A carburized La.sub.2O.sub.3 and Lu.sub.2O.sub.3 co-doped Mo filament cathode is made from lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders, the lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders contain La.sub.2O.sub.3, Lu.sub.2O.sub.3 and Mo with the total concentration of La.sub.2O.sub.3 and Lu.sub.2O.sub.3 being 2.0-5.0 wt. % and the rest being Mo.

A carburized La.sub.2O.sub.3 and Lu.sub.2O.sub.3 co-doped Mo filament cathode is made from lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders, the lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders contain La.sub.2O.sub.3, Lu.sub.2O.sub.3 and Mo with the total concentration of La.sub.2O.sub.3 and Lu.sub.2O.sub.3 being 2.0-5.0 wt. % and the rest being Mo.

An electron gun includes: a cathode, which has a cathode holder and a cathode body; and a Wehnelt cylinder. The cathode holder receives the cathode body and the Wehnelt cylinder is suitable for bundling free electrons, which can escape from the cathode body toward the Wehnelt cylinder, to form an electron beam. The Wehnelt cylinder is interlockingly arranged, at least in some parts along a first inner surface facing the cathode holder, on an outer surface of the cathode holder and at least partly extends around the cathode holder.

A tunneling electro source, an array thereof and methods for making the same are provided. The tunneling electron source is a surface tunneling micro electron source having a planar multi-region structure. The tunneling electron source includes an insulating substrate, and two conductive regions and one insulating region arranged on a surface of the insulating substrate. The insulating region is arranged between the two conductive regions and abuts on the two conductive regions. Minimum spacing between the two conductive regions, which equals to a minimum width of the insulating region, is less than 100 nm.

The purpose is to make it possible to autonomously suppress a reduction in an electron beam without providing a means for supervising the electron beam intensity of a monitor or the like. An electron gun, provided with: a heater (12) in which one terminal serves as a heater terminal (H) and the other terminal serves as a shared terminal (HK), and in which a low-voltage power supply (21) is connected between the terminals, the heater (12) generating heat due to a current being supplied from the low-voltage power supply (21); and a cathode electrode (11) connected to the shared terminal (HK) and heated by the heater (12) to discharge thermal electrons. A cathode current (Ik) due to the thermal electrons discharged from the cathode electrode (11), and a current (Ih) due to the low-voltage power supply, flow in opposite directions through the heater (12).

The purpose is to make it possible to autonomously suppress a reduction in an electron beam without providing a means for supervising the electron beam intensity of a monitor or the like. An electron gun, provided with: a heater (12) in which one terminal serves as a heater terminal (H) and the other terminal serves as a shared terminal (HK), and in which a low-voltage power supply (21) is connected between the terminals, the heater (12) generating heat due to a current being supplied from the low-voltage power supply (21); and a cathode electrode (11) connected to the shared terminal (HK) and heated by the heater (12) to discharge thermal electrons. A cathode current (Ik) due to the thermal electrons discharged from the cathode electrode (11), and a current (Ih) due to the low-voltage power supply, flow in opposite directions through the heater (12).

Embodiments include a vacuum device, comprising: an enclosure configured to enclose a vacuum, comprising an external base forming at least a portion of the enclosure; an internal base within the enclosure; and at least one thermal dissipative strap assembly, comprising: an internal base thermal conductive base in contact with the internal base, an external base thermal conductive base in contact with the external base, and a flexible thermal dissipative strap coupling the internal base thermal conductive base to the external base thermal conductive base.

Embodiments include a vacuum device, comprising: an enclosure configured to enclose a vacuum, comprising an external base forming at least a portion of the enclosure; an internal base within the enclosure; and at least one thermal dissipative strap assembly, comprising: an internal base thermal conductive base in contact with the internal base, an external base thermal conductive base in contact with the external base, and a flexible thermal dissipative strap coupling the internal base thermal conductive base to the external base thermal conductive base.

Embodiments include a vacuum device, comprising: an enclosure configured to enclose a vacuum, the enclosure including an external base including an opening; an internal base within the enclosure; and an adjustable support assembly adjustably coupling the internal base to the external base and extending through the opening, the adjustable support assembly comprising: a threaded shaft extending along a longitudinal axis and coupled to the internal base; a threaded hole component threadedly engaged with the threaded shaft and coupled to the external base such that the threaded hole component is axially constrained in a direction along the longitudinal axis relative to the external base independent of the threaded shaft; and a flexible component coupled to the external base and the threaded shaft and sealing the opening.

An apparatus, system, and method for performing electron beam modulation includes an input pulser to provide an electromagnetic pulse; a radio frequency (RF) filter to filter the electromagnetic pulse; a nonlinear transmission line to receive the electromagnetic pulse, and generate a backward wave RF oscillation of a predetermined frequency to travel in a direction opposite that of the electromagnetic pulse; and an electron beam generating device including an anode and a cathode, the electron beam generating device to receive a combined electromagnetic pulse from the RF filter and the backward wave RF oscillation from the nonlinear transmission line to cause excitation of a modulated voltage between the anode and cathode, and to cause the electron beam generating device to emit an electron beam that is modulated at the predetermined frequency of the backward wave RF oscillation.