A light source is composed of a discharge lamp, a resistor and a reflector container. The discharge lamp is provided as a source of light. The resistor increases a resistance in elevation of a temperature thereof, and reduces the resistance in lowering of the temperature thereof. The reflector container is a constituent element to which the discharge lamp and the resistor are attached. Additionally, the resistor is caused to heat an outer surface of the reflector container in accordance with elevation of a temperature of the discharge lamp in activation of lighting of the discharge lamp.

A light source is composed of a discharge lamp, a resistor and a reflector container. The discharge lamp is provided as a source of light. The resistor increases a resistance in elevation of a temperature thereof, and reduces the resistance in lowering of the temperature thereof. The reflector container is a constituent element to which the discharge lamp and the resistor are attached. Additionally, the resistor is caused to heat an outer surface of the reflector container in accordance with elevation of a temperature of the discharge lamp in activation of lighting of the discharge lamp.

A gas discharge lamp includes at least two electrodes arranged in a manner spaced apart with a spacing in a discharge vessel filled with gas. A method of operating a ballast includes applying electrical energy to the electrodes. The ballast provides an electrical electrode current including a ripple current being dependent on an operating frequency of converter. Operating frequency is dependent on a charging time period and a discharging time period for an electrical energy store of the converter. The operating frequency is chosen such that the ripple current in the region of an arc discharge brings about a resonant excitation of the gas, and providing a pause time period between the discharging time periods and the respectively succeeding charging time period, the time duration of which pause time period is chosen such that a sum formed from the time periods attains the period duration corresponding to the operating frequency.

A gas discharge lamp includes at least two electrodes arranged in a manner spaced apart with a spacing in a discharge vessel filled with gas. A method of operating a ballast includes applying electrical energy to the electrodes. The ballast provides an electrical electrode current including a ripple current being dependent on an operating frequency of converter. Operating frequency is dependent on a charging time period and a discharging time period for an electrical energy store of the converter. The operating frequency is chosen such that the ripple current in the region of an arc discharge brings about a resonant excitation of the gas, and providing a pause time period between the discharging time periods and the respectively succeeding charging time period, the time duration of which pause time period is chosen such that a sum formed from the time periods attains the period duration corresponding to the operating frequency.

A dimmable induction RF fluorescent light bulb comprising a power coupler with reduced extraneous electromagnetic radiation wherein a dimming facility utilizes burst-mode dimming that periodically interrupts the high frequency voltage and current to the power coupler with an off period and an on period in order to reduce the power being delivered to the power coupler wherein the off period is shorter than the time required for an electron density of the discharge within the lamp envelope to substantially decrease.

A dimmable induction RF fluorescent light bulb comprising a power coupler with reduced extraneous electromagnetic radiation wherein a dimming facility utilizes burst-mode dimming that periodically interrupts the high frequency voltage and current to the power coupler with an off period and an on period in order to reduce the power being delivered to the power coupler wherein the off period is shorter than the time required for an electron density of the discharge within the lamp envelope to substantially decrease.

System and/or method generally relate to extending a lifespan of an excimer lamp. The system includes a ultra-violet (UV) light having a pair of dielectrics configured to separate electrodes. One of the electrodes includes a metal mesh. The system includes a power supply electrically coupled to the UV light and configured to deliver electrical power to the UV light. The system includes a temperature sensor operably coupled to the UV light. The temperature sensor is configured to generate a temperature signal indicative of a temperature of the UV light. The system includes at least one processor. The at least one processor is configured to determine a temperature of the UV light based on the temperature signal, and adjust the electrical power delivered to the UV light based on the temperature signal.

System and/or method generally relate to extending a lifespan of an excimer lamp. The system includes a ultra-violet (UV) light having a pair of dielectrics configured to separate electrodes. One of the electrodes includes a metal mesh. The system includes a power supply electrically coupled to the UV light and configured to deliver electrical power to the UV light. The system includes a temperature sensor operably coupled to the UV light. The temperature sensor is configured to generate a temperature signal indicative of a temperature of the UV light. The system includes at least one processor. The at least one processor is configured to determine a temperature of the UV light based on the temperature signal, and adjust the electrical power delivered to the UV light based on the temperature signal.

A UV system for irradiating a substrate includes a RF source capable of generating RF energy, a UV lamp capable of emitting UV energy when excited by the RF energy generated by the RF source, and a monitor coupled to the RF source. The monitor includes data relating to the RF source. The UV system further includes a controller capable of communication with the monitor, and the controller determines if the RF source is suitable for operation with the UV system based on the data of the monitor and/or the end of its useful life.

A UV system for irradiating a substrate includes a RF source capable of generating RF energy, a UV lamp capable of emitting UV energy when excited by the RF energy generated by the RF source, and a monitor coupled to the RF source. The monitor includes data relating to the RF source. The UV system further includes a controller capable of communication with the monitor, and the controller determines if the RF source is suitable for operation with the UV system based on the data of the monitor and/or the end of its useful life.