H01J27/20

Plasma accelerator with modulated thrust

The invention relates to a plasma accelerator that produces and controls a plasma stream exhaust, in particular for space propulsion. The ions are produced inside the discharge chamber by working gas collisional ionization by electrons from a single electron source placed outside, also employed for ion beam neutralization. The ion motion is directed outwards through the exit side by the electric field between a cathode grid and the walls of the plasma chamber. The acceleration voltage imparts energy to the ion flux and an electrically biased control grid modulates the ion outflow from the discharge chamber and the electron inflow from the electron source. This allows electrical control of throttle and/or modulation of thrust delivered along the longitudinal direction of the thruster axis. Several plasma accelerators could be clustered together to provide controlled non-axial thrust using the individual control of throttle.

ION-GENERATING DEVICE
20180375301 · 2018-12-27 ·

A device that includes at least one generator of ionized particles such as negative oxygen ions with a view to making breathed air more healthy. In order to regularize the generation of the ions, the device includes a grid-shaped structure made up of conductive segments at the mouths of the generators.

ION-GENERATING DEVICE
20180375301 · 2018-12-27 ·

A device that includes at least one generator of ionized particles such as negative oxygen ions with a view to making breathed air more healthy. In order to regularize the generation of the ions, the device includes a grid-shaped structure made up of conductive segments at the mouths of the generators.

PLASMA ACCELERATOR WITH MODULATED THRUST

The invention relates to a plasma accelerator that produces and controls a plasma stream exhaust, in particular for space propulsion. The ions are produced inside the discharge chamber by working gas collisional ionization by electrons from a single electron source placed outside, also employed for ion beam neutralization. The ion motion is directed outwards through the exit side by the electric field between a cathode grid and the walls of the plasma chamber. The acceleration voltage imparts energy to the ion flux and an electrically biased control grid modulates the ion outflow from the discharge chamber and the electron inflow from the electron source. This allows electrical control of throttle and/or modulation of thrust delivered along the longitudinal direction of the thruster axis. Several plasma accelerators could be clustered together to provide controlled non-axial thrust using the individual control of throttle.

MEMS DEVICE FOR GENERATING AN ION BEAM

A generator of an ion beam is provided, including an ionisation chamber provided with an inlet of a fluid to be ionised; a source of ionising particles configured to impact the fluid in an impact zone of the ionisation chamber so as to generate ions; and an extractor of ions generated in a direction of an outlet zone of the generator, the extractor including at least two electrodes, a first electrode referred to as input electrode laterally bordering the impact zone, and at least one second electrode referred to as intermediate electrode located in the impact zone, the at least two electrodes being configured to generate a voltage gradient in the impact zone, with the voltage gradient being configured to direct the generated ions to the outlet zone of the generator.

COMPACT ION BEAM SOURCES FORMED AS MODULAR IONIZER

Example compact ion beam sources are provided that can be used to generate ion beams using chemical species and field emitter elements or field emitter arrays. In some example, the compact ion beam source can be implemented as neutron sources based on ion beam bombardment of neutron-rich targets.

COLLISION IONIZATION SOURCE

A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

COLLISION IONIZATION SOURCE

A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

Dual Cathode Ion Source

An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller.

ION SOURCE ASSEMBLY WITH MULTIPLE ELLIPTICAL FILAMENTS
20240363325 · 2024-10-31 · ·

An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons and are positioned outside the ionization volume and proximate to the anode. The at least two filaments each comprise an elliptically-shaped portion and non-elliptical portions on either end of the elliptically-shaped portion. The non-elliptically-shaped portions are configured to be mounted in a fixed position relative to the anode to maintain a constant distance between the elliptically-shaped portion and the anode. The elliptically-shaped portion extends along a plane that intersects a plane perpendicular to the axis of the anode at a non-zero angle.