Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Coherent electronic current is generated by generating and transmitting an electron bunch along a longitudinal axis. The electron bunch is then directed onto a target, wherein the target imparts a transverse spatial modulation to the electron bunch via diffraction contrast or phase contrast. The transverse spatial modulation of the electron bunch is then transferred to the longitudinal axis via an emittance exchange beamline, creating a periodically modulated distribution of coherent electronic current.

Coherent electronic current is generated by generating and transmitting an electron bunch along a longitudinal axis. The electron bunch is then directed onto a target, wherein the target imparts a transverse spatial modulation to the electron bunch via diffraction contrast or phase contrast. The transverse spatial modulation of the electron bunch is then transferred to the longitudinal axis via an emittance exchange beamline, creating a periodically modulated distribution of coherent electronic current.