Provided is an ion source achieving high sensitivity and high robustness while executing a plurality of types of ionization schemes. To this end, a hybrid ion source (1) includes: a chamber (24); a first ion source (2) to spray a sample solution (5) for ionization; a second ion source (3) to ionize droplets and/or a gas component sprayed from the first ion source (2); a first electrode (11) to introduce a first ion (7) generated by the first ion source (2), and a second ion generated by the second ion source (3); and an exhaust pump (27) that generates air flow (26) in a direction from a first space area (23) where the first ion (7) is generated to a second space area (19) in the second ion source (3) where the second ion is generated.

A method of producing ions from a sample is disclosed. The method comprises directing a spray of droplets onto a sample, and causing droplets comprising analyte from the sample to impact upon a surface so as to generate analyte ions.

A device for mass spectroscopy comprising a chamber configured to provide an atomization source, a boost device configured to provide radio frequency energy to the chamber, and a mass analyzer in fluid communication with the chamber and configured to separate species based on mass-to-charge ratios is disclosed. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization.

A sample introduction system provides mixing of a sample and a diluent within the container via gas injection. In one or more implementations, the sample introduction system causes a probe of an autosampler to be inserted into a container containing a sample and a diluent so that an end of the probe is submerged beneath a surface of the diluent and the sample. Gas is then injected through the probe to mix the sample and the diluent within the container. An aliquot of the mixed sample and diluent is then withdrawn through the probe.

Systems and methods for use in introducing samples to an analytical device for single particle compositional analysis. Suitable analytical devices include, for example, an inductively coupled plasma-optical emission spectrometer. Prior to introduction to the analytical device, the sample gas is exchanged with argon gas, for example, using a gas exchange device. The analytical device may be calibrated with a liquid sample which is aerosolized prior to entry into the analytical device.

A method of automatically performing a routine to check the operational state of a mass spectrometer is disclosed wherein the method is performed automatically as a start-up routine upon switching ON the mass spectrometer. The method comprises automatically generating a vacuum within one or more vacuum chambers of a mass spectrometer and automatically generating first ions using an internal ion source, wherein the internal ion source is located within a vacuum chamber of the mass spectrometer or is located within a chamber downstream from an atmospheric pressure interface, and detecting at least some of the first ions or second ions derived from the first ions. The method further comprises automatically determining whether or not the mass spectrometer is in a correct operational state.

A method of automatically performing a routine to check the operational state of a mass spectrometer is disclosed wherein the method is performed automatically as a start-up routine upon switching ON the mass spectrometer. The method comprises automatically generating a vacuum within one or more vacuum chambers of a mass spectrometer and automatically generating first ions using an internal ion source, wherein the internal ion source is located within a vacuum chamber of the mass spectrometer or is located within a chamber downstream from an atmospheric pressure interface, and detecting at least some of the first ions or second ions derived from the first ions. The method further comprises automatically determining whether or not the mass spectrometer is in a correct operational state.

There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.

A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.

An optical emission spectrometry instrument may comprise an inductively coupled plasma generator (ICP) with an electromagnetic coil having input and ground connectors. The electromagnetic coil may be mounted to a mounting disk, and the input connector may be coupled to a power output of a radio frequency power source, and the ground connector may be connected to the mounting disk. A spectro-chemical source may be used for sample excitation. The spectro-chemical source and the ICP may have a longitudinal axis. An optical system may be included for viewing the spectro-chemical source with a fixed view axis. The electromagnetic coil may be mounted pivotably around one of its connectors so that the orientation of the ICP can be altered from a first orientation of its longitudinal axis to a second orientation of its longitudinal axis, and vice versa.