A sample analysis apparatus for scientific analytical equipment such as mass spectrometers. The sample analysis apparatus includes an ion source configured to generate an ion from a sample input into the particle detection apparatus, and an ion detector having an input configured to receive an ion generated from an ion source. The sample analysis apparatus is configured such that a contaminant comingling with an ion generated by the ion source and flowing in the same general direction as the ion, is inhibited or prevented from entering the detector input.

A sample analysis apparatus for scientific analytical equipment such as mass spectrometers. The sample analysis apparatus includes an ion source configured to generate an ion from a sample input into the particle detection apparatus, and an ion detector having an input configured to receive an ion generated from an ion source. The sample analysis apparatus is configured such that a contaminant comingling with an ion generated by the ion source and flowing in the same general direction as the ion, is inhibited or prevented from entering the detector input.

A magnet assembly for an ion source comprising a first magnet of a first magnet type; a second magnet of a second magnet type; a heat shield located between the first magnet and the second magnet; and a heat sink coupled to the heat shield; wherein the first magnet type having a higher Curie temperature than the second magnet type.

A magnet assembly for an ion source comprising a first magnet of a first magnet type; a second magnet of a second magnet type; a heat shield located between the first magnet and the second magnet; and a heat sink coupled to the heat shield; wherein the first magnet type having a higher Curie temperature than the second magnet type.

An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field.

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.

A magnetic sector including magnetic means, a yoke including a first magnetic portion, and a deflection gap in the first magnetic portion. The magnetic sector is configured such that the magnetic means are adapted for generating a magnetic field through the deflection gap in order to deflect charged particles moving in the deflection gap. The yoke further includes a second magnetic portion having a magnetic shunt including a shunt passage for the charged particles. The magnetic shunt directs a magnetic flux leaked from the deflection gap into the first magnetic portion.

A magnetic sector including magnetic means, a yoke including a first magnetic portion, and a deflection gap in the first magnetic portion. The magnetic sector is configured such that the magnetic means are adapted for generating a magnetic field through the deflection gap in order to deflect charged particles moving in the deflection gap. The yoke further includes a second magnetic portion having a magnetic shunt including a shunt passage for the charged particles. The magnetic shunt directs a magnetic flux leaked from the deflection gap into the first magnetic portion.

The present disclosure discloses a method and a system for determining an energy spectrum of an incident electron beam. The method includes obtaining a plurality of deflection currents of a beam deflection device; for each of the plurality of deflection currents, determining an energy range of an ejected electron beam, and determining a target current of a target generated by the ejected electron beam irradiating the target, wherein the ejected electron beam is emitted from an output of the beam deflection device after the incident electron beam enters the beam deflection device. The method also includes determining the energy spectrum of the incident electron beam based on the energy ranges of the plurality of ejected electron beams and the corresponding target currents.