A radiation analysis apparatus includes an excitation source unit irradiating an object, for which the radiation analysis apparatus analyzes property or a structure, with a first radiation, a radiation detection unit including three or more radiation detectors that detect a second radiation generated from the object irradiated with the first radiation, a radiation focusing unit disposed between the object and the radiation detection unit, and focusing the second radiation, a position changing unit changing a relative positional relationship between the radiation focusing unit and the radiation detection unit, and a control unit controlling the position changing unit to change the positional relationship, based on first information which is stored in a storage unit and indicates an intensity distribution of the second radiation emitted from the radiation focusing unit and second information indicating a distribution based on a detection count of the second radiation detected by each of the radiation detectors.

An inspection system (100) having: a source (101) configured to generate inspection radiation (40); a collimator (103) configured to collimate the inspection radiation into an inspection beam (41) configured to irradiate a section of a vehicle (20); a filter (102) located between the source and the collimator, the filter having at least a cargo configuration and an attenuation configuration; and a controller (104) configured to control the configuration of the filter, such that the filter is in the cargo configuration when the inspection beam irradiates a container (23), and in the attenuation configuration when the inspection beam irradiates a cabin (21).

A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.

A measurement device includes a plurality of slits, a beam current measurement unit provided at a position away from the slits in a beam traveling direction, and a measurement control unit. The beam current measurement unit is configured to be capable of measuring a beam current at a plurality of measurement positions to be different positions in a first direction perpendicular to the beam traveling direction. The slits are disposed to be spaced apart in the first direction such that the first direction coincides with a slit width direction and are configured to be movable in the first direction. The measurement control unit acquires a plurality of beam current values measured at the plurality of measurement positions to be the different positions in the first direction with the beam current measurement unit while moving the slits in the first direction.

An X-ray system includes a multiple degree of freedom robotic arm mounted to a surface of a radiology suite, the robotic arm having one or more telescoping arm members, an X-ray source mounted on an end effector of the multiple degree of freedom robotic arm, at least one X-ray detector, and a work station coupled to the robotic arm, X-ray source, and X-ray detector, wherein the work station is configured to compute robotic arm trajectories for at least one scanning procedure and to control the robotic arm, X-ray source, and X-ray detector to effect the at least one scanning procedure.

The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.

A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.

There is provided an ion source device including a pair of first electrodes for emitting an electron, a second electrode that defines a region in which the electron is enclosed and to which raw material source gas is supplied, between the pair of first electrodes, and that has a hole portion through which an ion generated by collision between the electron and the material gas is extruded, an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, and an intermediate electrode disposed between the second electrode and the extraction electrode. A first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

An apparatus for collection, distribution, and analysis of cathodoluminescence (CL) and other light signals in an electron microscope is provided. The optical hub, utilizing a linear-translating fold-mirror and mounted to the electron microscope, is used to receive essentially collimated light collected from a collection-mirror and efficiently route the collected light to a plurality of light-analysis instruments. The linear-translating fold-mirror can provide fine positional alignment of the light signal, and in an aspect of the invention can be used to select or scan a portion of the collected light-pattern into an optical slit or aperture. In one aspect, the optical hub includes a light filter mechanism that can track the movement of the fold-mirror. In an aspect, the optical hub also controls the positioning of the collection-mirror in proximity to the specimen being analyzed.

A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.