Patent classifications
H01J61/52
DEVICE FOR EMITTING ULTRAVIOLET LIGHT
A device for emitting ultraviolet light includes at least one excimer lamp and a housing for the excimer lamp(s). Each excimer lamp has a discharge vessel filled with light-emitting gases, and a pair of first and second electrodes that are placed in contact with the discharge vessel and produce a dielectric barrier discharge inside the discharge vessel. The housing is made of an insulating and heat-resistant resin material. The housing is configured to house the excimer lamp(s), and has a light-emitting window that allows light with a center wavelength in a range from 200 nm to 230 nm emitted from the excimer lamp(s) to exit from the housing.
DEVICE FOR EMITTING ULTRAVIOLET LIGHT
A device for emitting ultraviolet light includes at least one excimer lamp and a housing for the excimer lamp(s). Each excimer lamp has a discharge vessel filled with light-emitting gases, and a pair of first and second electrodes that are placed in contact with the discharge vessel and produce a dielectric barrier discharge inside the discharge vessel. The housing is made of an insulating and heat-resistant resin material. The housing is configured to house the excimer lamp(s), and has a light-emitting window that allows light with a center wavelength in a range from 200 nm to 230 nm emitted from the excimer lamp(s) to exit from the housing.
SHORT-ARC DISCHARGE LAMP
A short-arc discharge lamp includes a pair of electrodes disposed facing each other inside a light-emitting tube, a scale-like structure being formed on an outer surface of at least one electrode of the pair of electrodes, and a coating film covering the outer surface on which the scale-like structure is formed. The scale-like structure includes a plurality of flaky protrusions protruding from the outer surface in a direction inclined with respect to a normal direction of the outer surface, each flaky protrusion having a front surface whose angle formed with the outer surface is an obtuse angle and a back surface whose angle formed with the outer surface is an acute angle. The coating film contains at least one of metal oxides, metal carbides, metal borides, metal silicides, and metal nitrides. A part of the coating film enters a space sandwiched between the back surface and the outer surface.
LASER-SUSTAINED PLASMA LIGHT SOURCE WITH GAS VORTEX FLOW
A laser-sustained plasma (LSP) light source with vortex gas flow is disclosed. The LSP source includes a gas containment structure for containing a gas, one or more gas inlets configured to flow gas into the gas containment structure, and one or more gas outlets configured to flow gas out of the gas containment structure. The one or more gas inlets and the one or more gas outlets are arranged to generate a vortex gas flow within the gas containment structure. The LSP source also includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure within an inner gas flow within the vortex gas flow. The LSP source includes a light collector element configured to collect at least a portion of broadband light emitted from the plasma.
Nitrogen Injection for ARC Lamps
Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.
Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma Light Source
A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma. The plasma bulb is transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.
LASER SUSTAINED PLASMA LIGHT SOURCE WITH HIGH PRESSURE FLOW
A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.
LASER SUSTAINED PLASMA LIGHT SOURCE WITH HIGH PRESSURE FLOW
A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.
High pressure hydro-cooled misting/vapor illumination system for LED devices using liquid or gas
The utility model embodies a greenhouse hydro-cooled grow light LED system that administers a mist or vapor. This system operates in a range of temperatures, which are determined by the liquid temperature running through the channeled copper heatsink. The manipulation of the liquid's temperature produces the desired humidity. A brass high pressure liquid barbed valve fitting is secured on either side of the light housing, which is also connected to a humidity sensor electrical outlet. Low humidity closes the liquid valve. This allows a liquid pressure increase in all liquid lines, until the liquid release pressure of 60 psi is reached. The mist/vapor component is realized through the placement of high pressure mist nozzles. At release pressure, an atomized mist with droplets under 60 microns is outflowed.
High pressure hydro-cooled misting/vapor illumination system for LED devices using liquid or gas
The utility model embodies a greenhouse hydro-cooled grow light LED system that administers a mist or vapor. This system operates in a range of temperatures, which are determined by the liquid temperature running through the channeled copper heatsink. The manipulation of the liquid's temperature produces the desired humidity. A brass high pressure liquid barbed valve fitting is secured on either side of the light housing, which is also connected to a humidity sensor electrical outlet. Low humidity closes the liquid valve. This allows a liquid pressure increase in all liquid lines, until the liquid release pressure of 60 psi is reached. The mist/vapor component is realized through the placement of high pressure mist nozzles. At release pressure, an atomized mist with droplets under 60 microns is outflowed.