One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column. The composite beam apparatus is capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column, when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam.

A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

A corrected scanning electron microscope (CSEM) and a method of operating the CSEM for selectively separating a material contrast from a topography contrast is presented. The microscope and the method enable high imaging resolution with backscattered electrons generated from low energy primary electrons. The CSEM and the method is applicable to mask repair and circuit editing processes with resolution requirements in the low nm range or even below.

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

To realize a sample lifting and lowering device capable of easily responding to increase of a diameter of a sample with light weight and high rigidity as well as with less directional dependence of rigidity as the sample lifting lowering device arranged above a horizontal movement mechanism. The sample lifting and lowering device includes first and second lifting and lowering mechanisms that lift and lower a sample stage to which the sample is fixed, first and second driving devices that drive the first and second lifting and lowering mechanisms to be lifted and lowered individually and a controller that synchronizes lifting/lowering operations of the first and second lifting and lowering mechanisms by the first and second driving devices by first and second control signals, in which the first lifting and lowering mechanism includes a first deceleration mechanism generating a first drive output obtained by decelerating a first drive input given from the first driving device in a direction different from a direction of the input, the second lifting and lowering mechanism includes a second deceleration mechanism generating a second drive output obtained by decelerating a second drive input given from the second driving device in a direction different from a direction of the input, and directions of the first and second drive inputs are different from each other as well as are not on the same straight line.

To realize a sample lifting and lowering device capable of easily responding to increase of a diameter of a sample with light weight and high rigidity as well as with less directional dependence of rigidity as the sample lifting lowering device arranged above a horizontal movement mechanism. The sample lifting and lowering device includes first and second lifting and lowering mechanisms that lift and lower a sample stage to which the sample is fixed, first and second driving devices that drive the first and second lifting and lowering mechanisms to be lifted and lowered individually and a controller that synchronizes lifting/lowering operations of the first and second lifting and lowering mechanisms by the first and second driving devices by first and second control signals, in which the first lifting and lowering mechanism includes a first deceleration mechanism generating a first drive output obtained by decelerating a first drive input given from the first driving device in a direction different from a direction of the input, the second lifting and lowering mechanism includes a second deceleration mechanism generating a second drive output obtained by decelerating a second drive input given from the second driving device in a direction different from a direction of the input, and directions of the first and second drive inputs are different from each other as well as are not on the same straight line.