An excimer lamp includes a dielectric tube, an end cap, a conductive hollow tube, and an electrode grid. The dielectric tube has a closed end and an open end, and defines a cavity. The end cap sealingly covers the open end. The conductive hollow tube passes through the end cap and into the cavity of the dielectric tube, with a volume defined between an exterior surface of the conductive hollow tube and an interior surface of the dielectric tube. The volume is configured to hold a gas. The electrode grid is disposed on an exterior surface of the dielectric tube.

An excimer lamp includes a dielectric tube, an end cap, a conductive hollow tube, and an electrode grid. The dielectric tube has a closed end and an open end, and defines a cavity. The end cap sealingly covers the open end. The conductive hollow tube passes through the end cap and into the cavity of the dielectric tube, with a volume defined between an exterior surface of the conductive hollow tube and an interior surface of the dielectric tube. The volume is configured to hold a gas. The electrode grid is disposed on an exterior surface of the dielectric tube.

An exposure apparatus comprising a holding part for holding an electric discharge lamp, the electric discharge lamp includes an electric discharge tube which covers an electric discharge space in which a pair of electrodes are disposed to face each other, a socket provided on one end of the electric discharge tube, a metal member which guides one of the pair of electrodes into the socket, wherein an opening for ventilation is provided in a bottom of the socket, the holding part includes a ventilation pipe to form a path for ventilation through the opening in the bottom of the socket, and a cooling part for cooling the metal member by supplying a cooling medium to the metal member through the ventilation pipe.

An excimer lamp, which includes a first lamp cap, a second lamp cap, a first electrode head, a second electrode head, a conductive heat dissipation rod, a light-transparent annular sleeve, and a conductive annular net. The heat dissipation rod and conductive annular net are respectively connected to the first and second electrode heads to excite an excimer gas in the light-transparent annular sleeve. Inside the excimer lamp the, a large amount of heat can be conducted and dissipated through the conductive heat dissipation rod, and then through the heat dissipation of the first lamp cap or by heat conductive annular rings between sections of the lamp. At the same time, the conductive annular nets can also conduct and dispatch a large amount of above mentioned heat; the heat may be further conducted and dispatched through the second lamp cap or through the heat conductive annular rings, if present.

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

The present invention provides a deep ultraviolet radiation apparatus that is safe and has a high bacteria eliminating effect.

The ultraviolet radiation apparatus comprises an optical filter that prevents the transmission of ultraviolet light of 240 nm or more emitted from a phosphor, wherein the optical filter is arranged facing light emitting surfaces of a gas-discharging tube array-type surface-emitting ultraviolet light source device comprising phosphor layer having a broad emission spectrum with a wavelength width of at least 210 nm to 250 nm with a peak wavelength of 228 nm. Light irradiated from the light source device is incident on a filter membrane with an incident angle thereof being altered by a transparent substrate of the optical filter. An ozone generation space may be formed between the surface-emitting ultraviolet light source device and the optical filter.

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

A light irradiation device includes: a lamp that has a lamp back surface on which a lamp back surface electrode is provided, and a lamp major surface which faces the lamp back surface and on which a lamp major surface electrode is provided, and that emits light from the lamp back surface; a housing forming an internal space in which the lamp is disposed, together with a vacuum window that transmits the light emitted by the lamp; and a heat sink that discharges heat from the lamp. The heat sink is thermally connected to the lamp major surface. The housing includes a suction pipe joint serving as an inlet for compressed air to be supplied to the internal space, and a discharge pipe joint serving as an outlet for the compressed air that has received the heat from the heat sink.