one or more lamps, wherein adjusting the ballast of the one or more lamps is based on the actual temperature and radiation of the one or more lamps.

A system for determining an operational state of an atmospheric pressure plasma. The system has a transformer for coupling power into the atmospheric pressure plasma, a current sampling circuit configured to sample at least one current pulse flowing through a primary winding of the transformer, and a programmed microprocessor configured to determine, from a waveform of the current pulse, the operational state of the atmospheric pressure plasma. The operational state is one of: a no plasma state, a plasma origination state indicative of an ignited arc expanding into a plasma by gas flow thereinto, and a plasma maintenance state indicative of the plasma being expanded.

A system for determining an operational state of an atmospheric pressure plasma. The system has a transformer for coupling power into the atmospheric pressure plasma, a current sampling circuit configured to sample at least one current pulse flowing through a primary winding of the transformer, and a programmed microprocessor configured to determine, from a waveform of the current pulse, the operational state of the atmospheric pressure plasma. The operational state is one of: a no plasma state, a plasma origination state indicative of an ignited arc expanding into a plasma by gas flow thereinto, and a plasma maintenance state indicative of the plasma being expanded.

A resonant high current density transformer including two cores that are abut against each other with their first and second side posts on two sides thereof. A first bobbin envelops the first side posts on the same side of the two cores. A side plate is provided on either end of the first bobbin. The space between the two side plates is divided into two coil slots with a spacer, and at least a wire is wound in each coil slot to form a primary winding. A further second bobbin envelops the second side posts on the same side of the two cores. The outer periphery of the second bobbin is divided into two winding regions by another spacer, and a metal plate envelops each of the winding regions to form a secondary winding. A bobbin mount is disposed at the external flank of the second bobbin with a barrier plate at a side thereof for separating the first and the second bobbins. An insulating separating cover is provided on a side of the first bobbin closer to the bobbin mount, and the two ends of the separating cover cover the top and bottom sides of the first bobbin, respectively.

Method and device for adapting a series constant power system to operate constant voltage lighting.

Method and device for adapting a series constant power system to operate constant voltage lighting.

A resonant high current density transformer including two cores that are abut against each other with their first and second side posts on two sides thereof. A first bobbin envelops the first side posts on the same side of the two cores. A side plate is provided on either end of the first bobbin. The space between the two side plates is divided into two coil slots with a spacer, and at least a wire is wound in each coil slot to form a primary winding. A further second bobbin envelops the second side posts on the same side of the two cores. The outer periphery of the second bobbin is divided into two winding regions by another spacer, and a metal plate envelops each of the winding regions to form a secondary winding. A bobbin mount is disposed at the external flank of the second bobbin with a barrier plate at a side thereof for separating the first and the second bobbins. An insulating separating cover is provided on a side of the first bobbin closer to the bobbin mount, and the two ends of the separating cover cover the top and bottom sides of the first bobbin, respectively.

The present invention discloses an inductively coupled coil and an inductively coupled plasma device using the same. The inductively coupled coil comprises an internal coil and an exterior coil which are respective from each other and coaxially arranged, internal coil comprising a plurality of internal respective branches having the same configurations which are nested together, the plurality of internal respective branches being arranged symmetrically with respect to an axis of the inductively coupled coil; the to external coil comprising a plurality of external respective branches having the same configurations which are nested together, the plurality of external respective branches being arranged symmetrically with respect to the axis of the inductively coupled coil. The inductively coupled coil is located on the reaction chamber of the inductively coupled plasma device and is connected to a RF source. It can make the plasma distribute uniformly on the wafer in the reaction chamber so that the difference in chemical reaction rate on the surface of the wafer is small and the quality of the etched wafer is improved. They can be applied in a semiconductor wafer manufacturing apparatus, and they can also be adapted to other apparatuses.

A starting device for discharge lamps including an ignitor and a ferromagnetic ballast, composed of a toroidal core, equipped with at least an air gap, and an electric coil wound around the toroidal core.

The present invention discloses an inductively coupled coil and an inductively coupled plasma device using the same. The inductively coupled coil comprises an internal coil and an exterior coil which are respective from each other and coaxially arranged, internal coil comprising a plurality of internal respective branches having the same configurations which are nested together, the plurality of internal respective branches being arranged symmetrically with respect to an axis of the inductively coupled coil; the external coil comprising a plurality of external respective branches having the same configurations which are nested together, the plurality of external respective branches being arranged symmetrically with respect to the axis of the inductively coupled coil. The inductively coupled coil is located on the reaction chamber of the inductively coupled plasma device and is connected to a RF source. It can make the plasma distribute uniformly on the wafer in the reaction chamber so that the difference in chemical reaction rate on the surface of the wafer is small and the quality of the etched wafer is improved. They can be applied in a semiconductor wafer manufacturing apparatus, and they can also be adapted to other apparatuses.