Patent classifications
H01J11/22
LEAD-FREE GLASS COMPOSITION, GLASS COMPOSITE MATERIAL, GLASS PASTE, SEALING STRUCTURE, ELECTRICAL/ELECTRONIC COMPONENT AND COATED COMPONENT
The purpose of the present invention is to provide a lead-free glass composition in which crystallization is suppressed and which has a low softening point. This lead-free glass composition is characterized by containing silver oxide, tellurium oxide and vanadium oxide, and further containing at least one compound selected from among yttrium oxide, lanthanum oxide, cerium oxide, erbium oxide, ytterbium oxide, aluminum oxide, gallium oxide, indium oxide, iron oxide, tungsten oxide and molybdenum oxide as an additional component, and in that the content values (mol %) of silver oxide, tellurium oxide and vanadium oxide satisfy the relationships Ag.sub.2O>TeO.sub.2?V.sub.2O.sub.5 and Ag.sub.5O?2V.sub.2O.sub.5 when calculated in terms of the oxides, and in that the content of TeO.sub.2 is 25-37 mol. %.
Process chamber for field guided exposure and method for implementing the process chamber
A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.
Process chamber for field guided exposure and method for implementing the process chamber
A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.
Incontinence detection device
Most current incontinence detection systems are expensive, difficult to use, uncomfortable to wear, or suffer limitations in the scope of detected events. However, the present invention features an incontinence detection system that uses inexpensive technologies and is disposable. The system can indicate the degree and persistence of wetness. The degree of wetness can be measured across various factors, including geometrical coverage via multiple independent detection points, each comprising a detection cell. A suitably networked system can determine the time and location of wetness. Each cell might be tuned for various factors such as material fluid affinity and exposure area. An advantage of the invention is the ease with which it can be adapted to distinguish fecal incontinence as distinct from urinary incontinence; both forms of incontinence can be monitored using the same system described herein. Another advantage includes the ability to estimate urine salinity.
Incontinence detection device
Most current incontinence detection systems are expensive, difficult to use, uncomfortable to wear, or suffer limitations in the scope of detected events. However, the present invention features an incontinence detection system that uses inexpensive technologies and is disposable. The system can indicate the degree and persistence of wetness. The degree of wetness can be measured across various factors, including geometrical coverage via multiple independent detection points, each comprising a detection cell. A suitably networked system can determine the time and location of wetness. Each cell might be tuned for various factors such as material fluid affinity and exposure area. An advantage of the invention is the ease with which it can be adapted to distinguish fecal incontinence as distinct from urinary incontinence; both forms of incontinence can be monitored using the same system described herein. Another advantage includes the ability to estimate urine salinity.
Gas reactor devices with microplasma arrays encapsulated in defect free oxide
A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O.sub.2 and is converted by the plasma into ozone (O.sub.3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO.sub.2, CH.sub.4, or NO.sub.x.
Gas reactor devices with microplasma arrays encapsulated in defect free oxide
A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O.sub.2 and is converted by the plasma into ozone (O.sub.3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO.sub.2, CH.sub.4, or NO.sub.x.