The present invention addresses the problem of providing a method for automatically adjusting an electron beam emitted from an electron gun equipped with a photocathode to the incident axis of an electron optical system. [Solution] An incident axis alignment method for an electron gun equipped with a photocathode, the electron gun being capable of emitting an electron beam in a first state due to the photocathode being irradiated with excitation light, and the method including at least an excitation light radiation step, a first excitation light irradiation position adjustment step for changing the irradiation position of the excitation light on the photocathode and adjusting the irradiation position of the excitation light, and an electron beam center detection step for detecting whether a center line of the electron beam in the first state coincides with an incident axis of an electron optical system.

An electron beam source includes a photocathode or an anode attached to an ultraviolet semiconductor light source (SULS), or an anode incorporated between a SULS and a photocathode, and an electron beam gun using the electron beam source and electron beam pumped target. In certain embodiments the target is an electron beam pumped light emitting device. The photocathode surface is essentially parallel to the surface of the SULS which is a Light Emitting Diode, Superluminescent Diode, or Laser Diode. Different embodiments of the present disclosure include a photocathode directly attached to the SULS surface or having an intermediate transition layer or layers between the photocathode and the emitter. The transition layer includes a substrate on which the SULS is fabricated and/or a layer to facilitate light extraction from the SULS to the photocathode. The active region of the electron beam pumped light emitter is placed in the path of photoelectron flow to excite non-equilibrium electron-hole pairs and generate light emission at a wavelength or wavelengths determined by the energy band structure of the active region.

An electron emission source is provided. The electron emission source includes a first electrode, an insulating layer, and a second electrode. The first electrode, the insulating layer, and the second electrode are successively stacked with each other. the second electrode is a graphene layer, and the graphene layer is an electron emission end to emit electron. A thickness of the graphene layer ranges from about 0.1 nanometers to about 50 nanometers.

The present invention addresses the problem of providing an electron beam generator and an electron beam applicator for which maintenance is facilitated. The electron beam generator comprises a vacuum chamber, a photocathode holder, an activation vessel, and an internal motive power transmission member. The photocathode holder is capable of moving relative to the activation vessel.

Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.

Controlling total emission current of an electron emitting construct in an x-ray emitting device by providing a cathode, providing multiple active areas each active area having a gated cone electron source, including multiple emitter tips arranged in an array, a gate electrode, and a gate interconnect lead connected to the gate electrode, providing an x-ray emitting construct comprising an anode, the anode being an x-ray target, situating the x-ray emitting construct facing the active areas face each other, selecting a set of active areas, and activating selected active areas by conductively connecting a voltage source to their associated the gate electrode interconnect lead.

A charged particle gun for a charged particle beam device is described. The charged particle gun includes a gun housing; an emitter provided in the gun housing, the emitter being configured to emit a charged particle beam along an axis; an emitter power supply connected to the emitter; a trapping electrode provided in the gun housing, the trapping electrode at least partially surrounding the axis; a trapping power supply connected to the trapping electrode; and a shielding element shielding an electrostatic field of the trapping electrode from the axis during operation of the gun housing.

The apparatus includes: a photocathode including a substrate and a photoelectric film formed on the substrate; a light source configured to emit a pulsed excitation light; a condenser lens facing the substrate of the photocathode and configured to condense the pulsed excitation light toward the photocathode; a first anode electrode and a second anode electrode facing the photoelectric film of the photocathode; a first power supply configured to apply a first control voltage between the first anode electrode and the second anode electrode; and a second power supply configured to apply an acceleration voltage between the photocathode and the second anode electrode. The first anode electrode is disposed between the photocathode and the second anode electrode. A surface of the first anode electrode facing the second anode electrode has a recessed shape, and a surface of the second anode electrode facing the first anode electrode has a protruding shape.

An electron emission source is provided. The electron emission source comprises a first electrode, an insulating layer, and a second electrode, The first electrode, the insulating layer, and the second electrode are successively stacked with each other. the second electrode is a graphene layer, and the graphene layer is an electron emission end to emit electron. A thickness of the graphene layer ranges from about 0.1 nanometers to about 50 nanometers.

A photoinjector system containing modularly-structured waveguide-mode launcher, which is reversibly connected to the RF gun (containing a tubular construction formed with disattachably-affixed to one another structurally-complementary halves); and a solenoid magnet in operation enclosing such tubular structure in a central hollow. The resulting quality, power, and frequency rate of operation as well as cost of manufacturing and operation of the system are superior as compared with those of a related art system.