H01J37/16

CHARGED PARTICLE BEAM DEVICE
20230139507 · 2023-05-04 ·

The present invention provides a charged particle beam device (1) capable of attenuating intrinsic vibrations of an ion pump (104) which is connected to a lens barrel (101), regardless of the length of the lens barrel (101). A charged particle beam device (1) according to the present invention comprises: a lens barrel (101) for irradiating a sample (108) with a charged particle beam (106); an ion pump (104) which is connected to the lens barrel (101) and which evacuates the air inside the lens barrel (101); and a support member (117), one end of which is connected to the ion pump (104), and the other end of which is connected the lens barrel (101). The support member (117) includes a viscoelastic body (118) which is provided substantially parallel to the central axis (114) of the lens barrel (101).

CHARGED PARTICLE BEAM DEVICE
20230139507 · 2023-05-04 ·

The present invention provides a charged particle beam device (1) capable of attenuating intrinsic vibrations of an ion pump (104) which is connected to a lens barrel (101), regardless of the length of the lens barrel (101). A charged particle beam device (1) according to the present invention comprises: a lens barrel (101) for irradiating a sample (108) with a charged particle beam (106); an ion pump (104) which is connected to the lens barrel (101) and which evacuates the air inside the lens barrel (101); and a support member (117), one end of which is connected to the ion pump (104), and the other end of which is connected the lens barrel (101). The support member (117) includes a viscoelastic body (118) which is provided substantially parallel to the central axis (114) of the lens barrel (101).

ATOM PROBE WITH VACUUM DIFFERENTIAL
20170372868 · 2017-12-28 ·

In an atom probe having a vacuum chamber containing a specimen mount and a detector for receiving ions emitted from the specimen, a high vacuum subchamber is provided about the specimen mount, with an aperture in the subchamber allowing passage of emitted ions to the detector. The high vacuum subchamber may be pumped to higher vacuum (lower pressure) than the vacuum chamber, and so long as the pressure in the vacuum chamber is below about 10.sup.−1 Pa, very little gas diffusion takes place through the aperture, allowing higher vacuum to be maintained in the subchamber despite the aperture opening to the chamber. The higher vacuum in the subchamber about the specimen assists in reducing noise in atom probe image data. The aperture may conveniently be provided by the aperture in a counter electrode, such as a local electrode, as commonly used in atom probes.

METHOD FOR CHARACTERIZING TWO DIMENSIONAL NANOMATERIAL

The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle θ between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin θ≅dθ=λ, where λ represents a wavelength of the electron beam.

METHOD FOR CHARACTERIZING TWO DIMENSIONAL NANOMATERIAL

The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle θ between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin θ≅dθ=λ, where λ represents a wavelength of the electron beam.

VACUUM COMPATIBLE FLUID SAMPLER
20170348687 · 2017-12-07 ·

A fluid sampler includes: a sample cell that includes: a substrate comprising: a first port; a second port in fluid communication with the first port; a viewing reservoir in fluid communication with the first port and the second port and that receives the fluid from the first port and communicates the fluid to the second port, the viewing reservoir including: a first view membrane; a second view membrane; and a pillar interposed between the first view membrane and second view membrane, the pillar separating the first view membrane from the second view membrane at a substantially constant separation distance such that a volume of the viewing reservoir is substantially constant and invariable with respect to a temperature and invariable with respect to a pressure to which the sample cell is subjected.

DIFFERENTIAL PUMPING APPARATUS AND FOCUSED ENERGY BEAM SYSTEM

A differential pumping apparatus for creating a high vacuum inside a processing space includes a displacement drive unit configured to move a substrate to be processed or a head, to adjust parallelism and distance between a surface to be processed and a surface of the head. Gap measurement devices are placed at three or more locations along the periphery of the surface of the head to provide distance information. A gap control unit is configured to control the displacement drive unit in response to the distance information between the surface to be processed and the surface adapted to face the surface to be processed, so that the surface to be processed and the surface adapted to face the surface to be processed are parallel.

PRINTED CIRCUIT BOARD FOR SEALING VACUUM SYSTEM

Detector modules, systems and methods for detecting signal beams are disclosed using a detector module and a support comprising a feedthrough.

Furthermore, apparatuses, systems, and methods for sealing a vacuum system configured to provide an atmospheric environment and a vacuum chamber environment are disclosed. In some embodiments, a printed circuit board (PCB) comprising a first side for exposing to the atmospheric environment and a second side for exposing to the vacuum chamber environment and for covering an aperture in the vacuum chamber environment, wherein the second side is opposite to the first side. The apparatuses, systems, and methods may include a rigid body on the first side of the PCB and a device connected to the second side of the PCB and positioned on a portion of the PCB that covers the aperture. The PCB may be configured to provide an interface between the device and the rigid body.

PRINTED CIRCUIT BOARD FOR SEALING VACUUM SYSTEM

Detector modules, systems and methods for detecting signal beams are disclosed using a detector module and a support comprising a feedthrough.

Furthermore, apparatuses, systems, and methods for sealing a vacuum system configured to provide an atmospheric environment and a vacuum chamber environment are disclosed. In some embodiments, a printed circuit board (PCB) comprising a first side for exposing to the atmospheric environment and a second side for exposing to the vacuum chamber environment and for covering an aperture in the vacuum chamber environment, wherein the second side is opposite to the first side. The apparatuses, systems, and methods may include a rigid body on the first side of the PCB and a device connected to the second side of the PCB and positioned on a portion of the PCB that covers the aperture. The PCB may be configured to provide an interface between the device and the rigid body.

HIGH VOLTAGE ELECTRON BEAM SYSTEM AND METHOD
20170309442 · 2017-10-26 · ·

A high voltage inspection system that includes a vacuum chamber; electron optics that is configured to direct an electron beam towards an upper surface of a substrate; a substrate support module that comprises a chuck and a housing; wherein the chuck is configured to support a substrate; wherein the housing is configured to surround the substrate without masking the electron beam, when the substrate is positioned on the chuck during a first operational mode of the high voltage inspection system; and wherein the substrate, the chuck and the housing are configured to (a) receive a high voltage bias signal of a high voltage level that exceeds ten thousand volts, and (b) to maintain at substantially the high voltage level during the first operational mode of the high voltage inspection system.