Patent classifications
H01J3/027
Device for controlling electron flow and method for manufacturing said device
A device for controlling electron flow is provided. The device comprises a cathode, an elongate electrical conductor embedded in a diamond substrate, an anode, and a control electrode provided on the substrate surface for modifying the electric field in the region of the end of the conductor. A method of manufacturing the device is also provided.
ELECTRON GUN
An electron gun includes: a cathode, which has a cathode holder and a cathode body; and a Wehnelt cylinder. The cathode holder receives the cathode body and the Wehnelt cylinder is suitable for bundling free electrons, which can escape from the cathode body toward the Wehnelt cylinder, to form an electron beam. The Wehnelt cylinder is interlockingly arranged, at least in some parts along a first inner surface facing the cathode holder, on an outer surface of the cathode holder and at least partly extends around the cathode holder.
CHARGED PARTICLE SOURCE MODULE
The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.
Electron gun and manufacturing method therefor
An electron gun comprising a cathode having an electron emitting surface and whose planar shape is circular, a heater to increase the temperature of the cathode, and an anode to apply a positive electric potential relative to the cathode to extract electrons in a predetermined direction is provided. The cathode comprises a through hole at a central portion thereof along a central axis of the cathode, and either the cathode comprises a no-emitting layer at at least one of an opening edge on the electron emitting surface side of the through hole and an inner surface of the through hole, or the opening edge on the electron emitting surface side of the through hole is a chamfered C surface or a chamfered R surface.
Electron gun and electron beam device
An electron gun includes an emitter, an electron gun electrode, and a short-circuiting mechanism for setting the emitter and the electron gun electrode at the same potential. The short-circuiting mechanism includes a first switch member provided with a first switch electrode that is connected to the emitter and a second switch electrode that is connected to the electron gun electrode, a second switch member provided with a third switch electrode, and a drive unit that operates at least one of the first switch member and the second switch member to switch between a state in which the first switch electrode and the second switch electrode are in contact with the third switch electrode and a state in which the first switch electrode and the second switch electrode are separated from the third switch electrode. The short-circuiting mechanism has the same potential as a predetermined voltage.
Space charge insensitive electron gun designs
Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.
Devices having an electron emitting structure
Controlling total emission current of an electron emitting construct in an x-ray emitting device by providing a cathode, providing multiple active areas each active area having a gated cone electron source, including multiple emitter tips arranged in an array, a gate electrode, and a gate interconnect lead connected to the gate electrode, providing an x-ray emitting construct comprising an anode, the anode being an x-ray target, situating the x-ray emitting construct facing the active areas face each other, selecting a set of active areas, and activating selected active areas by conductively connecting a voltage source to their associated the gate electrode interconnect lead.
Device for controlling electron flow and method for manufacturing said device
A device for controlling electron flow is provided. The device comprises a cathode, an elongate electrical conductor embedded in a diamond substrate, an anode, and a control electrode provided on the substrate surface for modifying the electric field in the region of the end of the conductor. A method of manufacturing the device is also provided.
Magnetically microfocused electron emission source
A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.
Device for Controlling Electron Flow and Method for Manufacturing Said Device
A device for controlling electron flow is provided. The device comprises a cathode, an elongate electrical conductor embedded in a diamond substrate, an anode, and a control electrode provided on the substrate surface for modifying the electric field in the region of the end of the conductor. A method of manufacturing the device is also provided.