An X-ray tube includes: an envelope that is a case; a cathode assembly that emits electrons in the envelope; and an anode including a first member of which at least a portion extends to the outside of the envelope, a second member that is provided in a direction perpendicular to a central axis of the first member, comes into contact with the first member, and has a higher X-ray shielding performance than the first member, and a target that receives the electrons emitted from the cathode assembly and generates X-rays.

A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.

An analytical X-ray tube with an anode target material that emits characteristic X-rays in response to excitation by an electron beam may include any of several advantageous features. The target material is deposited on a diamond substrate layer, and a metal carbide intermediate layer may be provided between the target material and substrate that provides enhanced bonding therebetween. An interface layer may also be used that provides an acoustic impedance matching between the target material and the substrate. For a low thermal conductivity target material, a heat dissipation layer of a higher thermal conductivity material may also be included between the target material and substrate to enhance thermal transfer. The target material may have a thickness that corresponds to a maximum penetration depth of the electrons of the electron beam, and the structure may be such that a predetermined temperature range is maintained at the substrate interface.

A target for generating x-rays includes at least one substrate including a first material and a plurality of discrete structures including at least one second material configured to generate x-rays in response to electron bombardment. The discrete structures are distributed across a first surface of the at least one substrate in an array pattern function A that has a corresponding function B such that a combination operation of the array pattern function A with the corresponding function B generates a resultant function C comprising a first portion with a single peak and a substantially flat second portion surrounding the first portion. The combination operation includes a cross-correlation operation or a convolution operation

An inspection radiation source is provided. The inspection radiation source includes an electron accelerator for generating an electron current, and a target for the electron current including a first part and a second part. This first part is configured to be at least partly exposed to the electron current on an impact area having a first width in a direction substantially perpendicular to the electron current, and inhibit propagation of the electron current. The second part has a second width in the direction substantially perpendicular to the electron current, the second width of the second part being smaller than the first width of the impact area, the second part being configured to be at least partly exposed to the electron current, and generate inspection radiation by emitting X-rays in response to being exposed to the electron current.

An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.

The invention relates to an electron antenna as an anode for a micro- or nano-focus X-ray generation comprising an antenna base and an antenna element arranged on the antenna base such that the antenna element protrudes from a front surface of the antenna base, wherein the antenna is arranged to guide and attract the electrons in its vicinity to the top the antenna element.

According to some aspects, a monochromatic x-ray source is provided. The monochromatic x-ray source comprises an electron source configured to generate electrons, a primary target arranged to receive electrons from the electron source to produce broadband x-ray radiation in response to electrons impinging on the primary target, and a secondary target comprising at least one layer of material capable of producing monochromatic x-ray radiation in response to incident broadband x-ray radiation emitted by the primary target.

A method and system are disclosed for producing an x-ray image of a sample using a lamella-shaped target to improve the usual tradeoff between imaging resolution and image acquisition time. A beam of electrons impacts the lamella-shaped target normal to the narrower dimension of the lamella which then determines the virtual source size along that axis. For low-energy x-ray generation, the small electron penetration depth parallel to the wider dimension of the lamella determines the virtual source size along that axis. Conductive cooling of the target is improved over post targets with the same imaging resolution. The lamella-shaped target is long enough to ensure that the electron beam does not impact the support structure which would degrade the imaging resolution. Target materials may be selected from the same metals used for bulk or post targets, including tungsten, molybdenum, titanium, scandium, vanadium, silver, or a refractory metal.

Described herein is a medical linear accelerator including an accelerator target structure constructed of a material having a thickness of less than 0.2 radiation lengths, and an accelerator structure to receive an electromagnetic wave and generate an output therapy dose rate of electrons having a beam energy between 4-25 mega-electronvolts (MeV).