The respective proportionality constants of magnetic force by magnetic field producing portion for biasing the plug in the direction of insertion and resilient force by a spring mechanism for biasing the plug in the direction of extraction are adjusted in such a manner that the resilient force is greater than the magnetic force until the plug pin reaches an intermediate insertion position at which the plug pin comes into proximity to or separates from the socket contact, whereas the magnetic force is greater than the resilient force at a position at which the plug pin is inserted into a complete insertion position for a hot-line connection to the socket contact. The plug pin in the vicinity of the intermediate insertion position, at which there is a possibility of occurrence of an arc discharge, is ejected by the resilient force.

An ion source having an ion generation container configured to generate ions by reacting ionized gas introduced into the container via a tubular gas introduction pipe with an ion source material emitted in the container. The gas introduction pipe is configured to introduce the ionized gas into an inner space of the gas introduction pipe via a gas supply pipe. In the inner space of the gas introduction pipe, a detachable cooling trap member is disposed and includes a cooling trap portion configured to cool and trap a byproduct produced in the ion generation container. The cooling trap portion is disposed near a supply-side leading end of the gas supply pipe in the inner space of the gas introduction pipe and is not contact with an interior wall face of the gas introduction pipe.

An ion source includes an external housing, an electrically conductive tip, a gas supply system, configured to supply an operating gas into the neighborhood of the tip, and a cooling system configured to cool the tip. The gas supply system includes a first tube with a hollow interior, and a chemical getter material is provided in the hollow interior of the tube.

The disclosure describes various aspects of a shed-resistant thermal atom source. More specifically, a thermal atom source is described for uniform thermal flux of target atomic species in which a metal wadding material is used as an intermediary surface for sublimation of the atoms, preventing the source material from shedding or dropping. In an aspect, a thermal atom source may include a container with closed and open ends, and inside a source material near the closed end and a wadding between the source material and the open end; a heater coupled to the closed end; one or more clamps configured to secure the container and the heater; and a current source coupled to the container and the heater to cause a temperature to increase such that a portion of the source material is released and diffuses to the open end through the wadding prior to being emitted as a flux.

An apparatus includes a first pump module, a second pump module and a sealing disc. The first pump module includes a first flange having a first opening, a second flange having a second opening and at least one first pump. The second pump module includes a third flange having a third opening, a fourth flange having a fourth opening, and at least one second pump. The sealing disc is positioned between and in sealing contact with the second flange and the third flange and has a disc opening with a cross-sectional area that is less than a cross-sectional area of the second opening in the second flange and that is less than a cross-sectional area of the third opening in the third flange, where the disc opening is aligned with the first, second, third and fourth openings.

The present invention provides methods and systems for an ion generation device that includes an elongate housing having a back portion and a pair of side portions extending from the back portion and forming a cavity therein. A conductive portion is disposed within the cavity and connected to a power supply for providing power to the conductive portion. A plurality of tines are engaged to the conductive portion.

A polarity-selectable high voltage direct current power supply including a first drive assembly that transforms a first low voltage DC input into a first medium voltage alternating current output; a first HV output assembly that transforms the first LV AC output into a first HV DC output, wherein the first HV output assembly defines a first input stage; a polarity selector coupled between the second output junction of the first drive assembly and the first and second input stages of the first HV output assembly, the polarity selector operable between a first configuration and a second configuration; wherein in the first configuration the first HV DC output has a positive polarity; and wherein in the second configuration the first HV DC output has a negative polarity.

An assembly present in an ion source for supporting an arc chamber upon a base plate includes a first arc support plate, a first screw, and a second screw. The first screw passes through a smooth through-hole in an arm of the first arc support plate and extends into a bore in the base plate. The second (or adjustable) screw passes through a threaded through-hole in an arm of the first arc support plate and engages an upper surface of the base plate itself, and can be used to change the altitude and angle of the first arc support plate relative to the base plate. This adjustment ability improves the beam quality of the ion source.

In this invention, vibrations generated by a freezer from a cooling mechanism for cooling an ion source emitter tip are prevented from being transmitted to the emitter tip as much as possible, while the cooling capability of the cooling mechanism is improved widely. The ion beam device (10) is equipped with: an ion source housing (22) provided with an emitter tip (45) and defining an ion source chamber (27) supplied with an ionization gas or gas molecules; a gas pot (51) provided in the ion source chamber (27) so as to be thermally connected to the emitter tip (45) and accommodated so as to have no direct physical contact with a cooling stage (57) of a freezer (52); and a spacer (59) provided on the peripheral surface of the cooling stage (57) housed by the gas pot (51) and maintaining a given interval or greater between the peripheral surface of the cooling stage (57) and the internal peripheral surface of the gas pot (52).

An apparatus for the creation of high current ion beams is disclosed. The apparatus includes an ion source, such as a RF ion source or an indirectly heated cathode (IHC) ion source, having an extraction aperture. Disposed proximate the extraction aperture is a bias electrode, which has a hollow center portion that is aligned with the extraction aperture. A magnetic field is created along the perimeter of the hollow center portion, which serves to contain electrons within a confinement region. Electrons in the confinement region energetically collide with neutral particles, increasing the number of ions that are created near the extraction aperture. The magnetic field may be created using two magnets that are embedded in the bias electrode. Alternatively, a single magnet or magnetic coils may be used to create this magnetic field.