Patent classifications
H01J65/042
Laser sustained plasma light source with forced flow through natural convection
A broadband radiation source is disclosed. The system may include a plasma containment vessel configured to receive laser radiation from a pump source to sustain a plasma within gas flowed through the plasma containment vessel. The plasma containment vessel may be further configured to transmit at least a portion of broadband radiation emitted by the plasma. The system may also include a recirculation gas loop fluidically coupled to the plasma containment vessel. The recirculation gas loop may be configured to transport heated gas from an outlet of the plasma containment vessel, and further configured to transport cooled gas to an inlet of the plasma containment vessel.
High-power short-pass total internal reflection filter
An apparatus for generating filtered light may include a broadband illumination source configured to generate broadband illumination and a total internal reflection (TIR) filter formed from a material at least partially transparent to the broadband illumination. The TIR filter may include one or more input faces oriented to receive the broadband illumination. The TIR filter may further be oriented to reflect wavelengths of the broadband illumination beam below a selected cutoff wavelength on one or more filtering faces as filtered broadband illumination and provide the filtered broadband illumination beam through one or more output faces. The cutoff wavelength may further be selected based on total internal reflection on the one or more faces.
Dual parabolic laser driven sealed beam lamp
The invention is directed to a sealed high intensity illumination device configured to receive a laser beam from a laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber includes a reflective chamber interior surface having a first parabolic contour and parabolic focal region, a second parabolic contour and parabolic focal region, an ingress surface configured to admit the laser beam into the chamber, and an egress surface configured to emit high intensity light from the chamber. The first parabolic contour is configured to reflect light from the first parabolic focal region to the second parabolic contour, and the second parabolic contour is configured to reflect light from the first parabolic contour to the second parabolic focal region.
Electrodeless lamp system and methods of operation
An embodiment of a system includes an RF signal source, a first electrode, a second electrode, and a cavity configured to receive an electrodeless bulb. The RF signal source is configured to generate an RF signal. The first electrode is configured to receive the RF signal and to convert the RF signal into electromagnetic energy that is radiated by the first electrode. The cavity is defined by first and second boundaries that are separated by a distance that is less than the wavelength of the RF signal so that the cavity is sub-resonant. The first electrode is physically positioned at the first boundary, and the second electrode is physically positioned at the second boundary. The first electrode, the second electrode, and the cavity form a structure that is configured to capacitively couple the electromagnetic energy into the electrodeless bulb when the electrodeless bulb is positioned within the cavity.
Electrodeless gas discharge lamps and methods of making the same
In some embodiments, an electrodeless lamp may be provided. The lamp may include an outer tube and an inner tube. The inner tube may be sealed to the outer tube to define a sealed space in which a gas may be contained. The gas may be configured to emit electromagnetic radiation when an electromagnetic field is applied thereto.
System and Method for Pumping Laser Sustained Plasma and Enhancing Selected Wavelengths of Output Illumination
A system for pumping laser sustained plasma and enhancing one or more selected wavelengths of output illumination generated by the laser sustained plasma is disclosed. In embodiments, the system includes one or more pump modules configured to generate pump illumination for the laser sustained plasma and one or more enhancing illumination sources configured to generate enhancing illumination at one or more selected wavelengths. The pump illumination may be directed along one or more pump illumination paths that are non-collinear to an output illumination path of the output illumination. The enhancing illumination may be directed along an illumination path that is collinear to the output illumination path of the output illumination so that the enhancing illumination is combined with the output illumination, thereby enhancing the output illumination at the one or more selected wavelengths.
System for portable gas storage and delivery
A system (2) for storing and delivering a gas includes a container (4), a porous absorbent material (7) provided within the container, the porous absorbent material storing the gas in a concentrated form, and an adapter assembly (6) structured to be coupled to the container. The adapter assembly is structured to enable the gas to be extracted from the container and delivered to an individual through a cannula or the like.
Swirler for laser-sustained plasma light source with reverse vortex flow
A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.
High-Power Short-Pass Total Internal Reflection Filter
An apparatus for generating filtered light may include a broadband illumination source configured to generate broadband illumination and a total internal reflection (TIR) filter formed from a material at least partially transparent to the broadband illumination. The TIR filter may include one or more input faces oriented to receive the broadband illumination. The TIR filter may further be oriented to reflect wavelengths of the broadband illumination beam below a selected cutoff wavelength on one or more filtering faces as filtered broadband illumination and provide the filtered broadband illumination beam through one or more output faces. The cutoff wavelength may further be selected based on total internal reflection on the one or more faces.
High power low pressure UV bulb with plasma resistant coating
An envelope of an ultraviolet (UV) bulb comprises a tube of UV transmissive material configured to contain a UV emissive material and a plasma resistant coating on an inner surface of the tube wherein the coating has been deposited by atomic layer deposition (ALD) and is the only material attached to the inner surface of the tube. The tube can be an endless tube having a circular shape and the coating can be an ALD aluminum oxide coating. The UV transmissive material can comprise quartz or fused silica and the tube can have a wall thickness of about 1 to about 2 mm. The coating can have a thickness of no greater than about 200 nm such as about 120 nm to 160 nm. The circular tube can be formed into a torus shape which can have an outer diameter of about 200 mm and the tube itself can have an outer diameter of about 30 mm. The ALD aluminum oxide coating can be a pinhole free conformal coating. A UV bulb comprising the envelope can contain mercury and inert gas such as argon with pressure inside the UV bulb below 100 Torr. A method of curing a film on a semiconductor substrate, comprises supporting a semiconductor substrate in a curing chamber and exposing a layer on the semiconductor substrate to UV radiation produced by the UV bulb. Other uses include semiconductor substrate surface cleaning or sterilization of fluids and objects.