Example compact ion beam sources are provided that can be used to generate ion beams using chemical species and field emitter elements or field emitter arrays. In some example, the compact ion beam source can be implemented as neutron sources based on ion beam bombardment of neutron-rich targets.

In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

An ion propulsion device including emission modules in an emission plane, each module having an insulating support, an emission electrode on the support, and a conductive liquid with a microfluidic channel depositing conductive liquid on the electrode; an extraction electrode common to the emission modules and facing the modules; and a control unit, in which each module is configured to emit an ion beam when an electric field is applied to the liquid; each control unit controls an ion emission current emitted by applying a potential difference between each emission electrode and the extraction electrode; the emission electrodes are spaced apart by a linear distance that is greater than a distance between two adjacent emission electrodes separated by an empty space; and a length of the insulating support between the electrodes is greater than a propagation distance of an electric leakage current by charge jumping along the support between the electrodes.

An ion propulsion device including emission modules in an emission plane, each module having an insulating support, an emission electrode on the support, and a conductive liquid with a microfluidic channel depositing conductive liquid on the electrode; an extraction electrode common to the emission modules and facing the modules; and a control unit, in which each module is configured to emit an ion beam when an electric field is applied to the liquid; each control unit controls an ion emission current emitted by applying a potential difference between each emission electrode and the extraction electrode; the emission electrodes are spaced apart by a linear distance that is greater than a distance between two adjacent emission electrodes separated by an empty space; and a length of the insulating support between the electrodes is greater than a propagation distance of an electric leakage current by charge jumping along the support between the electrodes.

In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

An ion generator includes an arc chamber which has a plasma generating region therein, a cathode configured to emit a thermoelectron toward the plasma generating region, a repeller which faces the cathode in an axial direction in a state where the plasma generating region is interposed between the cathode and the repeller, and a cage which is disposed to partially surround the plasma generating region at a position between an inner surface of the arc chamber and the plasma generating region.

An ion generator includes an arc chamber which has a plasma generating region therein, a cathode configured to emit a thermoelectron toward the plasma generating region, a repeller which faces the cathode in an axial direction in a state where the plasma generating region is interposed between the cathode and the repeller, and a cage which is disposed to partially surround the plasma generating region at a position between an inner surface of the arc chamber and the plasma generating region.