Patent classifications
H01J61/86
MANUFACTURING METHOD OF HIGH-PRESSURE DISCHARGE LAMP AND SEALED PART STRUCTURE FOR HIGH-PRESSURE DISCHARGE LAMP
A method of manufacturing a high-pressure discharge lamp, comprising the steps of: inserting a mount into an interior of a glass tube having an outer diameter smaller than an inner diameter of an end part of a sealed container; radially constricting the glass tube at a first position located away from a metallic foil toward a tip of an electrode; sealing the mount by a region of the glass tube that ranges from the first position to at least the other end of the metallic foil; protruding the electrode out of the glass tube located away from the first position toward the tip of the electrode to form a glass-tube air-tightly sealed mount; inserting the sealed mount into the end part of the sealed container; and radially constricting the end part of the sealed container to sealing the glass tube of the sealed mount by the end part.
Discharge lamp lighting apparatus
There is provide a discharge lamp lighting apparatus that comprises a discharge lamp and a power supply device configured to drive a regular lighting mode and the low electric power lighting mode in a switchable manner. The power supply device configured to control a power supply to the discharge lamp such that, in the low electric power lighting mode, after a secondary protrusion forming process in which an alternating current having a frequency equal to or greater than the basic frequency in the regular lighting mode is supplied, the low electric power lighting mode transitioning to a secondary protrusion maintaining process in which a high frequency alternating current having a frequency higher than the basic frequency in the regular lighting mode, and a low frequency alternating current having a frequency lower than the frequency of the high frequency alternating current is alternately supplied.
Discharge lamp lighting apparatus
A discharge lamp lighting apparatus is provided with a pulse generation part, and a power supply part converts DC applied voltage into alternating current corresponding to a frequency of the pulse, and supplies the alternating current to the discharge lamp. The pulse generation part is structured to alternately output a first pulse and a second pulse that has a lower frequency than the first pulse. The frequency of the second pulse is set to a predetermined reference frequency when a value of the applied voltage coincides with a predetermined reference value, is set to a lower frequency than the reference frequency when the value of the applied voltage exceeds the reference value, and is set to a frequency that is equal to or lower than the reference frequency when the value of the applied voltage falls below the reference value.
VACUUM ULTRA VIOLET LIGHT SOURCE DEVICE, LIGHT IRRADIATION DEVICE AND METHOD FOR PATTERNING SELF ASSEMBLED MONOLAYER
Disclosed herein a vacuum ultra violet light source device that is capable of suppressing an amount of ozone generation when the vacuum ultra violet light is emitted into an atmosphere containing oxygen, a light irradiation device incorporating the vacuum ultra violet light device, and a method of patterning a self-assembled monolayer employing the light irradiation device. The light irradiation device is configured to irradiate a self-assembled monolayer (SAM) formed on a workpiece with light containing vacuum ultra violet light through a mask M on which a prescribed pattern is formed so as to perform a patterning process of the SAM. The light containing the vacuum ultra violet light to be irradiated onto the SAM is light that is pulsed light and has a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.
DISCHARGE LAMP LIGHTING APPARATUS
A discharge lamp lighting apparatus is provided with a pulse generation part, and a power supply part converts DC applied voltage into alternating current corresponding to a frequency of the pulse, and supplies the alternating current to the discharge lamp. The pulse generation part is structured to alternately output a first pulse and a second pulse that has a lower frequency than the first pulse. The frequency of the second pulse is set to a predetermined reference frequency when a value of the applied voltage coincides with a predetermined reference value, is set to a lower frequency than the reference frequency when the value of the applied voltage exceeds the reference value, and is set to a frequency that is equal to or lower than the reference frequency when the value of the applied voltage falls below the reference value.
Multi-spectral electrodeless ultraviolet light source, lamp module, and lamp system
An elongated light source envelope is disclosed. The elongated light source comprises an inner wall and an outer wall formed around a longitudinal axis. The inner wall and the outer wall may be connected at a first axial end by a first side wall and a second axial end by a second side wall. The inner wall, outer wall, the first side wall, and the second side wall define an enclosed space internal to the envelope. The light source envelope further comprises one or more walls formed between the inner wall and the outer wall to further form at least a first enclosed region and a second enclosed region within the enclosed space. The first enclosed region may be configured to emit a different spectrum of ultraviolet radiation from the second enclosed region in response to excitation of the first enclosed region and the second enclosed region by microwave radiation.
Multi-spectral electrodeless ultraviolet light source, lamp module, and lamp system
An elongated light source envelope is disclosed. The elongated light source comprises an inner wall and an outer wall formed around a longitudinal axis. The inner wall and the outer wall may be connected at a first axial end by a first side wall and a second axial end by a second side wall. The inner wall, outer wall, the first side wall, and the second side wall define an enclosed space internal to the envelope. The light source envelope further comprises one or more walls formed between the inner wall and the outer wall to further form at least a first enclosed region and a second enclosed region within the enclosed space. The first enclosed region may be configured to emit a different spectrum of ultraviolet radiation from the second enclosed region in response to excitation of the first enclosed region and the second enclosed region by microwave radiation.
DC GAS DISCHARGE LAMP HAVING A THORIUM-FREE CATHODE
A DC gas discharge lamp includes an anode and a cathode having a first cathode segment, which forms the surface of the cathode at least in a region of the cathode which faces the anode and has an arc attachment region, within which an arc burning between the cathode and the anode attaches during lamp operation as intended. The first cathode segment consists of tungsten with at least one emitter material for reducing the work function of electrons from the cathode. The cathode is embodied in a manner free of thorium. The at least one emitter material has a melting point of less than 3200 K. At least one part of the surface of the cathode outside the arc attachment region is formed by a diffusion barrier for the at least one emitter material.
ELECTRODE FOR A SHORT-ARC HIGH PRESSURE LAMP
An electrode (1) of a discharge device (e.g. the cathode of a discharge lamp) having a side area (4) and a tip area (5) implanted with an emissive material dopant induced by ion implantation is disclosed. The side area (4) of the electrode (1) may be masked (3) during ion implantation or a diffusion barrier layer (7) may be added on the side area (4) after ion implantation.
ELECTRODE FOR A SHORT-ARC HIGH PRESSURE LAMP
An electrode (1) of a discharge device (e.g. the cathode of a discharge lamp) having a side area (4) and a tip area (5) implanted with an emissive material dopant induced by ion implantation is disclosed. The side area (4) of the electrode (1) may be masked (3) during ion implantation or a diffusion barrier layer (7) may be added on the side area (4) after ion implantation.