An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

The light source contains a chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The chamber consists of a tube, a bottom and a cap. The cap is arranged for filling the chamber with gas. The tube and bottom are made from an optically transparent material. The bottom is arranged for input into the chamber of the CW laser beam and pulsed laser beams used for the plasma ignition, while the tube is arranged for exit of the output beam of plasma radiation. Preferably shape of the tube is arranged for reducing aberrations which distort a path of rays of plasma radiation passing through the tube wall. The technical result consists in creating electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect plasma radiation in a spatial angle of more than 9 sr.

A product having at least one plasma lamp that includes plates that are approximately parallel, with at least one array of microcavities formed in a surface of at least one plate. When desirable, the plates are separated a fixed distance by spacers with at least one spacer being placed near the plate's edge to form a hermetic seal therewith. A gas makes contact with the microcavity array. Electrodes capable of delivering a time-varying voltage are located such that the application of the time-varying voltage interacts with the gas to form a glow discharge plasma in the microcavities and the fixed volume between the plates. The glow discharge plasma efficiently and uniformly emits radiation that is predominantly in the UV/VUV spectral range with at least a portion of the radiation being emitted from the plasma lamp.

Embodiments relate generally to an ultraviolet lamp (100) for use with a photoionization detector comprising a sealed tube (102) configured to contain at least one gas; a coating (120) applied to the inner surface (110) of the sealed tube (102); and a crystal window (112) attached to the sealed tube (102), configured to allow transmittance of ultraviolet (UV) light generated within the sealed tube (102). Additional embodiments include a method of forming an ultraviolet lamp (100) for use with a photoionization detector, the method comprising applying at least one layer of a coating (120) onto an inner surface (110) of a sealed tube (102); sealing a crystal window (112) onto the sealed tube (102); filling the sealed tube (102) with at least one gas; sealing the sealed tube (102) containing the at least one gas; generating ultraviolet radiation using the at least one gas within the sealed tube (102); and directing the generated ultraviolet radiation through the crystal window (112) toward a sample gas in the photoionization detector.

The invention relates to plasma light sources with a continuous optical discharge (COD). The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. A density of gas particles in the chamber is less than 90.Math.10.sup.19 cm.sup.3 and a temperature of the chamber is in a range from 600 to 900 K or optionally higher. Preferably the density of gas particles is as low as possible and the temperature of the inner surface of the chamber at operation is as high as possible under providing a gas pressure in the chamber of about 50 bar or more. The technical result of the invention consists in providing COD sustaining conditions, which are optimal for achieving high stability and high brightness of the radiating plasma, in the creation on this basis of broadband light sources with ultra-high brightness and stability.

Materials and optical components formed thereof that are suitable for use in a lighting apparatus to impart a color filtering effect to visible light. At least a portion of such an optical component is formed of a composite material comprising a polymeric matrix material and an inorganic particulate material that contributes a color filtering effect to visible light passing through the composite material, and the particulate material comprises a neodymium compound containing Nd.sup.3+ ions.

The present invention has as its object the provision of an ultraviolet sterilizer that can reduce ultraviolet light in a wavelength region of 230 to 300 nm, which is harmful to the human body, and can output effective light in a wavelength region of 200 to 230 nm with high emission intensity. The ultraviolet sterilizer of the present invention is an ultraviolet sterilizer comprising: an ultraviolet light source; a lamp storage chamber for storing the ultraviolet light source; and a light guiding part for guiding light from the ultraviolet light source, in which a band pass filter for reducing ultraviolet light in a wavelength region harmful to a human body is provided at least one of a position between the light guiding part and the lamp storage chamber and a position of a light outputting leading end of the light guiding part, and an inner surface of the light guiding part is formed from an ultraviolet absorbing member that absorbs the ultraviolet light in the wavelength region harmful to the human body.

The specification and drawings present a new apparatus such as a lighting apparatus, the apparatus comprising at least one LED (or OLED) module, configured to generate a visible light such as white light, and at least one component such as optical component comprising a compound consisting essentially of the elements neodymium (Nd) and fluorine (F), and optionally including one or more other elements. The lighting apparatus is configured to provide a desired light spectrum by filtering the generated visible light using the compound.

An IPL apparatus utilizing a Pulse Forming Network (PFN) for generating a plurality of light pulse sequences, comprising a treatment unit comprising one or more lamps adapted to emit a plurality of light pulses towards a treatment face of the IPL apparatus, a PFN and a control unit adapted to operate the PFN to generate a regulated energized pulse driven to the lamp(s). The regulated energized pulse having a desired multi-level voltage waveform with a maximum voltage level and a minimum voltage level which is in a range of 30-50 percent of the maximum voltage level. Rapidly varying heat is induced by a sequence of the plurality of light pulses emitted by the lamp(s) according to the multi-level voltage waveform.